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51. 发明授权

US07101816B2 Methods for adaptive real time control of a thermal processing system 有权
标题翻译：热处理系统的自适应实时控制方法
公开(公告)号：US07101816B2
公开(公告)日：2006-09-05
申请号：US10747842
申请日：2003-12-29
申请人： Sanjeev Kaushal , Kenji Sugishima , Pradeep Pandey
发明人： Sanjeev Kaushal , Kenji Sugishima , Pradeep Pandey
IPC分类号： G06F19/00
CPC分类号： H01L21/67248
摘要： Methods for adaptive real time control of a system for thermal processing substrates, such as semiconductor wafers and display panels. Generally, the method includes creating a dynamic model of the thermal processing system, incorporating wafer bow in the dynamic model, coupling a diffusion-amplification model into the dynamic thermal model, creating a multivariable controller, parameterizing the nominal setpoints, creating a process sensitivity matrix, creating intelligent setpoints using an efficient optimization method and process data, and establishing recipes that select appropriate models and setpoints during run-time.
摘要翻译：用于热处理衬底（例如半导体晶片和显示面板）的系统的自适应实时控制的方法。通常，该方法包括创建热处理系统的动态模型，将动态模型中的晶圆弓结合在一起，将扩散放大模型耦合到动态热模型中，创建多变量控制器，参数化标称设定点，创建过程灵敏度矩阵，使用有效的优化方法和过程数据创建智能设定点，以及建立在运行时选择合适的模型和设定值的配方。

52. 发明申请

US20060166501A1 Method and apparatus for monolayer deposition 有权
标题翻译：单层沉积的方法和装置
公开(公告)号：US20060166501A1
公开(公告)日：2006-07-27
申请号：US11043459
申请日：2005-01-26
申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
发明人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
IPC分类号： H01L21/44
CPC分类号： C23C16/45527 , C23C16/45546 , C23C16/45557 , C23C16/46 , C23C16/52
摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.
摘要翻译：提出了一种包括多变量控制器的自适应实时热处理系统。该方法包括创建MLD处理系统的动态模型，并将虚拟传感器并入动态模型中。该方法包括使用包括智能设定点，动态模型和/或虚拟传感器的过程配方。

53. 发明申请

US20050167514A1 Adaptive real time control of a reticle/mask system 失效
标题翻译：光罩/掩模系统的自适应实时控制
公开(公告)号：US20050167514A1
公开(公告)日：2005-08-04
申请号：US10769623
申请日：2004-01-30
申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
发明人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
IPC分类号： F23N1/00 , G03F20060101 , G03F1/14 , G03F7/20
CPC分类号： G03F1/68 , G03F1/78 , H01L21/67248
摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller. Generally, the method includes creating a dynamic model of the thermal processing system; incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints; creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time.
摘要翻译：提出了一种包括多变量控制器的自适应实时热处理系统。通常，该方法包括创建热处理系统的动态模型; 在动态模型中结合掩模/掩模曲率; 将扩散扩增模型耦合到动态热模型中; 创建一个多变量控制器; 将标称设定值参数化为智能设定点的向量; 创建一个过程敏感性矩阵; 使用有效的优化方法和过程数据创建智能设定点; 并建立在运行期间选择合适的模型和设定值的配方。

54. 发明申请

US20050149886A1 Methods for adaptive real time control of a thermal processing system 有权
标题翻译：热处理系统的自适应实时控制方法
公开(公告)号：US20050149886A1
公开(公告)日：2005-07-07
申请号：US10747842
申请日：2003-12-29
申请人： Sanjeev Kaushal , Kenji Sugishima , Pradeep Pandey
发明人： Sanjeev Kaushal , Kenji Sugishima , Pradeep Pandey
IPC分类号： F25B21/02 , H01L21/00 , G06F17/50
CPC分类号： H01L21/67248
摘要： Methods for adaptive real time control of a system for thermal processing substrates, such as semiconductor wafers and display panels. Generally, the method includes creating a dynamic model of the thermal processing system, incorporating wafer bow in the dynamic model, coupling a diffusion-amplification model into the dynamic thermal model, creating a multivariable controller, parameterizing the nominal setpoints, creating a process sensitivity matrix, creating intelligent setpoints using an efficient optimization method and process data, and establishing recipes that select appropriate models and setpoints during run-time.
摘要翻译：用于热处理衬底（例如半导体晶片和显示面板）的系统的自适应实时控制的方法。通常，该方法包括创建热处理系统的动态模型，将动态模型中的晶圆弓结合在一起，将扩散放大模型耦合到动态热模型中，创建多变量控制器，参数化标称设定点，创建过程灵敏度矩阵，使用有效的优化方法和过程数据创建智能设定点，以及建立在运行时选择合适的模型和设定值的配方。

55. 发明授权

US5541023A X-ray mask, method of manufacturing the x-ray mask and exposure method using the x-ray mask 失效
标题翻译： X射线掩模，X射线掩模的制造方法和使用x射线掩模的曝光方法
公开(公告)号：US5541023A
公开(公告)日：1996-07-30
申请号：US67623
申请日：1993-05-28
申请人： Kazuaki Kondo , Kenji Sugishima
发明人： Kazuaki Kondo , Kenji Sugishima
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/22
摘要： An X-ray absorbing film including an X-ray absorbing pattern of an X-ray mask uses .beta.-crystalline tantalum having the plane orientation of (002). The .beta.-crystalline tantalum film is formed by depositing tantalum on an amorphous layer. Because the film stress change due to heat is small, the strain of the X-ray absorbing pattern formed through a thermal treatment process is decreased.When heating the X-ray absorbing film before implanting ions into the film, the stress change of the film after implanted with ions decreases and the X-ray absorbing pattern strain also decreases.
摘要翻译：包括X射线掩模的X射线吸收图案的X射线吸收膜使用平面取向为（002）的β晶体钽。通过在非晶层上沉积钽来形成β晶体钽膜。由于由于热引起的膜应力变化小，所以通过热处理工艺形成的X射线吸收图案的应变减小。在将离子注入膜内之前加热X射线吸收膜时，注入离子后的膜的应力变化减小，X射线吸收图案应变也降低。

56. 发明授权

US4684315A Frictionless supporting apparatus 失效
标题翻译：无摩擦支撑装置
公开(公告)号：US4684315A
公开(公告)日：1987-08-04
申请号：US824930
申请日：1986-01-31
申请人： Kenji Sugishima , Hiroshi Yasuda
发明人： Kenji Sugishima , Hiroshi Yasuda
IPC分类号： H01J37/305 , F16C39/06 , G03F7/20 , H01J37/20 , H01L21/027 , H01L21/30 , B23Q1/26 , G21K5/10
CPC分类号： H01L21/30 , F16C32/0423 , F16C32/0434 , H01J37/20
摘要： A frictionless supporting apparatus comprising a horizontally plane working table having magnet portions on its peripheries. Pairs of stationary magnets define therebetween a vertical space into which the working table is inserted. Magnetic repulsion between the magnet portions of the working table and the pairs of stationary magnets frictionlessly hold the working table between the pairs of stationary magnets. The working table also has vertical guide portions made of magnets extending along a predetermined one horizontal direction. A plane auxiliary table is arranged substantially in parallel to the working table. A motor is mounted on the auxiliary table for moving the working table in the predetermined one horizontal direction with respect to the auxiliary table. Pairs of guide magnets are provided on the auxiliary table, defining therebetween a horizontal space into which the guide portions of the working table are inserted. Magnetic repulsion between the vertical guide portions of the working table and the pairs of magnets of the auxiliary table frictionlessly guide the working table along the pairs of guide magnets, when the working table is moved in the predetermined one horizontal direction with respect to the auxiliary table. The auxiliary table is also frictionlessly supported and guided in a horizontal direction perpendicular to the predetermined direction with respect to the stationary base.
摘要翻译：一种无摩擦支撑装置，包括在其周边上具有磁铁部分的水平平面工作台。成对的固定磁体在其间限定了工作台插入其中的垂直空间。工作台的磁体部分与固定磁体对之间的磁性斥力将工作台无阻挡地保持在固定磁体对之间。工作台还具有沿着预定的一个水平方向延伸的磁体制成的垂直导向部。平面辅助工作台基本上平行于工作台布置。电动机安装在辅助工作台上，用于相对于辅助工作台在预定的一个水平方向上移动工作台。导向磁铁对设置在辅助工作台上，在其间限定了工作台的引导部分插入其中的水平空间。当工作台相对于辅助工作台在预定的一个水平方向上移动时，工作台的垂直引导部分和辅助工作台的磁体对之间的磁性斥力沿着成对的导向磁体无摩擦地引导工作台。辅助工作台也在与固定基座垂直于预定方向的水平方向上无摩擦地支撑和引导。

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