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    • 57. 发明授权
    • Process for preparing cephem compounds
    • 头孢烯化合物的制备方法
    • US5656754A
    • 1997-08-12
    • US211119
    • 1994-03-22
    • Shigeru ToriiHideo TanakaMichio SasaokaTakashi ShiroiYutaka Kameyama
    • Shigeru ToriiHideo TanakaMichio SasaokaTakashi ShiroiYutaka Kameyama
    • B01J27/122C07B61/00C07D205/08C07D205/09C07D205/095C07D501/00C07D501/08C07D501/18C07D501/22C07D501/16
    • C07D205/09C07D205/095C07D501/00Y02P20/55
    • The present invention provides a process for preparing a cephem compound represented by the general formula (3) characterized in that an allenyl-.beta.-lactam compound represented by the general formula (1) is reacted with an organotin compound represented by the general formula (2) in the presence of a monovalent copper salt ##STR1## wherein R.sup.1 is a hydrogen atom, halogen atom, amino or protected amino, R.sup.2 is a hydrogen atom, halogen atom, lower alkoxyl, lower acyl, lower alkyl, lower alkyl having hydroxyl or protected hydroxyl as a substituent, hydroxyl or protected hydroxyl, or R.sup.1 and R.sup.2 form=0 when taken together, R.sup.3 is a hydrogen atom or carboxylic acid protecting group, R.sup.4 is aryl, aryl having a substituent, nitrogen-containing aromatic heterocyclic group or nitrogen-containing aromatic heterocyclic group having a substituent, and m is 0 or 2,(R.sup.5).sub.n --Sn(R.sup.6).sub.4--n (2)wherein R.sup.5 is alkenyl, alkenyl having a substituent, aryl, aryl having a substituent, nitrogen-containing aromatic heterocyclic group or nitrogen-containing aromatic heterocyclic group having a substituent, R.sup.6 is lower alkyl, and n is 1 or 2, ##STR2## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.5 are the same as defined above.
    • PCT No.PCT / JP93 / 01041 Sec。 371日期:1994年3月22日 102(e)1994年3月22日PCT 1993年7月26日PCT公布。 出版物WO94 / 02490 日期:1994年2月3日本发明提供一种制备由通式(3)表示的头孢烯化合物的方法,其特征在于,将由通式(1)表示的丙烯酰基-β-内酰胺化合物与由 在一价铜盐(1)的存在下通式(2)其中R1是氢原子,卤素原子,氨基或被保护的氨基,R2是氢原子,卤素原子,低级烷氧基,低级酰基, 低级烷基,具有羟基或被保护的羟基作为取代基的低级烷基,羟基或保护的羟基,或者R 1和R 2形成= 0,当R 3是氢原子或羧酸保护基时,R 4是芳基,具有取代基的芳基, 具有取代基的含氮芳香族杂环基或含氮芳香族杂环基,m为0或2,(R5)n-Sn(R6)4-n(2)其中R5为烯基,具有取代基的烯基, ,具有取代基的芳基,氮 - 具有取代基的芳族杂环基或含氮芳族杂环基,R6是低级烷基,n是1或2,其中R1,R2,R3和R5与上述定义相同。