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51. 发明申请

US20090202943A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：积极的组合和绘图过程
公开(公告)号：US20090202943A1
公开(公告)日：2009-08-13
申请号：US12370652
申请日：2009-02-13
申请人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
发明人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7/00 , C08F228/02 , C08F24/00
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
摘要翻译：正型抗蚀剂组合物包含含有其中掺入其中的锍盐作为基础树脂的重复单元的聚合物，其在酸的作用下变得可溶于碱性显影剂。聚合物在暴露于高能量辐射时产生强烈的磺酸，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。

52. 发明授权

US08313890B2 Antireflective coating composition, antireflective coating, and patterning process 有权
标题翻译：抗反射涂料组合物，抗反射涂层和图案化工艺
公开(公告)号：US08313890B2
公开(公告)日：2012-11-20
申请号：US12636546
申请日：2009-12-11
申请人： Seiichiro Tachibana , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
发明人： Seiichiro Tachibana , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
IPC分类号： G03F7/11 , G03F7/40 , C08L31/02
CPC分类号： G03F7/091 , C09D133/16 , C08L2666/02
摘要： A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.
摘要翻译：包含（A）具有k = 0.01-0.4和n = 1.4-2.1的氟化聚合物和（B）具有k = 0.3-1.2的含芳环的聚合物的组合物用于形成抗反射涂层。 ARC形成组合物可以通过与现有技术ARC相同的方法沉积。所得到的ARC有效地防止曝光光在光刻中的反射并且具有可接受的干蚀刻速率。

53. 发明授权

US08062828B2 Positive resist composition and patterning process 有权
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US08062828B2
公开(公告)日：2011-11-22
申请号：US12370652
申请日：2009-02-13
申请人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
发明人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
摘要翻译：正型抗蚀剂组合物包含含有其中掺入其中的锍盐作为基础树脂的重复单元的聚合物，其在酸的作用下变得可溶于碱性显影剂。聚合物在暴露于高能量辐射时产生强烈的磺酸，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。

54. 发明授权

US07202318B2 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process 有权
标题翻译：可聚合氟化酯，制造方法，聚合物，光致抗蚀剂组合物和图案化工艺
公开(公告)号：US07202318B2
公开(公告)日：2007-04-10
申请号：US11175346
申请日：2005-07-07
申请人： Takeshi Kinsho , Takeru Watanabe , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeshi Kinsho , Takeru Watanabe , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C08F12/20
CPC分类号： C08F114/18 , C07C69/653 , C07C2601/14 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 is a divalent hydrocarbon group, R3 is H or a monovalent hydrocarbon group, or R2 and R3, taken together, may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions
摘要翻译：具有式（1）或（2）的可聚合氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2是二价烃基，R SUP > 3是H或一价烃基，或R 2和R 3一起可以形成环，R 4， SUP>是H，OH或一价烃基，R 5是酸不稳定基团。它们作为制备用于制造辐射敏感抗蚀剂组合物的聚合物的单体最有用

55. 发明申请

US20060009602A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process 有权
标题翻译：可聚合氟化酯，制造方法，聚合物，光致抗蚀剂组合物和图案化工艺
公开(公告)号：US20060009602A1
公开(公告)日：2006-01-12
申请号：US11175346
申请日：2005-07-07
申请人： Takeshi Kinsho , Takeru Watanabe , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeshi Kinsho , Takeru Watanabe , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C08F118/02 , C07C69/62 , C07C69/52
CPC分类号： C08F114/18 , C07C69/653 , C07C2601/14 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 is a divalent hydrocarbon group, R3 is H or a monovalent hydrocarbon group, or R2 and R3, taken together, may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions.
摘要翻译：具有式（1）或（2）的可聚合氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2是二价烃基，R SUP > 3是H或一价烃基，或R 2和R 3一起可以形成环，R 4， SUP>是H，OH或一价烃基，R 5是酸不稳定基团。它们作为制备用于制造辐射敏感抗蚀剂组合物的聚合物的单体最有用。

56. 发明申请

US20050031989A1 Resist polymer, resist composition and patterning process 有权
标题翻译：抗蚀聚合物，抗蚀剂组成和图案化工艺
公开(公告)号：US20050031989A1
公开(公告)日：2005-02-10
申请号：US10911676
申请日：2004-08-05
申请人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
发明人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
IPC分类号： G03F7/004 , C08F220/18 , C08F220/26 , C08F220/28 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： C08F220/18 , C08F220/26 , G03F7/0397 , Y10S430/111
摘要： A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 are H or CH3, R4 and R5 are H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein R7 is C1-C10 alkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
摘要翻译：包含式（1），（2），（3）和（4）的重复单元的聚合物在酸的作用下增加碱显影剂中的溶解速率。 R 1，R 2，R 3和R 6是H或CH 3，R 4和R 5是H或OH，X是具有双环[ 2.2.1]庚烷骨架，由式（X-1）至（X-4）中的任一个表示：其中R 7为C 1 -C 10烷基，Y为具有金刚烷结构的叔烷基。包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和最小化的接近偏压，并且借助于用于VLSI制造的电子束或深UV的微图案化。

57. 发明授权

US07135270B2 Resist polymer, resist composition and patterning process 有权
标题翻译：抗蚀聚合物，抗蚀剂组成和图案化工艺
公开(公告)号：US07135270B2
公开(公告)日：2006-11-14
申请号：US10911676
申请日：2004-08-05
申请人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
发明人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , C08F124/00
CPC分类号： C08F220/18 , C08F220/26 , G03F7/0397 , Y10S430/111
摘要： A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 are H or CH3, R4 and R5 are H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein R7 is C1–C10 alkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
摘要翻译：包含式（1），（2），（3）和（4）的重复单元的聚合物在酸的作用下增加碱显影剂中的溶解速率。 R 1，R 2，R 3和R 6是H或CH 3 N >，R 4和R 5是H或OH，X是具有双环[2.2.1]庚烷骨架的叔外烷基，由式（X-1）至（X-4）：其中R 7为C 1 -C 10烷基，Y为叔烷基具有金刚烷结构的组。包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和最小化的接近偏压，并且借助于用于VLSI制造的电子束或深UV的微图案化。

58. 发明授权

US07084303B2 Tertiary amine compounds having an ester structure and processes for preparing same 有权
标题翻译：具有酯结构的叔胺化合物及其制备方法
公开(公告)号：US07084303B2
公开(公告)日：2006-08-01
申请号：US10127120
申请日：2002-04-22
申请人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
发明人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： C07C211/00
CPC分类号： C07D307/33 , C07C229/12 , C07C229/16 , C07C2601/14 , C07D307/12 , C07D309/12 , C07D317/24 , G03F7/0045 , G03F7/0388 , G03F7/0392 , G03F7/0397
摘要： The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.
摘要翻译：本发明提供了式（R 1）2 OCH 2 CH 2 N酯的含酯基的叔胺化合物 > N（CH 2 CH 2）2 CO 2 N 2 - （CH 2）3 - n - 当用作化学放大光刻中的添加剂时，可以产生具有高分辨率和优异聚焦余量的光致抗蚀剂。本发明还提供了一种方法，其包括使伯胺或仲胺化合物与丙烯酸酯化合物进行迈克尔加成步骤; 一种方法包括以下步骤：将一乙醇胺或二乙醇胺加入到丙烯酸酯化合物中以形成含酯基的胺化合物并将R 1 O 2基团引入所得的含酯基胺复合; 以及包括使含酯基的叔胺与R 2 OH进行酯交换反应的步骤的方法。

59. 发明申请

US20050250924A1 Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process 有权
标题翻译：具有内酯结构的新型叔（甲基）丙烯酸酯，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20050250924A1
公开(公告)日：2005-11-10
申请号：US10671791
申请日：2003-09-29
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa
IPC分类号： G03F7/039 , C07D307/00 , C07D307/94 , C08F20/28 , C08F118/02 , C08F220/18 , C08F220/28
CPC分类号： C07D307/77 , C08F220/18 , C08F220/28
摘要： Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
摘要翻译：具有内酯结构的新型叔（甲基）丙烯酸酯化合物可聚合成具有改善的透明度的聚合物，特别是在准分子激光的曝光波长和耐干蚀刻性下。包含聚合物的抗蚀剂组合物对高能量辐射敏感，具有高分辨率，并且借助电子束或深紫外线照射微图案。

60. 发明申请

US20050142491A1 Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods 审中-公开
标题翻译：具有脂环结构的新型环氧化合物，高分子化合物，抗蚀剂材料和图案化方法
公开(公告)号：US20050142491A1
公开(公告)日：2005-06-30
申请号：US11057008
申请日：2005-02-11
申请人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe
IPC分类号： C08F34/00 , C08G61/12 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0397 , G03F7/0395
摘要： Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH2— may be substituted by an oxygen atom, or R1 and R2 may be coupled together to form an aliphatic hydrocarbon ring; R3 represents a linear, branched or cyclic C1-10 alkyl group or a C1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH2, oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.
摘要翻译：提供了一种新颖的环氧化合物，在光刻中可用作制备对基材透明性和亲和性优异的光致抗蚀剂材料的单体。更具体地，提供由下式（1）表示的环氧化合物：其中R 1和R 2各自独立地表示氢原子或直链，支链或其中一个或多个构成碳原子上的氢原子可以被一个或多个卤素原子部分或全部取代的环状C 1-10烷基，或者构成-CH 2 可以被氧原子取代，或者R 1和R 2可以连接在一起形成脂族烃环; R 3表示直链，支链或环状C 1-10烷基或C 1-15酰基或烷氧基羰基，其中氢原子其一个或多个构成碳原子可以部分或全部被一个或多个卤素原子取代; X表示CH 2，氧或硫; k代表0或1; m表示0〜5的整数。和具有可从其获得的重复单元的高分子化合物。

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