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    • 56. 发明授权
    • Filter and process for producing same
    • 过滤和生产过程
    • US06255025B1
    • 2001-07-03
    • US09321227
    • 1999-05-27
    • Eiichi AkutsuShigemi OhtsuKeishi ShimizuLyong sun Pu
    • Eiichi AkutsuShigemi OhtsuKeishi ShimizuLyong sun Pu
    • G02B520
    • G02F1/133516G02B5/207G02F1/133512
    • A process for producing a filter comprising: a step of arranging an electrodeposition substrate, which comprises a light transmissible support having a light transmissible conductive film and a photosemiconductor thin film with a photoelectromotive function in this order provided thereon, in such a manner that at least the photosemiconductor thin film is immersed in an electrodeposition solution containing a colored electrodeposition material; a step of imagewise exposing the electrodeposition substrate with applying a voltage or an electric current to the conductive film, to form a colored electrodeposition film in an exposed part; a step of immersing at least the photosemiconductor thin film, in which the colored electrodeposition film has been formed, of the electrodeposition substrate in a metallic plating solution; and a step of applying a voltage or an electric current to the conductive film, to form a black matrix comprising a metallic plating film in a part of the photosemiconductor thin film, in which the colored electrodeposition film is not formed. The black matrix of the metallic plating film may be formed before the formation of the colored electrodeposition film.
    • 一种过滤器的制造方法,其特征在于,具有如下的工序:电沉积基板的制造方法,该电沉积基板具有可透光性的支撑体,该透光性支撑体具有透光性导电膜和具有光电功能的光半导体薄膜, 将光半导体薄膜浸入含有着色电沉积材料的电沉积溶液中; 通过向导电膜施加电压或电流对电沉积基板进行成像曝光的步骤,在曝光部分中形成着色的电沉积膜; 至少将形成有着色电沉积膜的光半导体薄膜浸渍在金属电镀液中的步骤; 以及向导电膜施加电压或电流的步骤,以形成不形成有色电沉积膜的部分光半导体薄膜中的金属镀膜的黑色矩阵。 金属镀膜的黑色矩阵可以在形成有色电沉积膜之前形成。