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    • 53. 发明授权
    • Method for manufacturing III metal nitride single crystal
    • III型金属氮化物单晶的制造方法
    • US07988784B2
    • 2011-08-02
    • US12804521
    • 2010-07-23
    • Takayuki HiraoKatsuhiro ImaiMikiya Ichimura
    • Takayuki HiraoKatsuhiro ImaiMikiya Ichimura
    • C30B19/12
    • C30B29/403C30B19/12
    • It is used a substrate main body 1 having a side face 1b and a pair of main faces 1a and an underlying film 2 of a single crystal of a nitride of a metal belonging to the group III formed at least on one main face of the substrate main body 1. A single crystal 3 of a nitride of a metal belonging to the group III is grown on the main face 1a of the substrate main body 1 by a liquid phase process. The underlying film 2 has a shape of a convex figure in a plan view. A surface 4 without the underlying film thereon surrounds the entire circumference of the underlying film 2. The single crystal 3 of a nitride of a metal belonging to the group III grown on the underlying film 2 is not brought into contact with a single crystal of a nitride of a metal belonging to group III formed on another underlying film.
    • 使用基板主体1,该基板主体1具有侧面1b和一对主面1a和属于组III的金属的氮化物的单晶的基底膜,所述III族金属的氮化物形成在基板的至少一个主面上 主体1.通过液相处理,在基板主体1的主面1a上生长属于III族的金属的氮化物的单晶3。 下面的薄膜2在平面图中具有凸形的形状。 没有其下面的膜的表面4围绕下面的膜2的整个圆周。属于在下面的膜2上生长的III族金属的氮化物的单晶3不与单晶 属于第III组的金属的氮化物,形成在另一底层膜上。
    • 54. 发明申请
    • Method for manufacturing III metal nitride single crystal
    • III型金属氮化物单晶的制造方法
    • US20100307404A1
    • 2010-12-09
    • US12804521
    • 2010-07-23
    • Takayuki HiraoKatsuhiro ImaiMikiya Ichimura
    • Takayuki HiraoKatsuhiro ImaiMikiya Ichimura
    • C30B19/12
    • C30B29/403C30B19/12
    • It is used a substrate main body 1 having a side face 1b and a pair of main faces 1a and an underlying film 2 of a single crystal of a nitride of a metal belonging to the group III formed at least on one main face of the substrate main body 1. A single crystal 3 of a nitride of a metal belonging to the group III is grown on the main face 1a of the substrate main body 1 by a liquid phase process. The underlying film 2 has a shape of a convex figure in a plan view. A surface 4 without the underlying film thereon surrounds the entire circumference of the underlying film 2 The single crystal 3 of a nitride of a metal belonging to the group III grown on the underlying film 2 is not brought into contact with a single crystal of a nitride of a metal belonging to group III formed on another underlying film.
    • 使用基板主体1,该基板主体1具有侧面1b和一对主面1a和属于组III的金属的氮化物的单晶的基底膜,所述III族金属的氮化物形成在基板的至少一个主面上 主体1.通过液相处理,在基板主体1的主面1a上生长属于III族的金属的氮化物的单晶3。 下面的薄膜2在平面图中具有凸形的形状。 没有其下面的膜的表面4围绕下面的膜2的整个圆周。属于在下面的膜2上生长的III族金属的氮化物的单晶3不与氮化物的单晶接触 属于第III组的金属,形成于另一底层薄膜上。