专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US07273077B2 Apparatus and method of dispensing liquid crystal 有权
标题翻译：分配液晶的装置和方法
公开(公告)号：US07273077B2
公开(公告)日：2007-09-25
申请号：US10995564
申请日：2004-11-24
申请人： Jae-Choon Ryu , Sang-Hyun Kim , Sung-Su Jung , Dong-Ho Park
发明人： Jae-Choon Ryu , Sang-Hyun Kim , Sung-Su Jung , Dong-Ho Park
IPC分类号： B65B1/04
CPC分类号： G02F1/1341 , G02F2001/13415
摘要： An apparatus for dispensing liquid crystal material including a container containing liquid crystal material, a discharge pump drawing-in liquid crystal material and discharging the drawn liquid crystal material, a nozzle dispensing the discharged liquid crystal material onto LCD panel regions as a plurality of liquid crystal droplets, and a control unit calculating a total amount of liquid crystal material to be dispensed onto each LCD panel region as a dispensing pattern of liquid crystal droplets each having an amount of liquid crystal material contained therein and for compensating the total amount of liquid crystal material by at least one of: compensating the predetermined number of liquid crystal droplets arranged within the predetermined dispensing pattern, and compensating the predetermined amount of liquid crystal material within at least one liquid crystal droplet.
摘要翻译：一种用于分配液晶材料的装置，包括容纳液晶材料的容器，排出泵引入液晶材料并排出所拉伸的液晶材料，将排出的液晶材料分配到LCD面板区域上作为多个液晶液滴，以及控制单元，其计算要分配到每个LCD面板区域上的液晶材料的总量，作为每个液晶微粒的分配图案，每个液晶微滴均含有一定量的液晶材料，并用于补偿液晶材料的总量通过以下至少一种方式：补偿布置在预定分配图案内的预定数量的液晶微滴，并补偿至少一个液晶液滴内的预定量的液晶材料。

52. 发明授权

US07250331B2 Mask for crystallizing and method of crystallizing amorphous silicon using the same 有权
标题翻译：用于结晶的掩模和使用其的结晶非晶硅的方法
公开(公告)号：US07250331B2
公开(公告)日：2007-07-31
申请号：US11004102
申请日：2004-12-06
申请人： Sang-Hyun Kim
发明人： Sang-Hyun Kim
IPC分类号： H01L21/84 , H01L21/00 , H01L21/425
CPC分类号： H01L21/0268 , H01L21/2026
摘要： A method of crystallizing amorphous silicon using a mask having a transmitting portion including a plurality of stripes, wherein end lines of at least two stripes are not collinear; and a blocking portion enclosing the plurality of stripes includes the steps of setting the mask over a substrate having an amorphous silicon layer, applying a first laser beam to a first area of the amorphous silicon layer through the mask, thereby forming a first crystallization region, moving the substrate in a first direction, thereby disposing the blocking portion of the mask over the first crystallization region, and applying a second laser beam to the first area of the amorphous silicon layer through the mask, thereby forming a second crystallization region.
摘要翻译：一种使用具有包括多个条纹的透射部分的掩模使非晶硅结晶的方法，其中至少两条条纹的端行不共线; 并且封闭多个条纹的阻挡部分包括将掩模设置在具有非晶硅层的衬底上的步骤，通过掩模将第一激光束施加到非晶硅层的第一区域，从而形成第一结晶区域，在第一方向移动衬底，从而将掩模的阻挡部分设置在第一结晶区域上，并且通过掩模将第二激光束施加到非晶硅层的第一区域，从而形成第二结晶区域。

53. 发明申请

US20070115423A1 Dispenser system for liquid crystal display panel and method of using the same 有权
公开(公告)号：US20070115423A1
公开(公告)日：2007-05-24
申请号：US11657049
申请日：2007-01-24
申请人： Sang-Hyun Kim , Sung-Su Jung
发明人： Sang-Hyun Kim , Sung-Su Jung
IPC分类号： G02F1/1339
CPC分类号： G02F1/1339
摘要： A dispenser system for a liquid crystal display panel includes a table to overturn a substrate having at least one image display part on a first surface of the overturned substrate, and at least one syringe system to supply sealant onto a first surface of the overturned substrate to form a seal pattern along outer edges of the image display part on the first surface of the overturned substrate, wherein the at least one syringe system moves along horizontal directions.

54. 发明授权

US06875547B2 Mask for crystallizing amorphous 有权
标题翻译：用于结晶无定形的面膜
公开(公告)号：US06875547B2
公开(公告)日：2005-04-05
申请号：US10419841
申请日：2003-04-22
申请人： Sang-Hyun Kim
发明人： Sang-Hyun Kim
IPC分类号： G02F1/13 , H01L21/20 , G03F9/00
CPC分类号： H01L21/0268 , H01L21/2026
摘要： A method of crystallizing amorphous silicon using a mask having a transmitting portion including a plurality of stripes, wherein end lines of at least two stripes are not collinear; and a blocking portion enclosing the plurality of stripes includes the steps of setting the mask over a substrate having an amorphous silicon layer, applying a first laser beam to a first area of the amorphous silicon layer through the mask, thereby forming a first crystallization region, moving the substrate in a first direction, thereby disposing the blocking portion of the mask over the first crystallization region, and applying a second laser beam to the first area of the amorphous silicon layer through the mask, thereby forming a second crystallization region.
摘要翻译：一种使用具有包括多个条纹的透射部分的掩模使非晶硅结晶的方法，其中至少两条条纹的端行不共线; 并且封闭多个条纹的阻挡部分包括将掩模设置在具有非晶硅层的衬底上的步骤，通过掩模将第一激光束施加到非晶硅层的第一区域，从而形成第一结晶区域，在第一方向移动衬底，从而将掩模的阻挡部分设置在第一结晶区域上，并且通过掩模将第二激光束施加到非晶硅层的第一区域，从而形成第二结晶区域。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式