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    • 51. 发明授权
    • Film forming device
    • 成膜装置
    • US08359999B2
    • 2013-01-29
    • US12863136
    • 2008-12-24
    • Yoshinari KondoKentaro SuzukiEichi MatsumotoMiyuki Tajima
    • Yoshinari KondoKentaro SuzukiEichi MatsumotoMiyuki Tajima
    • B05C13/00B05C13/02B05C21/00B05C11/11C23C16/00
    • C23C14/042H01L21/682
    • There is provided a film-forming device capable of advantageously superimposing and securing a substrate, a weight member, and/or a magnetic body while maintaining the precisely aligned substrate and mask in a superimposed state. The film-forming device is provided with a film-forming mask 5 and film-forming means for forming a thin film on the substrate 6 on which the film-forming mask 5 has been superimposed. The film-forming device comprises an aligning mechanism for moving the film-forming mask 5 and the substrate 6 relative to one another so that the film-forming mask 5 and the substrate 6 are aligned; a first superimposing and securing mechanism for superimposing and securing the substrate 6 and the film-forming mask 5 aligned by the aligning mechanism; and a second superimposing and securing mechanism for superimposing and securing the substrate superimposed and secured to the film-forming mask 5 by the first superimposing and securing mechanism, and a magnetic body 14 for magnetically attracting to an obverse surface side of the substrate 6 the film-forming mask 5 or a weight member 8 in the form of a sheet for causing the substrate 6 to bend and causing the substrate 6 to be affixably superimposed on the film-forming mask 5 so that the film-forming mask 5 is affixably superimposed on the substrate 6, the weight member being disposed on a reverse surface of the substrate 6.
    • 提供了一种能够有效地叠加和固定基板,配重构件和/或磁体的成膜装置,同时保持精确对准的基板和掩模处于叠加状态。 成膜装置设置有成膜掩模5和用于在其上叠加有成膜掩模5的基板6上形成薄膜的成膜装置。 成膜装置包括用于使成膜掩模5和基板6相对于彼此移动以使成膜掩模5和基板6对准的对准机构; 用于叠加和固定由对准机构对准的基板6和成膜掩模5的第一重叠和固定机构; 以及第二叠加和固定机构,用于通过第一叠加和固定机构叠加并固定到成膜掩模5上的基板6和用于磁吸附到基板6的正面侧的磁体14, 成膜掩模5或片材形式的配重构件8,用于使基板6弯曲并且使基板6被可固定地叠加在成膜掩模5上,使得成膜掩模5可固定地叠置 在基板6上,配重部件设置在基板6的背面。
    • 52. 发明申请
    • Battery Pack, Electronic Appliance, And Method of Detecting Remaining Amount of Battery
    • 电池组,电子设备及检测剩余电量的方法
    • US20090171598A1
    • 2009-07-02
    • US11912845
    • 2007-02-26
    • Ryoichi NakashimaMasashi KumadaHideyuki SatoYoshio HaradaMichihiro KanekoKentaro Suzuki
    • Ryoichi NakashimaMasashi KumadaHideyuki SatoYoshio HaradaMichihiro KanekoKentaro Suzuki
    • G01R31/36
    • G01R19/16542G01R31/3648G01R31/3655G01R31/3679H01M10/052H01M10/44H01M10/48H02J7/0047H02J2007/005
    • A battery pack has a charge and discharge count measuring part (131) configured to measure the number of times of charges and discharges of a secondary battery based on the summed value of the charge current for the secondary battery, and a decay rate output part (132) configured to compute a decay rate that indicates a degree of decay of the secondary battery based on the number of times of charges and discharges measured by the charge and discharge count measuring part (131) and to output it to a device being a discharge load. For example, the charge and discharge count measuring part (131) repeatedly sums the detected values of the charge current to a predetermined threshold, and counts up the number of times of charges and discharges every time when the summed value reaches the threshold. Accordingly, even though charges and discharges are repeated at finer steps in a relatively narrow voltage range, the number of times of charges and discharges can be counted accurately, and the computing accuracy of the decay rate is improved. In the battery pack in which the secondary battery is accommodated, parameters for detecting the remaining amount of the battery are detected more accurately.
    • 电池组具有充电和放电计数测量部分(131),其被配置为基于二次电池的充电电流的相加值和衰减速率输出部分(...)来测量二次电池的充电和放电的次数 132),被配置为基于由所述充放电计数测量部(131)测量的充电和放电的次数来计算指示所述二次电池的衰减程度的衰减率,并将其输出到放电 加载。 例如,充电和放电计数测量部分(131)将检测到的充电电流的值重复地相加到预定阈值,并且每当累加值达到阈值时对每次充电和放电的次数进行计数。 因此,即使在比较窄的电压范围内以更细的步骤重复充电和放电,也可以精确地计数充放电次数,提高衰减率的计算精度。 在容纳二次电池的电池组中,更准确地检测用于检测电池剩余量的参数。
    • 53. 发明申请
    • Plating Solution Recovery Apparatus and Plating Solution Recovery Method
    • 电镀液回收装置及电镀液回收方法
    • US20090078577A1
    • 2009-03-26
    • US12226889
    • 2007-08-17
    • Kentaro SuzukiKei YukiFumio Aoki
    • Kentaro SuzukiKei YukiFumio Aoki
    • C25D21/22C25B15/08
    • C25D17/00C25D3/20C25D7/0614C25D21/18C25D21/22
    • A plating solution recovery apparatus for electroplating, the apparatus comprises a circulation tank; a sludge removing device; a concentrating device; an iron compound crystallizing device; an iron compound separating device; an iron compound redissolving device; an iron ion removing device; pipelines sequentially connecting the circulation tank, the sludge removing device, the concentrating device, the iron compound crystallizing device, the iron compound separating device, the iron compound redissolving device, and then the iron ion removing device in a downstream direction from a base point coincident with the circulation tank; a pipeline connecting from the iron ion removing device to the circulation tank; a pipeline connecting from the iron compound separating device to the circulation tank; and a flow path changing device connecting to the circulation tank and provided in at least one portion selected from a group of portions, respectively, between the sludge removing device and the concentrating device, between the concentrating device and iron compound crystallizing device, and between the iron compound crystallizing device and the iron compound separating device. With the apparatus being used, the plating solution can be recovered in the manner that sludge and iron are removed from the plating solution used for electroplating of a steel strip. Further, with the apparatus being used, even when stopping the operation of a device(s) related to iron removal, a continuous electroplating operation can be maintained without reducing the operation rate of the sludge removing device.
    • 一种用于电镀的电镀液回收装置,该装置包括循环罐; 污泥去除装置; 集中装置; 铁化合物结晶装置; 铁化合物分离装置; 铁化合物再溶解装置; 铁离子去除装置; 管道依次连接循环罐,污泥去除装置,浓缩装置,铁化合物结晶装置,铁化合物分离装置,铁化合物再溶解装置,然后从基点重合的下游方向的铁离子去除装置 与循环罐; 从铁离子去除装置连接到循环罐的管道; 从铁化合物分离装置连接到循环罐的管道; 以及流路切换装置,其连接到所述循环罐,并且设置在所述浓缩装置与所述铁化合物结晶装置之间的所述污泥除去装置和所述浓缩装置之间的至少一部分中,所述至少一部分选自所述浓缩装置和所述浓缩装置之间, 铁化合物结晶装置和铁化合物分离装置。 在使用该设备的情况下,可以以从用于电镀钢板的电镀液中除去污泥和铁的方式来回收电镀液。 此外,使用该装置,即使停止与除铁有关的装置的操作,也可以维持连续的电镀操作,而不会降低污泥去除装置的操作速度。
    • 54. 发明申请
    • Method of manufacturing a metal pattern
    • 金属图案的制造方法
    • US20080008840A1
    • 2008-01-10
    • US11545695
    • 2006-10-10
    • Kentaro SuzukiMasanori TachibanaYukinori Ikegawa
    • Kentaro SuzukiMasanori TachibanaYukinori Ikegawa
    • B05D7/00
    • G11B5/3912G11B5/3163G11B5/855
    • Even when materials with different grinding rates, such as a metal layer and an insulating layer, are present on a substrate, a method of manufacturing can grind the surface of the substrate to form a flat surface and can grind the metal layer to a predetermined thickness without fluctuations. The method includes a step of forming an insulating film on a substrate surface to cover a surface of a metal layer that has a predetermined pattern and then forming a stopper film on a surface of the insulating film; a step of forming a resist pattern that exposes only bulging parts of the insulating film that cover the metal layer and then removing the stopper film from the surface of the bulging parts to form a stopper layer on a surface of the insulating film covered by the resist pattern; a grinding step of grinding the surface of the substrate to grind the bulging parts as far as a position regulated by the stopper layer; and a step of removing the stopper layer from the surface of the insulating film and then carrying out finish-up grinding on the surface of the substrate.
    • 即使当基板上存在诸如金属层和绝缘层的具有不同研磨速度的材料时,制造方法可以研磨基板的表面以形成平坦表面,并且可以将金属层研磨成预定厚度 没有波动。 该方法包括在基板表面上形成绝缘膜以覆盖具有预定图案的金属层的表面,然后在绝缘膜的表面上形成阻挡膜的步骤; 形成抗蚀剂图案的步骤,该抗蚀剂图案仅暴露仅覆盖金属层的绝缘膜的凸出部分,然后从凸出部分的表面去除阻挡膜,以在由抗蚀剂覆盖的绝缘膜的表面上形成阻挡层 模式; 研磨步骤,研磨所述基材的表面以研磨所述凸出部分至所述阻挡层调节的位置; 以及从绝缘膜的表面除去阻挡层,然后在基板的表面进行完成研磨的步骤。
    • 55. 发明授权
    • Fabry-Perot filter, wavelength-selective infrared detector and infrared gas analyzer using the filter and detector
    • 法布里 - 珀罗滤光片,波长选择红外探测器和红外线气体分析仪采用滤光片和探测器
    • US06590710B2
    • 2003-07-08
    • US09777901
    • 2001-02-05
    • Hitosh HaraNaoki KishiMakoto NoroHideto IwaokaKentaro Suzuki
    • Hitosh HaraNaoki KishiMakoto NoroHideto IwaokaKentaro Suzuki
    • G02B2700
    • G01J3/26G01N21/3504
    • A Fabry-Perot filter device for selectively transmitting three wavelength bands of infrared radiation, including a reference light band, wherein the filter device comprises a fixed mirror formed on a substrate; a movable mirror arranged opposite to the fixed mirror with a gap formed therebetween so that the movable mirror is displaced with respect to the fixed mirror by applying an external force; a fixed electrode formed on the fixed mirror; and a movable electrode formed on the movable mirror and arranged opposite to the fixed electrode wherein the movable electrode is displaced by applying a potential difference across the fixed and movable electrodes so that the width of the gap is varied in at least three steps, whereby at least three wavelength bands of infrared radiation are selectively transmitted through the filter device.
    • 一种用于选择性地透射包括参考光带的红外辐射的三个波长带的法布里 - 珀罗滤波器装置,其中所述滤波器装置包括形成在基板上的固定反射镜; 与固定反射镜相对设置的可动镜,其间形成有间隙,使得可移动镜通过施加外力相对于固定镜移位; 形成在固定镜上的固定电极; 以及可动电极,形成在可动反射镜上并且与固定电极相对设置,其中可动电极通过在固定电极和可移动​​电极之间施加电位而移位,使得间隙的宽度至少在三个步骤中变化,由此在 红外辐射的最少三个波长带选择性地透过滤光器件。