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51. 发明申请

US20070200898A1 Liquid Solution Ejecting Apparatus 失效
标题翻译：液体溶液喷射装置
公开(公告)号：US20070200898A1
公开(公告)日：2007-08-30
申请号：US11632408
申请日：2005-07-20
申请人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
发明人： Nobuhiro Ueno , Isao Doi , Yasuo Nishi , Nobuhisa Ishida
IPC分类号： B41J2/06
CPC分类号： B05B5/0255 , B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2/1433 , B41J2002/14475
摘要： Liquid ejecting apparatus 20 for ejecting electrically charged droplets of the liquid solution onto base member K, which includes liquid ejecting head 26 to eject the droplets from top end 21a of nozzle 21, with the inner diameter equal to or less than 100 μm, liquid solution supplying section 29 to supply the liquid solution into nozzle 21, and ejection voltage applying section 25 to apply the ejection voltage onto the liquid solution in nozzle 21. In liquid ejecting apparatus 20, nozzle 21 projects toward the droplet ejecting direction from nozzle plane 26e on nozzle plate 26c facing base member K, whereby the projecting length of nozzle 21 is equal to or less than 30 μm.
摘要翻译：液体喷射装置20，用于将液体溶液的带电液滴喷射到基体部件K上，基底部件K包括液体喷射头26，以使内径等于或小于100um的喷嘴21的顶端21a喷出液滴，液体溶液供给部分29将液体溶液供应到喷嘴21中，以及喷射电压施加部分25，以将喷射电压施加到喷嘴21中的液体溶液上。在液体喷射装置20中，喷嘴21从喷嘴平面26向液滴喷射方向突出 e在喷嘴板26c上面对着基件K，由此喷嘴21的突出长度等于或小于30μm。

52. 发明授权

US6124965A Optical element and light shutter device using the same 失效
标题翻译：光学元件和光闸装置使用它
公开(公告)号：US6124965A
公开(公告)日：2000-09-26
申请号：US352892
申请日：1999-07-14
申请人： Isao Doi , Itaru Saito , Kenichi Wada
发明人： Isao Doi , Itaru Saito , Kenichi Wada
IPC分类号： G02F1/03 , G02F1/055
CPC分类号： G02F1/0551
摘要： Disclosed is a light shutter device comprising a plurality of optical element for modulating light passing therethrough. Each optical element is made of PLZT and the surface of a light modulating region of each optical element is coated with a thin film. The surface electrical resistance on the thin film is 10.sup.10 .OMEGA./sq or less.
摘要翻译：公开了一种光快门装置，其包括用于调制通过其中的光的多个光学元件。每个光学元件由PLZT制成，并且每个光学元件的光调制区域的表面涂覆有薄膜。薄膜上的表面电阻为1010欧姆/平方厘米或更小。

53. 发明授权

US5930565A Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US5930565A
公开(公告)日：1999-07-27
申请号：US61266
申请日：1998-04-17
申请人： Isao Doi , Keiko Momotani , Akihito Ikegawa
发明人： Isao Doi , Keiko Momotani , Akihito Ikegawa
IPC分类号： G03G15/05 , G03G15/00 , G03G15/04
CPC分类号： G03G15/05
摘要： An image forming apparatus includes a first conductive member, a photoelectric transfer layer mounted on the first conductive member, a surface electrode mounted adjacent to the photoelectric transfer layer but away from the first conductive layer, a dielectric layer opposed to the surface electrode, a second conductive member mounted on one surface of the dielectric layer away from the photoelectric transfer layer. A first power supply is provided for applying a voltage V.sub.c between first and second conductive members and a second power supply is provided for applying a voltage V.sub.b between the surface electrode and the second conductive member. The image forming apparatus satisfies following relationship:V.sub.b >(5.5)V.sub.c -(1+5.5/D.sub.p)(312+6.2D.sub.a)whereinV.sub.b : Voltage between surface electrode and second conductive member;V.sub.c : Voltage between first and second conductive members;D.sub.p : Thickness of photoelectric transfer layer; andD.sub.a : Distance between dielectric layer and photoelectric transfer layer.
摘要翻译：图像形成装置包括第一导电构件，安装在第一导电构件上的光电转移层，邻近光电转移层安装但远离第一导电层的表面电极，与表面电极相对的电介质层，第二导电构件导电构件安装在电介质层的远离光电转移层的一个表面上。提供第一电源用于在第一和第二导电构件之间施加电压Vc，并且提供第二电源用于在表面电极和第二导电构件之间施加电压Vb。图像形成装置满足以下关系：Vb>（5.5）Vc-（1 + 5.5 / Dp）（312 + 6.2Da）其中Vb：表面电极和第二导电构件之间的电压; Vc：第一和第二导电构件之间的电压; Dp：光电转移层的厚度; 和Da：电介质层和光电转移层之间的距离。

54. 发明授权

US5860046A Charging method and charging device 失效
标题翻译：充电方式及充电装置
公开(公告)号：US5860046A
公开(公告)日：1999-01-12
申请号：US889822
申请日：1997-07-08
申请人： Akihito Ikegawa , Keiko Momotani , Isao Doi
发明人： Akihito Ikegawa , Keiko Momotani , Isao Doi
IPC分类号： G03G15/02
CPC分类号： G03G15/0233 , Y10S430/102
摘要： The present invention provides a contact charging device, in which a contact member for charging is in contact with a charge receiving member for charging the same while suppressing charging irregularity. The contact member has a surface to be in contact with the charge receiving member. This surface has a volume resistivity in a range from 1.times.10.sup.4 .OMEGA..multidot.cm to 1.times.10.sup.10 .OMEGA..multidot.cm, and has a surface resistivity in a range from 1.times.10.sup.5 .OMEGA./.quadrature. to 1.times.10.sup.10 .OMEGA./.quadrature..Alternatively, the contact member has a surface to be in contact with the charge receiving member. This surface of the contact member has a surface hardness which provides a scratch width of 1 .mu.m or less under scratch hardness test.
摘要翻译：本发明提供一种接触充电装置，其中用于充电的接触构件与用于对其充电的电荷接收构件接触，同时抑制充电不均匀。接触构件具有与电荷接收构件接触的表面。该表面的体积电阻率范围为1×10 4欧米加xcm至1×10 10欧米伽x厘米，并且其表面电阻率范围为1×10 5欧姆/平方厘米至1×10 10欧姆/平方厘米。或者，接触构件具有与电荷接收构件接触的表面。接触构件的该表面具有在刮擦硬度试验下提供1μm或更小的划痕宽度的表面硬度。

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