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51. 发明授权

US06737492B2 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating 有权
标题翻译：辐射吸收聚合物，用于辐射吸收涂层的组合物，辐射吸收涂层及其作为抗反射涂层的应用
公开(公告)号：US06737492B2
公开(公告)日：2004-05-18
申请号：US10229219
申请日：2002-08-27
申请人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
发明人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
IPC分类号： C08F11636
CPC分类号： C09D4/00 , C08F246/00 , G03F7/091 , C08F220/26 , C08F220/58 , C08F212/00
摘要： A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.
摘要翻译：一种辐射吸收聚合物，其化学键合有辐射吸收染料，该辐射吸收染料在预定波长辐射下具有高吸收性，其对基底具有良好的粘附性，并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成用于光致抗蚀剂，但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。辐射吸收聚合物包括共聚物，其至少包含由侧链中含有酮基和二价基团（优选亚甲基）的单体构成的重复单元，以及由含有直接键合的有机发色团的单体构成的重复单元或通过连接组到主链。将这种辐射吸收聚合物溶于醇，芳族烃，酮，酯等溶剂中，将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。在该涂层上涂覆例如化学放大抗蚀剂。然后将该涂覆的基材暴露于深紫外线，并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

52. 发明授权

US06723488B2 Photoresist composition for deep UV radiation containing an additive 失效
标题翻译：用于含有添加剂的深紫外线辐射的光刻胶组合物
公开(公告)号：US06723488B2
公开(公告)日：2004-04-20
申请号：US10037161
申请日：2001-11-07
申请人： Takanori Kudo , Ralph R. Dammel , Munirathna Padmanaban
发明人： Takanori Kudo , Ralph R. Dammel , Munirathna Padmanaban
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , Y10S430/106
摘要： The present invention relates to a photoresist composition sensitive to radiation in the deep ultraviolet, particularly a positive working photoresist sensitive in the range of 100-200 nanometers(nm). The photoresist composition comprises a) a polymer that is insoluble in an aqueous alkaline solution and comprises at least one acid labile group, and furthermore where the polymer is essentially non-phenolic, b) a compound capable of producing an acid upon radiation, and c) an additive that reduces the effect of electrons and ions on the photoresist image.
摘要翻译：本发明涉及对深紫外线辐射敏感的光致抗蚀剂组合物，特别是在100-200纳米（nm）范围内敏感的正性工作光致抗蚀剂。光致抗蚀剂组合物包含：a）不溶于碱性水溶液且包含至少一种酸不稳定基团的聚合物，此外，聚合物基本上是非酚类的，b）能够在辐射时产生酸的化合物，c ）减少电子和离子对光致抗蚀剂图像的影响的添加剂。

53. 发明授权

US06468718B1 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating 有权
标题翻译：辐射吸收聚合物，用于辐射吸收涂层的组合物，辐射吸收涂层及其作为抗反射涂层的应用
公开(公告)号：US06468718B1
公开(公告)日：2002-10-22
申请号：US09244358
申请日：1999-02-04
申请人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
发明人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
IPC分类号： G03C173
CPC分类号： C09D4/00 , C08F246/00 , G03F7/091 , C08F220/26 , C08F220/58 , C08F212/00
摘要： A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.
摘要翻译：一种辐射吸收聚合物，其化学键合有辐射吸收染料，该辐射吸收染料在预定波长辐射下具有高吸收性，其对基底具有良好的粘附性，并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成用于光致抗蚀剂，但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。辐射吸收聚合物包括共聚物，其至少包含由侧链中含有酮基和二价基团（优选亚甲基）的单体构成的重复单元，以及由含有直接键合的有机发色团的单体构成的重复单元或通过连接组到主链。将这种辐射吸收聚合物溶于醇，芳族烃，酮，酯等溶剂中，将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。在该涂层上涂覆例如化学放大抗蚀剂。然后将该涂覆的基材暴露于深紫外线，并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

54. 发明授权

US06329117B1 Antireflection or light-absorbing coating composition and polymer therefor 有权
标题翻译：防反射或光吸收涂料组合物及其聚合物
公开(公告)号：US06329117B1
公开(公告)日：2001-12-11
申请号：US09319129
申请日：1999-08-09
申请人： Munirathna Padmanaban , Wen-Bing Kang , Georg Pawlowski , Ken Kimura , Hatsuyuki Tanaka
发明人： Munirathna Padmanaban , Wen-Bing Kang , Georg Pawlowski , Ken Kimura , Hatsuyuki Tanaka
IPC分类号： G03C173
CPC分类号： G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A composition for an anti-reflective coating or a light absorbing coating, which shows good light absorption for lights of 100-450 nm in wavelength, suffers neither footing nor intermixing, and has excellent storage stability and step coverage, and novel copolymers to be used therein. The novel polymers comprise acrylic or methacrylic copolymers or terpolymers, at least having both recurring units (1) wherein an amino group- or hydroxyl-group containing organic chromophore capable of absorbing lights of 100 to 450 nm in wavelength is chemically bound to the carbonyl group bound to a carbon atom in the main chain, directly or through —R1NHCXY— (wherein R1 represents an alkylene group, X represents O or S, Y represents O or NR6, R6 represents H, a substituted or non-substituted, straight chain or cyclic alkyl group or a phenylene group) and for example recurring units (2) wherein a double bond-or epoxy group-containing alkyl group is chemically bound to the carboxyl or oxygen group bound to a carbon atom in the main chain. The composition containing the copolymer is coated on a wafer to form a bottom anti-reflective coating and, after coating thereon a photoresist, deep UV exposure and development are conducted to form a resist image with high resolution.
摘要翻译：用于抗反射涂层或光吸收涂层的组合物对于波长为100-450nm的光显示出良好的光吸收，既不起脚也不混合，并且具有优异的储存稳定性和阶梯覆盖率，以及要使用的新型共聚物其中。该新型聚合物包含至少具有两个重复单元（1）的丙烯酸或甲基丙烯酸共聚物或三元共聚物，其中能够吸收波长为100至450nm的光的含氨基或羟基的有机发色团与羰基化学键合直接或通过-R1NHCXY-（其中R1表示亚烷基，X表示O或S，Y表示O或NR6，R6表示H，取代或未取代的直链或未取代的直链或环状烷基或亚苯基），例如其中双键或含环氧基的烷基与与主链中的碳原子结合的羧基或氧基化学键合的重复单元（2）。将包含共聚物的组合物涂覆在晶片上以形成底部抗反射涂层，并且在其上涂覆光致抗蚀剂之后，进行深紫外线曝光和显影以形成具有高分辨率的抗蚀剂图像。

55. 发明授权

US06277750B1 Composition for bottom reflection preventive film and novel polymeric dye for use in the same 失效
标题翻译：用于底部防反射膜的组合物和用于其的新型聚合物染料
公开(公告)号：US06277750B1
公开(公告)日：2001-08-21
申请号：US09508624
申请日：2000-06-27
申请人： Georg Pawlowski , Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Yoshinori Nishiwaki
发明人： Georg Pawlowski , Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Yoshinori Nishiwaki
IPC分类号： H01L2100
CPC分类号： G03F7/091 , C08F8/28 , C08F2800/10 , G03F7/0382 , G03F7/0392 , C08F8/48 , C08F16/06
摘要： As a bottom anti-reflective coating material for use in photolithography, polymer dyes represented by following general formula are used. The polymer dyes are able to form a bottom anti-reflective coating having good film formation properties, good absorption properties at exposure wavelength, good step coverage, non-intermixing with photoresist and high etch rate. wherein R represents H or a substituted or non-substituted alkyl, cycloalkyl, or aryl group, R1 represents a substituted or non-substituted alkyl or aryl, or a —COOR3 group in which R3 represents an alkyl group, R2 represents a substituted or non-substituted alkyl, cycloalkyl, or aryl group, D is an organic chromophore which absorbs at the exposure wavelength (150-450 nm) and represents a substituted or non-substituted aryl, condensed aryl, or heteroaryl group, m and o are any integer above zero, and n, p and q are any integer including zero.
摘要翻译：作为用于光刻的底部抗反射涂层材料，使用由以下通式表示的聚合物染料。聚合物染料能够形成底部抗反射涂层，其具有良好的成膜性能，在曝光波长下具有良好的吸收性能，良好的步骤覆盖率，与光致抗蚀剂的非混合和高蚀刻速率。其中R表示H或取代或未取代的烷基，环烷基或芳基，R 1表示取代或未取代的烷基或芳基或其中R 3表示烷基的-COOR 3基团，R 2表示取代或未取代的烷基，环烷基或芳基，D 是在曝光波长（150-450nm）下吸收并表示取代或未取代的芳基，缩合芳基或杂芳基的有机发色团，m和o是大于零的任何整数，n，p和q是任何整数包括零。

56. 发明授权

US5846690A Radiation-sensitive composition containing plasticizer 失效
标题翻译：含增塑剂的辐射敏感组合物
公开(公告)号：US5846690A
公开(公告)日：1998-12-08
申请号：US615831
申请日：1996-03-14
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03F7/038 , G03F7/30
CPC分类号： G03F7/0045
摘要： A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括（a）不溶于水但可溶于或能够在碱性水溶液中溶胀或能够溶胀的粘合剂，（b）由（b1）聚（N，O-缩醛））具有以下通式：其中R 3是烷基或取代或未取代的芳基，R 4是选自亚烷基，亚环烷基，烯烃或炔烃的二价基团，R 5是烷基，烯烃，炔烃或环烷基，X是-OCO-， -CO-或-NHCO-，p为不小于1的数，和/或（b2）具有羟基的酚化合物，该羟基被酸可以被可被切割的基团保护，（c ）当暴露于活性辐射时能够产生酸的光敏化合物，（d）当暴露于活性辐射时能够分解以形成由其衍生的中性化合物的碱，（e）增塑剂，和（f）溶剂。

57. 发明授权

US5773191A Radiation-sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5773191A
公开(公告)日：1998-06-30
申请号：US685850
申请日：1996-07-24
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , G03F7/032 , G03F7/30
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/11
摘要： A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1; (b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.5 is an alkyl group or an cycloalkyl group, Y is --OCO--, --CO-- or --NHCO--, and p is an integer not less than 1, or (b') a cross-linking agent; (c) a photosensitive compound capable of generating an acid when exposed to a radiation; and (e) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括：（a）由以下通式表示的共聚物：其中R 1为氢原子或甲基，R 2为取代或未取代的烷基或取代或未取代的芳基 Ar为取代或未取代的亚苯基或取代或未取代的亚环己基，X为-SO 2 - 或-CO-表示的二价基，m和n分别为1以上的整数，（b）由以下通式表示的化合物组成的溶解抑制剂：其中R3为烷基或取代或未取代的芳基，R4为亚烷基，亚环烷基，亚烯基或亚炔基，R5是烷基或环烷基，Y是-OCO-，-CO-或-NHCO-，p是不小于1的整数，或（b'）交联剂; （c）当暴露于辐射时能够产生酸的光敏化合物; 和（e）溶剂。

58. 发明授权

US5663035A Radiation-sensitive mixture comprising a basic iodonium compound 失效
标题翻译：包含碱性碘鎓化合物的辐射敏感性混合物
公开(公告)号：US5663035A
公开(公告)日：1997-09-02
申请号：US420787
申请日：1995-04-12
申请人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
发明人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045
摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.
摘要翻译：用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由使用辐射分解碱。该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。

59. 发明授权

US5641594A Colored, photosensitive resin composition 失效
标题翻译：彩色，感光性树脂组合物
公开(公告)号：US5641594A
公开(公告)日：1997-06-24
申请号：US507301
申请日：1995-08-25
申请人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
发明人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
IPC分类号： G03F7/00 , G03F7/008 , G03F7/031 , G03C5/56 , G03F7/012 , G03F7/033
CPC分类号： G03F7/008 , G03F7/0007 , G03F7/031
摘要： A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.
摘要翻译： PCT No.PCT / JP94 / 02085 Sec。 371日期1995年8月25日 102（e）日期1995年8月25日PCT 1994年12月12日PCT PCT。公开号WO95 / 18399 日期：1995年7月6日公开了一种着色的颜料分散型感光性树脂组合物。着色的感光性树脂组合物的特征在于，含有（a）具有异羟基或酚羟基的聚合物，（b）当用光化辐射照射时能够产生硝酸的化合物，（c）颜料，（d）溶剂。优选地，除了上述成分之外，组合物还含有（e）热交联剂和/或（f）具有可聚合双键的化合物。根据本发明，滤色器的制造不需要在惰性气体气氛中进行，在从曝光步骤到显影步骤的期间，不需要氧阻隔膜，不需要加热。因此，使用该组合物可以使滤色器制造步骤显着简单，从而使组合物在工业应用中提供了巨大的价值。

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