会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 51. 发明授权
    • Semiconductor process chamber and processing method
    • 半导体工艺室和加工方法
    • US6159297A
    • 2000-12-12
    • US65384
    • 1998-04-23
    • Harald HerchenWilliam BrownIhi NzeadibeDan Kujaneck
    • Harald HerchenWilliam BrownIhi NzeadibeDan Kujaneck
    • C23F4/00C23C16/44C23C16/455H01J37/32H01L21/205H01L21/302H01L21/3065H05H1/46C23C16/00
    • C23C16/45565H01J37/3244
    • A process chamber 15 for processing a semiconductor substrate comprising a support 20 for holding the substrate, a gas distributor 35 for distributing process gas into the process chamber, a gas energizer for energizing the process gas, and an exhaust 60 for exhausting process gas from the process chamber. The gas distributor 35 comprises monocrystalline material that provides increased erosion resistance and withstands high temperatures. Preferably, a thermal expansion isolator 115 supports the gas distributor 35 to allow portions of the gas distributor 35 to thermally expand different amounts. The gas distributor 35 can also comprise a transparent window 170 of solid material that transmits an light beam therethrough. Also, the gas distributor 35 can comprise a transparent portion facing the substrate 25 that allows light emissions from the energized gas to pass through without being reflected back onto the substrate.
    • 一种用于处理半导体衬底的处理室15,包括用于保持衬底的支撑件20,用于将处理气体分配到处理室中的气体分配器35,用于激励处理气体的气体激发器,以及用于从 处理室。 气体分配器35包括提供增加的耐腐蚀性并承受高温的单晶材料。 优选地,热膨胀隔离器115支撑气体分配器35以允许气体分布器35的一部分热膨胀不同的量。 气体分配器35还可以包括透射光束的固体材料的透明窗口170。 此外,气体分配器35可以包括面向基板25的透明部分,其允许来自激发气体的光发射通过而不被反射回到基板上。