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51. 发明申请

US20120219912A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219912A1
公开(公告)日：2012-08-30
申请号：US13404238
申请日：2012-02-24
申请人： Koji ICHIKAWA , Satoshi YAMAGUCHI , Yuki SUZUKI
发明人： Koji ICHIKAWA , Satoshi YAMAGUCHI , Yuki SUZUKI
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom.
摘要翻译：抗蚀剂组合物包括（A1）具有由式（I）表示的结构单元的树脂，（A2）树脂在碱性水溶液中不溶或难溶，但通过酸的作用变得可溶于碱性水溶液和（B）具有酸不稳定基团的酸发生剂。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基。

52. 发明申请

US20120219905A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219905A1
公开(公告)日：2012-08-30
申请号：US13405068
申请日：2012-02-24
申请人： Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
发明人： Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/027 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , Y10S430/121
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液，（B）酸产生剂，和（D）选自由式（II1）表示的化合物和式（II2）表示的化合物中的至少一种化合物，其中R1，A1，R2，R6 X1，X2，R3，R4和R5在本说明书中定义。

53. 发明申请

US20120219898A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219898A1
公开(公告)日：2012-08-30
申请号：US13404054
申请日：2012-02-24
申请人： Koji ICHIKAWA , Akira KAMABUCHI
发明人： Koji ICHIKAWA , Akira KAMABUCHI
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/38 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111
摘要： A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator, wherein R1, A1, R2, R3, and ring X1 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：（A1）具有由式（I）表示的结构单元的树脂，（A2）具有由式（II）表示的结构单元并且在碱性水溶液中不溶或难溶，但变得可溶于碱的树脂水溶液，（B）酸产生剂，其中R1，A1，R2，R3和X1定义在说明书中。

54. 发明申请

US20120178021A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：树脂和光学组合物包括它们
公开(公告)号：US20120178021A1
公开(公告)日：2012-07-12
申请号：US13345941
申请日：2012-01-09
申请人： Hyungjoo KIM , Akira KAMABUCHI , Koji ICHIKAWA
发明人： Hyungjoo KIM , Akira KAMABUCHI , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C08F228/06
CPC分类号： C08F20/38 , C07D327/04 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12- (a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中R 1表示任选具有一个或多个卤素原子，氢原子或卤素原子的C 1 -C 6烷基，T 1表示C 4 -C 34磺内酯具有一个或多个取代基的环基，Z1表示任选具有一个或多个取代基的C1-C6烷二基，或由式（a-1）表示的基团：-A10XX-X-A11-X11-A12-（a -1）其中X10和X11各自独立地表示-O - ， - NH - ， - CO - ， - CO-O-，-O-CO-，-CO-NH-或-NH-CO-，A10，A11和 A 12各自独立地表示任选具有一个或多个取代基的C 1 -C 5二价脂族烃基，s表示0或1，Z 2表示单键或-CO-。

55. 发明申请

US20120122034A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：树脂和光学组合物包括它们
公开(公告)号：US20120122034A1
公开(公告)日：2012-05-17
申请号：US13290618
申请日：2011-11-07
申请人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C08F28/06
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

56. 发明申请

US20120100483A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120100483A1
公开(公告)日：2012-04-26
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

57. 发明申请

US20110123926A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110123926A1
公开(公告)日：2011-05-26
申请号：US12953606
申请日：2010-11-24
申请人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
发明人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and RC6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和RC 6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或R c4和R c6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

58. 发明申请

US20100304294A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100304294A1
公开(公告)日：2010-12-02
申请号：US12786799
申请日：2010-05-25
申请人： Koji ICHIKAWA , Masako Sugihara , Tatsuro Masuyama
发明人： Koji ICHIKAWA , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/004 , C07D307/00 , G03F7/20 , C07D307/04
CPC分类号： C07D307/80 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

59. 发明申请

US20130022922A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022922A1
公开(公告)日：2013-01-24
申请号：US13552273
申请日：2012-07-18
申请人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
发明人： Koji ICHIKAWA , Yuichi MUKAI , Satoshi YAMAMOTO
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, X21 and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸衍生物和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，R23，R24，R25，X21和Z1 +在说明书中定义。

60. 发明申请

US20130022919A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022919A1
公开(公告)日：2013-01-24
申请号：US13551864
申请日：2012-07-18
申请人： Koji ICHIKAWA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Satoshi YAMAGUCHI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸式发生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W1和Z +在说明书中定义。

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