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    • 53. 发明授权
    • Coated, fine metal particles comprising titanium oxide and silicon oxide coating, and their production method
    • 涂布的包含氧化钛和氧化硅涂层的金属微粒及其制造方法
    • US08481115B2
    • 2013-07-09
    • US12934589
    • 2009-03-26
    • Hisato TokoroTakashi NakabayashiShigeo Fujii
    • Hisato TokoroTakashi NakabayashiShigeo Fujii
    • B32B5/16B05D7/00B05D7/14B05D3/10
    • B22F9/20B22F1/02B22F2999/00C22C1/058Y10T428/2993B22F1/0088B22F1/0085
    • A method for producing coated, fine metal particles each having a Ti oxide coating and a silicon oxide coating formed in this order on a metal core particle by mixing powder comprising TiC and TiN with oxide powder of a metal M meeting the relation of ΔGM-O>ΔGTiO2, wherein ΔGM-O represents the standard free energy of forming an oxide of the metal M; heat-treating the resultant mixed powder in a non-oxidizing atmosphere to reduce the oxide of the metal M with the powder comprising TiC and TiN, while coating the resultant metal M particles with Ti oxide; coating the Ti-oxide-coated surface with silicon oxide; and classifying the resultant particles such that they have a median diameter d50 of 0.4-0.7 μm, and a variation coefficient (=standard deviation/average particle size) of 35% or less, which indicates a particle size distribution range. Coated, fine metal particles each having a Ti oxide coating and a silicon oxide coating formed in this order on a metal core particle, which has a median diameter d50 of 0.4-0.7 μm, and a variation coefficient (=standard deviation/average particle size) of 35% or less, which indicates a particle size distribution range.
    • 一种生产涂覆的金属微粒的方法,其具有通过将包含TiC和TiN的粉末与满足DeltaGM-O的关系的金属M的氧化物粉末混合在一起而在金属芯颗粒上依次形成的氧化钛涂层和氧化硅涂层 > DeltaGTiO 2,其中ΔGM-O表示形成金属M的氧化物的标准自由能; 在非氧化气氛下对所得混合粉末进行热处理,同时用Ti氧化物涂覆所得到的金属M颗粒,同时用含有TiC和TiN的粉末来还原金属M的氧化物; 用氧化硅涂覆Ti氧化物涂层表面; 对所得颗粒进行分级,使其中值粒径d50为0.4〜0.7μm,变动系数(=标准偏差/平均粒径)为35%以下,表示粒径分布范围。 涂覆有金属颗粒,每个氧化铝涂层和氧化硅涂层依次形成在金属芯颗粒上,中心粒径d50为0.4-0.7μm,变化系数(=标准偏差/平均粒径 )为35%以下,表示粒径分布范围。
    • 56. 发明授权
    • Polishing composition
    • 抛光组成
    • US07666238B2
    • 2010-02-23
    • US11948705
    • 2007-11-30
    • Shigeo FujiiHiroyuki YoshidaToshiya HagiharaHiroaki Kitayama
    • Shigeo FujiiHiroyuki YoshidaToshiya HagiharaHiroaki Kitayama
    • B24D3/02C09C1/68C09G1/02C09K13/00
    • C09G1/02C09K3/1409C09K3/1463
    • A polishing composition comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; a process for producing a substrate comprising polishing a substrate to be polished using the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition to polishing with a polishing pad for a nickel-containing object to be polished; and a process for preventing clogging of a polishing pad comprising applying a composition comprising a hydrophilic polymer having two or more hydrophilic groups in its molecule and a molecular weight of 300 or more, or a compound capable of dissolving nickel hydroxide at a pH of 8.0, and water to polishing with a polishing pad for a nickel-containing object to be polished.
    • 一种抛光组合物,其包含研磨剂和水,其中所述抛光组合物的沉降度指数为80以上且100以下; 用于制造基材的方法,包括使用上述组合物抛光待抛光的基材; 防止抛光垫堵塞的方法,包括施加上述组合物; 一种用于防止抛光垫堵塞的方法,包括将上述组合物用抛光用的待研磨的含镍物体的抛光垫进行抛光; 以及防止抛光垫堵塞的方法,包括在其分子中施加包含其分子中具有两个或更多个亲水基团的亲水性聚合物和分子量为300以上的组合物或能够溶解氢氧化镍的化合物在pH为8.0的组合物, 和水用抛光用的抛光垫进行抛光。
    • 57. 发明授权
    • Internet telephone system, call connection controller, terminal association method used therein and its program
    • 互联网电话系统,呼叫连接控制器,终端关联方法及其程序
    • US07660597B2
    • 2010-02-09
    • US10760423
    • 2004-01-21
    • Shigeo Fujii
    • Shigeo Fujii
    • H04B7/00
    • H04M3/42323H04M3/42314H04M7/006
    • A PBX, when notified information of an originating manipulation such as dialing of a receiver's number from a keyboard connected with a PC, judges whether an origination request is from the PC or a first terminal. In a case of the request being from the PC, the PBX performs number analysis processing of the PC which is the originator. The PBX judges whether there is information about a terminal associating with the terminal requesting the origination, and when there is information for the terminal, performs to connect with the associating terminal, and processes the origination request to thereby connect with the counterpart terminal. When there is no information about the terminal, the PBX processes the origination request as usual to thereby connect with the counterpart terminal.
    • PBX,当从与PC连接的键盘拨打接收机号码等发端操作的通知信息时,判断发起请求是来自PC还是第一终端。 在来自PC的请求的情况下,集团电话对作为发起者的PC进行数字分析处理。 PBX判断是否存在与终端相关联的请求发起的终端的信息,并且当存在终端的信息时,执行与关联终端的连接,并处理发起请求,从而与对方终端进行连接。 当没有关于终端的信息时,PBX照常处理发起请求,从而与对方终端连接。
    • 58. 发明授权
    • Polishing composition
    • 抛光组成
    • US07553345B2
    • 2009-06-30
    • US10737841
    • 2003-12-18
    • Hiroaki KitayamaShigeo Fujii
    • Hiroaki KitayamaShigeo Fujii
    • C09G1/02C09G1/04B24B1/00
    • C09K3/1463C09G1/02C09K3/1409
    • A microwaviness reducing agent for polishing a substrate for a precision part, containing either a surfactant having two or more ionic hydrophilic groups, or a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, or a salt thereof; a polishing composition for a substrate for a precision part, containing the microwaviness reducing agent, an abrasive and water; a polishing composition comprising water, an abrasive, an organic acid or a salt thereof, and a surfactant, wherein the organic acid is a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, and wherein the surfactant has two or more ionic hydrophilic groups in its molecule and has a molecular weight of 300 or more; a method of reducing microwaviness of a substrate for a precision part; and a method for manufacturing a substrate for a precision part.
    • 用于抛光含有具有两个或更多个离子性亲水基团的表面活性剂的精密部件用基材或具有2〜15个总碳原子并具有OH基团或SH基团的多元羧酸化合物的微波降低剂, 或其盐; 用于精密部件用基材的抛光组合物,含有微波还原剂,研磨剂和水; 包含水,研磨剂,有机酸或其盐和表面活性剂的抛光组合物,其中所述有机酸是具有2至15个总碳原子并具有OH基团或SH基团或多个基团的多元羧酸化合物, 并且其中所述表面活性剂在其分子中具有两个或更多个离子亲水基团并且具有300或更大的分子量; 降低精密部件的基板的微波的方法; 以及精密部件用基板的制造方法。