会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 52. 发明授权
    • Hybrid guided-mode resonance filter and method employing distributed bragg reflection
    • 混合导模谐振滤波器和采用分布式布拉格反射的方法
    • US08369665B2
    • 2013-02-05
    • US13002763
    • 2008-07-14
    • David A. FattalQianfan XuSagi V. MathaiMichael R. Tan
    • David A. FattalQianfan XuSagi V. MathaiMichael R. Tan
    • G02B6/34
    • G02B6/124G02B6/12007G02B6/29316
    • A hybrid guided-mode resonance (GMR) grating, an optical filter and a method of optical filtering employ distributed Bragg reflection. The hybrid GMR grating includes a waveguide layer that supports a GMR having a GMR resonant frequency. The hybrid GMR grating further includes a diffraction grating that couples a portion of a signal incident on the hybrid GMR grating into the waveguide layer; and a distributed Bragg reflector (DBR) that reflects another portion of the incident signal. The coupled portion of the incident signal has a frequency corresponding to the GMR resonant frequency. The reflected portion has a frequency away from the GMR resonant frequency. The optical filter includes the hybrid GMR grating and a coupler. The method includes coupling an optical signal into the hybrid GMR grating and further coupling a reflected signal out of the hybrid GMR grating.
    • 混合导模共振(GMR)光栅,光学滤波器和光学滤波方法采用分布式布拉格反射。 混合GMR光栅包括支持具有GMR谐振频率的GMR的波导层。 混合GMR光栅还包括将入射在混合GMR光栅上的信号的一部分耦合到波导层中的衍射光栅; 以及反射入射信号的另一部分的分布式布拉格反射器(DBR)。 入射信号的耦合部分具有对应于GMR谐振频率的频率。 反射部分具有远离GMR谐振频率的频率。 光学滤波器包括混合GMR光栅和耦合器。 该方法包括将光信号耦合到混合GMR光栅中,并将来自混合GMR光栅的反射信号进一步耦合。
    • 57. 发明申请
    • PHOTODIODE MODULE AND APPARATUS INCLUDING MULTIPLE PHOTODIODE MODULES
    • 光电模块和包含多个光电模块的装置
    • US20110215231A1
    • 2011-09-08
    • US13108733
    • 2011-05-16
    • David A. FattalJason BlackstockDuncan Stewart
    • David A. FattalJason BlackstockDuncan Stewart
    • G01J1/04
    • H04N1/053H04N2201/04787H04N2201/04793H04N2201/04794
    • Various embodiments of the present invention are directed to a photodiode module including a structure configured to selectively couple light to a dielectric-surface mode of a photonic crystal of the photodiode module. In one embodiment of the present invention, a photodiode module includes a semiconductor structure having a p-region and an n-region. The photodiode module further includes a photonic crystal having a surface positioned adjacent to the semiconductor structure. A diffraction grating of the photodiode module may be positioned and configured to selectively couple light incident on the diffraction grating to a dielectric-surface mode associated with the surface of the photonic crystal. In another embodiment of the present invention, a photodiode apparatus includes multiple, stacked photodiode modules, each of which is configured to selectively absorb light at a selected wavelength or range of wavelengths.
    • 本发明的各种实施例涉及一种光电二极管模块,其包括被配置为选择性地将光耦合到光电二极管模块的光子晶体的电介质表面模式的结构。 在本发明的一个实施例中,光电二极管模块包括具有p区和n区的半导体结构。 光电二极管模块还包括具有邻近半导体结构定位的表面的光子晶体。 可以将光电二极管模块的衍射光栅定位和配置为将入射在衍射光栅上的光选择性地耦合到与光子晶体的表面相关联的电介质表面模式。 在本发明的另一实施例中,光电二极管装置包括多个堆叠的光电二极管模块,每个光电二极管模块被配置为选择性地吸收所选择的波长或波长范围的光。
    • 59. 发明申请
    • PHOTONIC STRUCTURE
    • 光电结构
    • US20110006284A1
    • 2011-01-13
    • US12501844
    • 2009-07-13
    • Hans S. ChoDavid A. FattalTheodore I. Kamins
    • Hans S. ChoDavid A. FattalTheodore I. Kamins
    • H01L29/06H01L21/306
    • G02B6/1225B82Y20/00G02B1/005G02B6/136
    • A photonic structure includes a plurality of annealed, substantially smooth-surfaced ellipsoids arranged in a matrix. Additionally, a method of producing a photonic structure is provided. The method includes providing a semiconductor material, providing an etch mask comprising a two-dimensional hole array, and disposing the etch mask on at least one surface of the semiconductor material. The semiconductor material is then etched through the hole array of the etch mask to produce holes in the semiconductor material and thereafter applying a passivation layer to surfaces of the holes. Additionally, the method includes repeating the etching and passivation-layer application to produce a photonic crystal structure that contains ellipsoids within the semiconductor material and annealing the photonic crystal structure to smooth the surfaces of the ellipsoids.
    • 光子结构包括排列成矩阵的多个退火的基本上平滑的表面的椭圆体。 另外,提供了一种制造光子结构的方法。 该方法包括提供半导体材料,提供包括二维孔阵列的蚀刻掩模,并将蚀刻掩模设置在半导体材料的至少一个表面上。 然后通过蚀刻掩模的孔阵列蚀刻半导体材料,以在半导体材料中产生孔,然后将钝化层施加到孔的表面。 此外,该方法包括重复蚀刻和钝化层应用以产生在半导体材料内包含椭圆体的光子晶体结构,并退火光子晶体结构以平滑椭圆体的表面。