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51. 发明授权

US07799505B2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 有权
标题翻译：感光组合物，用于感光组合物的化合物和使用感光组合物的图案形成方法
公开(公告)号：US07799505B2
公开(公告)日：2010-09-21
申请号：US11876945
申请日：2007-10-23
申请人： Kunihiko Kodama , Tomotaka Tsuchimura , Hiroshi Saegusa , Hideaki Tsubaki
发明人： Kunihiko Kodama , Tomotaka Tsuchimura , Hiroshi Saegusa , Hideaki Tsubaki
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： C07C381/12 , C07D333/46 , C07D409/04 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
摘要翻译：本发明涉及在阳离子部分具有多环结构的芳基锍盐化合物。

52. 发明授权

US09568824B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，抗蚀剂膜及其形成图案的方法
公开(公告)号：US09568824B2
公开(公告)日：2017-02-14
申请号：US13193235
申请日：2011-07-28
申请人： Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
发明人： Toshiya Takahashi , Hideaki Tsubaki , Hiroshi Tamaoki , Hidenori Takahashi
IPC分类号： G03F7/039 , G03F7/004 , G03F7/075 , G03F7/20 , G03F7/30 , G03F7/32
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0758 , G03F7/20 , G03F7/2037 , G03F7/2039 , G03F7/30 , G03F7/322
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂（P），当将其暴露于光化射线或辐射时，分解出酸和重复单元（B）具有当被酸作用时的结构被分解，从而增加其在碱性显影剂中的溶解度，以及组合物（U），使得当组合物形成膜时，化合物不均匀地分布在这个电影。

53. 发明授权

US08951718B2 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的多次显影用抗蚀剂组合物，图案形成方法中使用的负显影用显影剂和图案形成方法中使用的负显影用冲洗液
公开(公告)号：US08951718B2
公开(公告)日：2015-02-10
申请号：US13588762
申请日：2012-08-17
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
IPC分类号： G03F7/039 , G03F7/32 , G03F7/20
CPC分类号： G03F7/325 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/2002 , G03F7/2024 , G03F7/30 , G03F7/32 , G03F7/40 , Y10T428/24802
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
摘要翻译：一种图案形成方法，包括：（A）用正性显影剂中的溶解度增加的正性抗蚀剂组合物涂覆基材，并且在用光化学辐射或辐射照射时，在负极显影剂中的溶解度降低，以形成抗蚀剂膜; （B）曝光抗蚀膜; 和（D）用负极显影剂显影抗蚀膜; 该方法中使用的用于多重显影的正性抗蚀剂组合物; 用于该方法的开发人员; 以及用于该方法的负显影用冲洗液。

54. 发明授权

US08900791B2 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition 有权
标题翻译：光化射线敏感或辐射敏感性树脂组合物和组合物形成图案的方法
公开(公告)号：US08900791B2
公开(公告)日：2014-12-02
申请号：US13071153
申请日：2011-03-24
申请人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
发明人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
IPC分类号： G03F7/004 , G03F7/028 , C07C309/25 , C07C309/28 , C07C309/42 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07D209/82 , C07D339/08 , G03F7/038 , G03F7/039
CPC分类号： C07C309/42 , C07C309/25 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/28 , C07C2602/42 , C07C2602/44 , C07C2603/24 , C07C2603/28 , C07C2603/74 , C07D209/82 , C07D339/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O)2— and —OS(═O)2—, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包含下列通式（I）的任何化合物; 其中：Ar表示可以具有除 - （A-B）基团以外的取代基的芳香环; n是1或更大的整数; A表示选自单键，亚烷基，-O - ， - S - ， - C（= O） - ， - S（= O） - ， - S（ ≡O）2-和-OS（ΟO）2-，条件是不包括-C（= O）O-; B表示含有具有4个以上碳原子的烃基，其中含有叔或季碳原子的基团，当n为2以上时，两个以上（AB）基可以相同或不同，其他; M +表示有机鎓离子。

55. 发明授权

US08865389B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其光化学射线或辐射敏感膜及其形成图案的方法
公开(公告)号：US08865389B2
公开(公告)日：2014-10-21
申请号：US13246618
申请日：2011-09-27
申请人： Shuji Hirano , Hidenori Takahashi , Hideaki Tsubaki
发明人： Shuji Hirano , Hidenori Takahashi , Hideaki Tsubaki
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂，含有结构部分（S1）的重复单元（A），其在被酸作用时分解成从而产生碱溶性基团和结构部分（S2），当被碱显影剂作用时，其分解，从而增加其在碱性显影剂中的溶解速率，以及当暴露于光化射线时的重复单元（B）或辐射，产生酸。

56. 发明申请

US20120082939A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME 失效
标题翻译：活性光敏敏感性或放射性敏感性敏感性树脂组合物和主动光敏敏感或放射性敏感性膜和使用其的图案形成方法
公开(公告)号：US20120082939A1
公开(公告)日：2012-04-05
申请号：US13252657
申请日：2011-10-04
申请人： Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
发明人： Takeshi KAWABATA , Hidenori Takahashi , Tomotaka Tsuchimura , Shuji Hirano , Hideaki Tsubaki
IPC分类号： G03F7/30 , C08F228/02 , H01L21/02 , C08F220/38
CPC分类号： C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided.The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
摘要翻译：一种主动光线敏感或放射线敏感性树脂组合物，同时在很大程度上满足高灵敏度，高分辨率，良好的图案构造和良好的线边缘粗糙度，同时在曝光期间具有足够好的除气性能，以及活性光提供通过使用该组合物形成的射线敏感或放射线敏感膜和图案形成方法。根据本发明的活性光线敏感或放射线敏感性树脂组合物包括含有通过用活性光线照射或放射线分解以产生酸的重复单元（A）的树脂（P）和重复单元（ C）含有伯或仲羟基。

57. 发明申请

US20110287234A1 NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 有权
标题翻译：负极电阻图案形成方法，开发商和负极化学放大电阻组合物及其电阻图案
公开(公告)号：US20110287234A1
公开(公告)日：2011-11-24
申请号：US13146976
申请日：2010-01-29
申请人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
发明人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
IPC分类号： G03F7/038 , G03F7/20 , B32B3/14 , G03F7/30
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/325
摘要： A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
摘要翻译：一种抗蚀剂图案形成方法，包括以下顺序：（1）通过使用能够通过交联反应进行负转化的负性化学增幅抗蚀剂组合物形成膜的步骤，（2）曝光所述膜的步骤，以及（4）通过使用含有有机溶剂的显影剂使曝光的膜显影的步骤; 用于此的显影剂和负化学放大抗蚀剂组合物; 以及通过图案形成方法形成的抗蚀剂图案。

58. 发明授权

US07824836B2 Photosensitive composition and pattern forming method using the same 有权
标题翻译：光敏组合物和使用其的图案形成方法
公开(公告)号：US07824836B2
公开(公告)日：2010-11-02
申请号：US11847629
申请日：2007-08-30
申请人： Hideaki Tsubaki
发明人： Hideaki Tsubaki
IPC分类号： G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/0758 , G03F7/094 , Y10S430/106 , Y10S430/115
摘要： A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined herein.
摘要翻译：光敏组合物含有：在光化射线或辐射照射时能够产生酸的化合物; 由本文定义的式（I-a）表示的碱性化合物; 由本文定义的式（I-b）表示的碱性化合物; 和由本文定义的式（II）表示的表面活性剂。

59. 发明申请

US20090081581A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME 有权
标题翻译：正性感光性组合物和使用其的图案形成方法
公开(公告)号：US20090081581A1
公开(公告)日：2009-03-26
申请号：US12055359
申请日：2008-03-26
申请人： Kunihiko Kodama , Kaoru Iwato , Hideaki Tsubaki , Norihiko Taguchi
发明人： Kunihiko Kodama , Kaoru Iwato , Hideaki Tsubaki , Norihiko Taguchi
IPC分类号： G03F7/20 , G03F7/004 , C08F220/26
CPC分类号： G03F7/0397 , C08F220/26 , C08F220/28 , Y10S430/111
摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.
摘要翻译：正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。

60. 发明申请

US20090042147A1 METHOD OF FORMING PATTERNS 有权
标题翻译：形成图案的方法
公开(公告)号：US20090042147A1
公开(公告)日：2009-02-12
申请号：US12137232
申请日：2008-06-11
申请人： Hideaki Tsubaki
发明人： Hideaki Tsubaki
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/0392 , G03F7/11 , G03F7/325
摘要： A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
摘要翻译：一种形成图案的方法包括（a）用负显影用抗蚀剂组合物涂覆基材以形成抗蚀剂膜，其中抗蚀剂组合物含有能够通过酸的作用而增加极性的树脂，并变得更可溶于阳性显影剂，并且在用光化射线或辐射照射时不太可溶于负显影剂，（b）在形成抗蚀剂膜之后和在曝光抗蚀剂膜之前，用保护膜组合物在抗蚀剂膜上形成保护膜，（c）通过浸渍介质形成抗蚀膜，（d）用负极显影剂进行显影。

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