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51. 发明授权

US07420164B2 Objective lens, electron beam system and method of inspecting defect 有权
标题翻译：物镜，电子束系统和检测缺陷的方法
公开(公告)号：US07420164B2
公开(公告)日：2008-09-02
申请号：US11136668
申请日：2005-05-25
申请人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , H01J2237/1534 , H01J2237/28
摘要： An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.
摘要翻译：可以提高电子束系统或使用其中以高电流密度照射电子束并且可以提高图像投影光学系统的二次电子束的透射率的电子束系统的装置的方法，并且哪些可以紧凑的尺寸。样品S的表面被分成多个条纹区域，其又分成矩形主场。主场进一步分为多个方形子场。以子场为单位重复照射电子束和形成二维图像。在物体侧形成由物镜的内，外磁极形成的磁隙，分别形成内磁极和外磁极的外侧面和内侧面，形成磁隙具有相对于光轴具有45°或更大角度的凸起的圆锥形状的每一部分。

52. 发明申请

US20080173814A1 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
公开(公告)号：US20080173814A1
公开(公告)日：2008-07-24
申请号：US12068484
申请日：2008-02-07
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： G01N23/00 , G21K5/04
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

53. 发明授权

US07176459B2 Electron beam apparatus 有权
标题翻译：电子束装置
公开(公告)号：US07176459B2
公开(公告)日：2007-02-13
申请号：US10999124
申请日：2004-11-30
申请人： Kenji Watanabe , Tohru Satake , Mamoru Nakasuji , Takeshi Murakami , Tsutomu Karimata , Nobuharu Noji , Keiichi Tohyama , Masahiro Hatakeyama
发明人： Kenji Watanabe , Tohru Satake , Mamoru Nakasuji , Takeshi Murakami , Tsutomu Karimata , Nobuharu Noji , Keiichi Tohyama , Masahiro Hatakeyama
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： H01J37/28 , G01N23/225 , H01J2237/24435
摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.
摘要翻译：提供一种用于以高通量和高S / N比来评估样品的电子束装置。当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。通过控制偏转器，一次电子束入射角约为35°以上的入射角。从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。

54. 发明申请

US20050133733A1 Electron beam system and method of manufacturing devices using the system 失效
公开(公告)号：US20050133733A1
公开(公告)日：2005-06-23
申请号：US11034873
申请日：2005-01-14
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , G21G5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

55. 发明授权

US06853143B2 Electron beam system and method of manufacturing devices using the system 有权
标题翻译：电子束系统及其制造方法
公开(公告)号：US06853143B2
公开(公告)日：2005-02-08
申请号：US10337420
申请日：2003-01-07
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , H01J7/24 , F16K5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要翻译：一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。成形孔径和NA孔径布置在电子枪的前部位置。由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

56. 发明授权

US07829871B2 Sheet beam-type testing apparatus 有权
标题翻译：片式梁式试验机
公开(公告)号：US07829871B2
公开(公告)日：2010-11-09
申请号：US12177733
申请日：2008-07-22
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J40/14 , G02B26/08
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

57. 发明授权

US07417236B2 Sheet beam-type testing apparatus 有权
标题翻译：片式梁式试验机
公开(公告)号：US07417236B2
公开(公告)日：2008-08-26
申请号：US11360704
申请日：2006-02-24
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J37/20
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

58. 发明申请

US20080173815A1 Electron beam apparatus and device production method using the electron beam apparatus 审中-公开
公开(公告)号：US20080173815A1
公开(公告)日：2008-07-24
申请号：US12068589
申请日：2008-02-08
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.

59. 发明授权

US07109484B2 Sheet beam-type inspection apparatus 有权
标题翻译：片状梁型检查装置
公开(公告)号：US07109484B2
公开(公告)日：2006-09-19
申请号：US10989368
申请日：2004-11-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

60. 发明授权

US07244932B2 Electron beam apparatus and device fabrication method using the electron beam apparatus 失效
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US07244932B2
公开(公告)日：2007-07-17
申请号：US09985323
申请日：2001-11-02
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： H01J37/28 , H01J37/256 , G01N23/22
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
摘要翻译：本发明的目的是提供一种改进的电子束装置，其处理量，精度等得到改进。本发明的电子束装置的特征之一是具有多个光学系统，每个光学系统包括用于扫描和照射具有多个一次电子束的样品的初级电子光学系统; 用于检测通过用一次电子束照射样品而发射的多个次级光束的检测器装置; 以及用于将二次电子束从样品引导到检测器装置的二次电子光学系统; 全部配置成使得多个光学系统用其一次电子束扫描样品的不同区域，并且检测从各个区域中的每一个发射的各个二次电子束。这是什么使得更高的吞吐量成为可能。为了提供高精度，该装置被配置为使得其光学系统的轴线可以通过各种方法对准和校正像差。

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