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    • 51. 发明授权
    • Method and apparatus for finding critical traffic matrices
    • 用于查找关键业务矩阵的方法和装置
    • US08228803B1
    • 2012-07-24
    • US11477437
    • 2006-06-28
    • Zihui GeYin Zhang
    • Zihui GeYin Zhang
    • H04L1/00
    • H04Q3/0062
    • Method and apparatus for determining at least one critical traffic matrix from a plurality of traffic matrices, where each of the plurality of traffic matrices is organized into at least one of a plurality of clusters, for a network is described. In one embodiment, a merging cost is calculated for each possible pair of clusters within a plurality of clusters. A pair of traffic matrices that is characterized by having the least merging cost is then merged. The calculating and the merging steps are subsequently repeated until a predefined number of clusters remains, wherein the remaining clusters are used to determine at least one critical traffic matrix.
    • 描述了一种用于从多个业务矩阵确定至少一个关键业务矩阵的方法和装置,其中多个业务矩阵中的每一个被组织成用于网络的多个集群中的至少一个。 在一个实施例中,针对多个聚类中的每个可能的聚类对来计算合并成本。 然后合并具有最小合并成本的一对业务矩阵。 随后重复计算和合并步骤,直到保持预定数量的簇,其中剩余的簇用于确定至少一个关键业务矩阵。
    • 55. 发明授权
    • In situ adaptive masks
    • 原位自适应掩模
    • US07179335B2
    • 2007-02-20
    • US10695343
    • 2003-10-28
    • William FreemanYin ZhangLillian Qin
    • William FreemanYin ZhangLillian Qin
    • C23C14/04
    • C23C14/042
    • A variable adaptive mask is provided that can be dynamically modified in situ in a physical vapor deposition process. The mask comprises a fixed mask portion, a plurality of channels extending through the fixed mask portion, a control mechanism for controlling throughput of a vaporized target material through the channels, and a mechanism to mount the mask in a fixed position relative to a solid target material and a substrate. In one embodiment, a magnetic control mechanism is provided to control throughput of the vaporized target material through the channels. In another embodiment, a thermal control mechanism is provided to control throughput of a vaporized target material through the channels. Methods of controlling a physical vapor deposition process using the adaptive mask are also disclosed.
    • 提供了可在物理气相沉积工艺中原位动态修改的可变自适应掩模。 掩模包括固定的掩模部分,延伸穿过固定掩模部分的多个通道,用于控制通过通道的蒸发的目标材料的生产量的控制机构,以及将掩模相对于固体靶材固定在固定位置的机构 材料和基材。 在一个实施例中,提供磁控制机构以通过通道来控制蒸发的目标材料的生产量。 在另一个实施例中,提供热控制机构以控制通过通道的蒸发的目标材料的生产量。 还公开了使用自适应掩模来控制物理气相沉积工艺的方法。