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51. 发明授权

US5730810A Non-oriented electromagnetic steel sheet with low iron loss after stress relief annealing, and core of motor or transformer 失效
公开(公告)号：US5730810A
公开(公告)日：1998-03-24
申请号：US423356
申请日：1995-04-18
申请人： Minoru Takashima , Keiji Sato , Takashi Obara
发明人： Minoru Takashima , Keiji Sato , Takashi Obara
IPC分类号： C21D1/30 , C21D8/12 , C22C38/04 , C22C38/06 , H01F1/147 , H01F41/02 , H02K1/02
CPC分类号： H01F41/0213 , C21D8/1244 , C22C38/04 , C22C38/06 , H01F1/14775 , H02K1/02 , C21D1/30 , Y10T29/49009 , Y10T29/4902 , Y10T29/49078
摘要： In a non-oriented electromagnetic steel sheet including about 0.01 wt % or less of C, about 1.0 wt % or less of Si, Mn in a range of about 0.1 wt % to 1.5 wt %, Al in a range of about 0.2 wt % to 1.5 wt %; the steel sheet having a critical amount of about 2 to 80 ppm rare earth metal, and the quantities of Ti and Zr in the steel sheet being limited to about 15 ppm or less of Ti, and about 80 ppm or less of Zr. The sheet exhibits excellent magnetic characteristics, such as iron loss, even when punched and laminated sheets are stress relief annealed at a low temperature for a short period of time.

52. 发明授权

US5639315A Process for producing non-oriented electromagnetic steel strip capable of retaining uniform magnetic quality in a product coil 失效
标题翻译：用于制造能够在产品线圈中保持均匀磁性质的无取向电磁钢带的方法
公开(公告)号：US5639315A
公开(公告)日：1997-06-17
申请号：US573277
申请日：1995-12-15
申请人： Minoru Takashima , Keiji Sato , Takashi Obara
发明人： Minoru Takashima , Keiji Sato , Takashi Obara
IPC分类号： B21B3/02 , B21B15/00 , C21D8/12 , C22C38/00 , C22C38/06 , H01F1/16 , H01F1/14
CPC分类号： C21D8/1222 , B21B15/0085 , B21B2275/04 , B21B3/02
摘要： A process is disclosed for the production of a non-oriented electromagnetic steel strip having its magnetic characteristics uniformly retained in the product coil. The process involves by full- or semi-processing, hot rolling a steel slab containing not more than about 0.03% by weight of C, not more than about 3% by weight of Si and not more than about 2% by weight of Al such that the equation [Si wt %]+3 [Al wt %]-6 [C wt %] is in the range of about 0 to 2; and cold rolling the hot rolled steel strip in a known manner, followed optionally by finish annealing and also optionally by skin-pass rolling. The coil is finish rolled at a peripheral roll speed between about 500 to 1,500 mpm at the final stand. The peripheral roll speed at the final finish rolling stand is also controlled within a range of no more than about 300 mpm. Hot rolling is completed at a temperature Tf (.degree. C.) in an alpha-phase temperature zone and not less than about {750+30 ([Si wt %]+3 [Al wt %]-6 [C wt %])}.
摘要翻译：公开了一种制造其磁性特性均匀地保留在产品线圈中的无取向电磁钢带的方法。该方法包括通过全部或半加工，热轧含有不超过约0.03重量％的C，不超过约3重量％的Si和不超过约2重量％的Al的钢坯， [Si wt％] + 3 [Al wt％] -6 [C wt％]的方程式在约0至2的范围内; 并以已知的方式冷轧热轧钢带，然后任选地通过精加工退火，也可任选地通过表面光轧。线圈在最终支架处以约500至1,500mpm的周边辊速度精轧。最终精轧站的周边轧辊速度也控制在不超过约300mpm的范围内。热轧在α相温度区域的温度Tf（℃）下完成，不低于约{750 + 30（[Si重量％] + 3 [Al％重量] -6 [C％重量％]） }。

53. 发明授权

US4818299A Method of manufacturing cold-rolled steel sheets 失效
标题翻译：冷轧钢板的制造方法
公开(公告)号：US4818299A
公开(公告)日：1989-04-04
申请号：US125921
申请日：1987-11-27
申请人： Susumu Sato , Mitsumasa Kurosawa , Hideo Suzuki , Takashi Obara , Kozo Tsunoyama
发明人： Susumu Sato , Mitsumasa Kurosawa , Hideo Suzuki , Takashi Obara , Kozo Tsunoyama
IPC分类号： C21D8/04 , C22C38/14
CPC分类号： C21D8/0473 , C22C38/14 , C21D8/0426
摘要： A cold-rolled steel sheet for deep drawing having an improved bake hardenability is disclosed, which comprises 0.005-0.015 wt% of C, not more than 1.0 wt% of Si, not more than 1.0 wt% of Mn, not more than 0.15 wt% of P, 0.0005-0.10 wt% of Al, not more than 0.003 wt% of S and not more than 0.004 wt% of N provided that S+N is not more than 0.005 wt%, and Ti satisfying 1.ltoreq.Ti*/C.ltoreq.20, in which Ti* (%)=Ti(%)-48/14N(%)-48/32S(%). Such a cold-rolled steel sheet is obtained by continuously annealing the steel sheet after the cold rolling, provided that a residence time over a temperature region above recrystallization temperature is within 300 seconds.

54. 发明授权

US4586965A Production of a base steel sheet to be surface-treated which is to produce no stretcher strain 失效
标题翻译：生产不需要担架的表面处理的基础钢板
公开(公告)号：US4586965A
公开(公告)日：1986-05-06
申请号：US739623
申请日：1985-05-31
申请人： Takashi Obara , Kazunori Osawa , Minoru Nishida , Kei Sakata , Hideo Kuguminato
发明人： Takashi Obara , Kazunori Osawa , Minoru Nishida , Kei Sakata , Hideo Kuguminato
IPC分类号： C22C38/00 , C21D8/02 , C21D9/46 , C22C38/06
CPC分类号： C22C38/06 , C21D8/0236 , C21D8/0226 , C21D8/0268
摘要： Disclosed herein is a method of manufacturing a base steel sheet, which method comprises combined steps of: not rolling a steel slab containing not more than 0.0070% by weight of C (hereinafter referred to briefly as "%"), not more than 0.1% of Si, not more than 0.5% of Mn, 0.010 to 0.080% of Al, not more than 0.0050% of N, not more than 0.030% of S provided that the ratio of Mn/S is not less than 10, and not more than 0.030% of P while the hot rolling being terminated at a finish temperature of not less than 800.degree. C.; cold rolling thus obtained hot rolled steel sheet in an ordinary manner; continuously annealing the cold rolled steel sheet in which heating is done up to a temperature from a recrystallization temperature to 800.degree. C., followed by cooling; and then temper rolling the annealing steel sheet at a reduction of not less than 7% by using two or more stand rolling mill, whereby the thus obtained base sheet, to be surface-treated may be utilized for a tinplate or a tin free steel in which no stretcher strain is formed even after baking treatment.
摘要翻译：本发明公开了一种制造基体钢板的方法，该方法包括以下组合步骤：不轧制含有不大于0.0070重量％的C的钢板（以下简称为“％”），不大于0.1重量％的Si，不超过0.5％的Mn，0.010〜0.080％的Al，不大于0.0050％的N，不大于0.030％的S，条件是Mn / S的比例不小于10，而不是更多超过0.030％的P，而热轧终止温度不低于800℃。以通常的方式冷轧如此获得的热轧钢板; 对进行加热的冷轧钢板进行连续退火至从再结晶温度至800℃的温度，然后冷却; 然后通过使用两台以上的立式轧机将退火钢板以不小于7％的压下率进行回火处理，由此得到的待表面处理的基材可以用于马口铁或不含锡的钢即使在烘烤处理之后也不形成担架应变。

55. 发明申请

US20130203253A1 METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：形成图案的方法和制造半导体器件的方法
公开(公告)号：US20130203253A1
公开(公告)日：2013-08-08
申请号：US13597813
申请日：2012-08-29
申请人： Ai INOUE , Sayaka Tamaoki , Takashi Obara
发明人： Ai INOUE , Sayaka Tamaoki , Takashi Obara
IPC分类号： H01L21/302 , B44C1/22
CPC分类号： H01L21/0337 , H01L21/76816
摘要： In a method of forming a pattern according to an embodiment, a first oblique linear pattern arranged at a first oblique angle with respect to a first parallel linear pattern and a second oblique linear pattern arranged at a second oblique angle with respect to the first parallel linear pattern are formed. Then, a pattern is formed in a region in which the first oblique linear pattern overlaps the second oblique linear pattern. A second parallel linear pattern is formed using the first parallel linear pattern and the pattern such that the second parallel linear pattern is divided by the overlap region. At least one of the first and second oblique angles is an angle other than a right angle.
摘要翻译：在根据实施例的形成图案的方法中，相对于第一平行线性图案以第一倾斜角布置的第一倾斜线状图案和相对于第一平行线形以第二倾斜角布置的第二倾斜线状图案形成图案。然后，在第一倾斜线状图案与第二倾斜线状图案重叠的区域中形成图案。使用第一平行线性图案和图案形成第二平行线状图案，使得第二平行线形图案被重叠区域划分。第一和第二倾斜角度中的至少一个是除了直角以外的角度。

56. 发明授权

US08000203B2 Apparatus for recording information onto surface using electron beam 有权
标题翻译：使用电子束将信息记录在表面上的装置
公开(公告)号：US08000203B2
公开(公告)日：2011-08-16
申请号：US12282306
申请日：2007-03-12
申请人： Takashi Obara , Takeshi Miyazaki
发明人： Takashi Obara , Takeshi Miyazaki
IPC分类号： G11B9/10
CPC分类号： G11B7/261 , G11B9/10 , G11B11/03
摘要： An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.
摘要翻译：公开了一种通过使用电子束将信息记录在样品的表面上的电子束记录装置。电子束记录装置包括照射电子束的电子源，被配置为移动和移出照射轴的磁检测器，并获取照射轴上的磁信息;会聚位置控制部，其计算会聚位置校正用于基于磁信息校正电子束相对于样品表面的会聚位置的量;以及会聚位置调整部，其调整电子束相对于样品表面的会聚位置。会聚位置控制部使会聚位置调整部基于会聚位置校正量来调整电子束相对于面的表面的会聚位置。

57. 发明申请

US20110091915A1 IgA Nephropathy Testing Method and Test Kit 有权
标题翻译： IgA肾病检测方法及检测试剂盒
公开(公告)号：US20110091915A1
公开(公告)日：2011-04-21
申请号：US12995489
申请日：2009-05-29
申请人： Takashi Obara , Sadaaki Mizoguchi
发明人： Takashi Obara , Sadaaki Mizoguchi
IPC分类号： G01N33/53
CPC分类号： G01N33/6854 , G01N33/6893 , G01N2800/347
摘要： There is provided a renal disease testing method comprising a complex detection step of detecting a complex of human uromodulin and human IgA in a sample derived from urine collected from a subject. It is preferred that the renal disease testing method of the invention further comprises a determination step of assessing the whether the renal disease is IgA nephropathy based on the ratio of the amount of the complex detected in the complex detection step to the amount of urinary proteins in the sample. The renal disease testing method of the invention has good detection sensitivity and specificity, and can conveniently and safely assess the existence of a renal disease (preferably, IgA nephropathy).
摘要翻译：提供了一种肾脏疾病测试方法，其包括在从受试者收集的尿中得到的样品中检测人尿调制蛋白和人IgA的复合物的复合物检测步骤。优选本发明的肾脏疾病检测方法还包括以下步骤：基于复合物检测步骤检测到的复合物的量与尿蛋白质量的比例来评估肾脏疾病是否为IgA肾病的判定步骤例子。本发明的肾病检测方法具有良好的检测灵敏度和特异性，可以方便，安全地评估肾病（优选IgA肾病）的存在。

58. 发明授权

US07662523B2 Photo mask, exposure method using the same, and method of generating data 失效
公开(公告)号：US07662523B2
公开(公告)日：2010-02-16
申请号：US12118510
申请日：2008-05-09
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/36 , G03F1/30 , G03F1/32
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

59. 发明申请

US20080220377A1 PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATING DATA 失效
公开(公告)号：US20080220377A1
公开(公告)日：2008-09-11
申请号：US12118510
申请日：2008-05-09
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03F7/20
CPC分类号： G03F1/36 , G03F1/30 , G03F1/32
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

60. 发明申请

US20070195295A1 Mask pattern data forming method, photomask and method of manufacturing semiconductor device 失效
标题翻译：掩模图案数据形成方法，光掩模和半导体器件的制造方法
公开(公告)号：US20070195295A1
公开(公告)日：2007-08-23
申请号：US11357034
申请日：2006-02-21
申请人： Tadahito Fujisawa , Takeshi Ito , Takashi Obara
发明人： Tadahito Fujisawa , Takeshi Ito , Takashi Obara
IPC分类号： G03B27/42
CPC分类号： G03F7/70425 , G03F1/70 , G03F7/70125
摘要： There is disclosed a mask pattern data forming method comprising arranging patterns with a minimum pitch in parallel or vertically in an X or Y direction, where directions diagonally connected with respect to respective centers of gravity of the double-pole or the quadrupole illumination are defined as the X and Y direction, classifying patterns or pattern groups with a pitch larger than the patterns with the minimum pitch into a pattern type with a pitch whose exposure margin is larger than that of the patterns with the minimum pitch and a pattern type with a pitch whose exposure margin is smaller than that of the patterns with the minimum pitch; and arranging patterns or pattern groups classified into the pattern type whose exposure margin is smaller than that of the patterns with the minimum pitch in a direction deflected by 45° or 135° from the patterns with the minimum pitch.
摘要翻译：公开了一种掩模图案数据形成方法，包括在X或Y方向上平行或垂直布置具有最小间距的图案，其中相对于双极或四极照明的相应重心倾斜连接的方向被定义为 X和Y方向，将具有最小间距的图案的间距大于间距的图案分类为具有曝光余量大于具有最小间距的图案的间距的图案类型的图案或图案组，以及具有间距的图案类型其曝光余量小于具有最小间距的图案的曝光裕度; 并且排列分类为其曝光余量小于距离具有最小间距的图案偏转45°或135°的方向上具有最小间距的图案的图案类型的图案或图案组。

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