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51. 发明授权

US06906355B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US06906355B2
公开(公告)日：2005-06-14
申请号：US10677429
申请日：2003-10-03
申请人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
发明人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
IPC分类号： H01L21/331 , H01L21/336 , H01L29/06 , H01L29/12 , H01L29/47 , H01L29/739 , H01L29/78 , H01L29/872 , H01L29/74
CPC分类号： H01L29/7813 , H01L29/0619 , H01L29/0634 , H01L29/0692 , H01L29/0696 , H01L29/66348 , H01L29/7397 , H01L29/7811 , H01L29/872
摘要： A semiconductor device having guard grooves uniformly filled with a semiconductor filler is provided. The four corners of a rectangular ring-shaped guard groove meet at right angles, and outer and inner auxiliary diffusion regions both rounded are connected to the four corners. Since the guard grooves do not have to be rounded, the plane orientation of a silicon single crystal exposed inside the guard grooves can be all {100}. Therefore, epitaxial growth in the guard grooves is uniformly carried out, and the grooves are filled with guard regions without defects.
摘要翻译：提供了具有均匀填充有半导体填料的保护槽的半导体器件。矩形环形保护槽的四个角部成直角相交，外部和内部辅助扩散区域均圆形连接到四个角。由于保护槽不必是圆形的，所以在保护槽内暴露的硅单晶的平面取向可以全部为{100}。因此，保护槽中的外延生长均匀地进行，并且沟槽被填充有无缺陷的防护区域。

52. 发明授权

US06841825B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US06841825B2
公开(公告)日：2005-01-11
申请号：US10449002
申请日：2003-06-02
申请人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
发明人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
IPC分类号： H01L21/331 , H01L21/336 , H01L29/06 , H01L29/739 , H01L29/78 , H01L29/872 , H01L27/108
CPC分类号： H01L29/7813 , H01L29/0619 , H01L29/0634 , H01L29/0692 , H01L29/0696 , H01L29/4238 , H01L29/66348 , H01L29/7397 , H01L29/7811 , H01L29/872
摘要： A technique for improving a ruggedness of a transistor against breakdown is provided. In a transistor of the present invention, a height of filling regions is higher than that of buried regions, so that a withstanding voltage of the filling regions is higher than that of the buried regions. Therefore, since avalanche breakdown occurs in an active region, causing an avalanche breakdown current to flow through the active region having a large area, current concentration does not occur. As a result, a ruggedness of an element against breakdown is increased.
摘要翻译：提供了一种提高晶体管耐破坏性的技术。在本发明的晶体管中，填充区域的高度高于掩埋区域的高度，使得填充区域的耐受电压高于掩埋区域的耐受电压。因此，由于在有源区域发生雪崩击穿，导致雪崩击穿电流流过具有大面积的有源区域，不会发生电流集中。结果，增加了抵抗击穿的元件的坚固性。

53. 发明授权

US06064477A Method of and apparatus for inspecting reticle for defects 失效
标题翻译：用于检查掩模版的缺陷的方法和装置
公开(公告)号：US06064477A
公开(公告)日：2000-05-16
申请号：US644740
申请日：1996-05-10
申请人： Shunichi Matsumoto , Hiroaki Shishido
发明人： Shunichi Matsumoto , Hiroaki Shishido
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/32 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G01N21/94 , G01N21/956 , G01N21/95607 , G01N21/95623 , G03F1/84
摘要： A reticle inspecting apparatus for inspecting a reticle for defects has a transparent of translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system enables separation of the gathered light by direction of illumination using detectors and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates defects on the basis of the output signals of the detectors and displays the calculated data on a display.
摘要翻译：用于检查掩模版用于缺陷的掩模版检查装置具有透光性的基板，形成在基板的前表面的电路图案，以及在基板的前表面上由透光膜形成的移相器。在该装置中，检测光学系统被设置成不会直接聚集反射光并直接透射光，以分散散射光和被散射和衍射的衍射光。该检测光学系统能够使用分别设置在傅立叶变换平面上的检测器和空间滤光器的照明方向来分离收集的光以截取由电路图案的直边衍射的光，从而在检测器上形成聚光的图像。具有信号处理单元的信号处理系统基于检测器的输出信号计算缺陷，并将计算出的数据显示在显示器上。

54. 发明授权

US5410400A Foreign particle inspection apparatus 失效
标题翻译：国外颗粒检测仪器
公开(公告)号：US5410400A
公开(公告)日：1995-04-25
申请号：US902819
申请日：1992-06-23
申请人： Hiroaki Shishido , Minori Noguchi
发明人： Hiroaki Shishido , Minori Noguchi
IPC分类号： G01N21/94 , G01N21/956 , G01N21/88
CPC分类号： G01N21/94 , G01N21/95623
摘要： A foreign particle inspection apparatus includes a detection optical system (4) for condensing scattered light generated by slant illumination (2) by an optical system (41) with a NA of more than 0.4 from the rear side of a sample using a transparent or semitransparent substrate having an opaque circuit pattern. The circuit pattern, such as a reticle, etc., has a phase shift film for improving the patterning resolution, for shielding diffracted light from the circuit pattern by a spatial filter (44) mounted on the Fourier transform plane, and for forming images on a detector (51). A circuit (113) is also provided for correcting detected values of the detector according to uneven illumination, and a circuit for obtaining the added value of detected values of 2 by 2 pixels. A circuit (114) is provided for obtaining the maximum value of four added values which are shifted pixel by pixel in the four directions around each detector pixel. A circuit (112) is provided for storing the detected result in a memory where the substrate sample is divided into blocks every several hundreds pixels. By this arrangement small foreign particles of the order of submicrons adhered on the substrate can be separated and detected easily and stably from the circuit pattern principally using a simple optical structure.
摘要翻译：外来粒子检查装置包括检测光学系统（4），用于通过光学系统（41）将由倾斜照明（2）产生的散射光从样品的后侧以大于0.4的NA聚集，所述检测光学系统使用透明或半透明衬底具有不透明的电路图案。诸如掩模版等的电路图案具有用于改善图形分辨率的相移膜，用于通过安装在傅里叶变换平面上的空间滤光器（44）屏蔽来自电路图案的衍射光，并且用于在检测器（51）。还提供一种用于根据不均匀照明校正检测器的检测值的电路（113），以及用于获得2×2像素的检测值的相加值的电路。提供电路（114），用于获得围绕每个检测器像素的四个方向逐个像素移位的四个相加值的最大值。提供了一种电路（112），用于将检测结果存储在存储器中，其中衬底样品被分成几百个像素的块。通过这种布置，主要使用简单的光学结构，可以从电路图案容易且稳定地分离和稳定地分离和检测附着在基板上的亚微米级的小的外来颗粒。

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