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51. 发明授权

US6138378A Wet gas processing method and the apparatus using the same 失效
标题翻译：湿气处理方法及其使用方法
公开(公告)号：US6138378A
公开(公告)日：2000-10-31
申请号：US341433
申请日：1999-09-08
申请人： Toru Takashina , Naoyuki Kamiyama , Takeo Shinoda , Hiromitsu Nagayasu , Susumu Okino , Masakazu Onizuka , Koichiro Iwashita , Satoshi Nakamura , Kenji Inoue
发明人： Toru Takashina , Naoyuki Kamiyama , Takeo Shinoda , Hiromitsu Nagayasu , Susumu Okino , Masakazu Onizuka , Koichiro Iwashita , Satoshi Nakamura , Kenji Inoue
IPC分类号： B01D53/50 , B01D47/06 , B01D53/14 , B01D53/18 , B01D53/34 , B01D53/77 , B01D53/78 , B01D53/80 , F26B7/00
CPC分类号： B01D53/80 , B01D53/1412 , B01D53/18 , B01D53/504 , B01D53/78 , F23J2215/20 , F23J2219/40
摘要： This invention is related to a wet gas process which would not require a spray pump, and which would allow the absorption liquid to be recovered smoothly even if the flow velocity of the gases entrained to the liquid should decrease. A wet gas processing apparatus in which the absorption liquid collected in the first liquid storage tank is sprayed in a specified direction (which may be upward, horizontal or downward) by a discharge unit consisting of spray nozzles (14) or the like in the absorption tower. The sprayed liquid is brought into contact with the exhaust gases which are conducted into the tower, and the targeted components of the gases are absorbed and removed. This processing apparatus is distinguished by the following. The first liquid storage tank for the absorption liquid comprises a pressure tank (11) which generates a pressurized gas in the space above the surface of the collected liquid (11a). The increased pressure of the pressurized gas is employed to spray the liquid collected in the pressurized tank from the spray nozzle unit in the absorption tower. This apparatus is further distinguished as the following. This invention has overflow ports which generate a virtually horizontal overflow or source flow. The absorption liquid propelled by the overflow ports makes orthogonal contact with the flow of exhaust gases, which results in both atomization of the liquid and liquid-vapor contact.
摘要翻译： PCT No.PCT / JP98 / 05062 Sec。 371 1999年9月8日第 102（e）日期1999年9月8日PCT提交1998年11月10日PCT公布。出版物WO99 / 24148 日期1999年5月20日本发明涉及不需要喷雾泵的湿法气体处理，即使吸入液体的气体的流速降低也能使吸收液体顺利地回收。一种湿气处理装置，其中收集在第一液体储罐中的吸收液体通过在吸收中由喷嘴（14）等组成的排出单元在特定方向（可以是向上，水平或向下）喷射）塔。喷射的液体与被引导到塔中的废气接触，并且气体的目标成分被吸收和去除。该处理装置的区别在于以下。用于吸收液体的第一液体储存罐包括在收集液体（11a）的表面上方的空间中产生加压气体的压力罐（11）。加压气体的增加的压力用于将从加压罐中收集的液体从吸收塔中的喷嘴单元喷射。该装置进一步区别如下。本发明具有产生实质上水平的溢流或源流的溢流口。由溢流口推动的吸收液体与废气流正交接触，导致液体雾化和液 - 气接触。

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