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    • 55. 发明授权
    • Method of measuring a film thickness of multilayer thin film
    • 测量多层薄膜膜厚的方法
    • US5883720A
    • 1999-03-16
    • US883530
    • 1997-06-26
    • Tetsuya AkiyamaEiji OhnoNobuo Akahira
    • Tetsuya AkiyamaEiji OhnoNobuo Akahira
    • G01B11/06
    • G01B11/0625
    • A method of manufacturing an optical information recording medium comprising the steps of: forming a plurality of component thin films on a substrate or on a sample at a predetermined film-forming speed and within a predetermined film-forming time in sequence; measuring spectral reflectance of the multilayer thin film formed on the substrate or on the sample; comparing the measured value of the spectral reflectance and the standard value of the spectral reflectance to detect the difference between them; compensating at least one of the film-forming speed and the film-forming time based on the detected difference; and forming a plurality of thin films based on the compensated film-forming speed and with the compensated film-forming time. Consequently, a thickness of each component thin film of the optical information recording medium can be measured easily and production loss in measuring a film-forming speed can be decreased.
    • 一种制造光学信息记录介质的方法,包括以下步骤:在预定的成膜速度和预定的成膜时间内依次在基板或样品上形成多个成分薄膜; 测量形成在衬底或样品上的多层薄膜的光谱反射率; 比较光谱反射率的测量值和光谱反射率的标准值,以检测它们之间的差异; 基于检测到的差异补偿成膜速度和成膜时间中的至少一个; 并且基于补偿的成膜速度和补偿的成膜时间形成多个薄膜。 因此,可以容易地测量光学信息记录介质的每个组分薄膜的厚度,并且可以降低测量成膜速度时的生产损失。