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    • 53. 发明申请
    • ROUTING METHOD AND APPARATUS FOR SUPPORTING QoS IN WIRELESS NETWORK
    • 无线网络支持QoS的路由方法和设备
    • US20120163171A1
    • 2012-06-28
    • US13296497
    • 2011-11-15
    • Anseok LEEHyun-Jae KimKwang Jae LimDong Seung Kwon
    • Anseok LEEHyun-Jae KimKwang Jae LimDong Seung Kwon
    • H04W40/00H04W72/04
    • H04L45/302H04W40/12
    • A method for routing and setting up a connection to provide Quality of Service (QoS) required in a wireless network is provided, which allows to use a path capable of providing QoS higher than a certain level between a source node and a destination node. A routing apparatus includes: a connection management unit that receives a connection setup request directed to a destination node, determines a predicted path leading to the destination node and the next node, and transmits a connection setup request to the next node; a resource allocation unit that allocates resources so as to satisfy required QoS; a routing unit that measures available QoS information of a link and enables the exchange of information of the link including the QoS information with the nodes of the network; and a routing information management unit that stores received routing information.
    • 提供了一种用于路由和建立连接以提供无线网络中所需的服务质量(QoS)的方法,其允许使用能够提供高于源节点和目的地节点之间的特定级别的QoS的路径。 路由装置包括:连接管理单元,其接收针对目的地节点的连接建立请求,确定通向目的地节点和下一节点的预测路径,并向下一节点发送连接建立请求; 资源分配单元,其分配资源以满足所需的QoS; 路由单元,其测量链路的可用QoS信息,并且使得包括QoS信息的链路的信息与网络的节点交换; 以及路由信息管理单元,其存储接收到的路由信息​​。
    • 57. 发明授权
    • Thin film transistor having a three-portion gate electrode and liquid crystal display using the same
    • 具有三部分栅电极的薄膜晶体管和使用其的液晶显示器
    • US07538349B2
    • 2009-05-26
    • US11621277
    • 2007-01-09
    • Myung-Koo KangHyun-Jae KimSook-Young KangWoo-Suk Chung
    • Myung-Koo KangHyun-Jae KimSook-Young KangWoo-Suk Chung
    • H01L21/00
    • H01L29/42384G02F1/13454G02F2202/104H01L21/02675H01L21/2026H01L29/78675
    • The present invention relates to a thin film transistor and a liquid crystal display. A gate electrode is formed to include at least one portion extending in a direction perpendicular to a gain growing direction in order to make electrical charge mobility of TFTs uniform without increasing the size of the driving circuit. A thin film transistor according to the present invention includes a semiconductor pattern a thin film of poly-crystalline silicon containing grown grains on the insulating substrate. The semiconductor pattern includes a channel region and source and drain regions opposite with respect to the channel region. A gate insulating layer covers the semiconductor pattern. On the gate insulating layer, a gate electrode including at least one portion extending in a direction crossing the growing direction of the grains and overlapping the channel region is formed. In a liquid crystal display according to the present invention, a plurality of thin film transistors forming a data driver circuit include thin films of polycrystalline silicon formed by sequential lateral solidification, at least one portion of a gate electrode of each thin film transistor extends in a direction crossing the grain growing direction, and at least one of the plurality of thin film transistors has a gate electrode having a pattern different from other thin film transistors.
    • 本发明涉及薄膜晶体管和液晶显示器。 栅电极被形成为包括沿垂直于增益生长方向的方向延伸的至少一个部分,以使TFT的电荷迁移率均匀,而不增加驱动电路的尺寸。 根据本发明的薄膜晶体管包括在绝缘基板上具有含有生长晶粒的多晶硅薄膜的半导体图案。 半导体图案包括沟道区和相对于沟道区相反的源极和漏极区。 栅极绝缘层覆盖半导体图案。 在栅极绝缘层上形成栅电极,该栅电极具有沿与晶粒的生长方向交叉的方向延伸的至少一部分,与沟道区重叠。 在根据本发明的液晶显示器中,形成数据驱动电路的多个薄膜晶体管包括通过顺序横向固化形成的多晶硅薄膜,每个薄膜晶体管的栅电极的至少一部分以 方向与晶粒生长方向交叉,并且多个薄膜晶体管中的至少一个具有与其它薄膜晶体管不同的图案的栅电极。
    • 59. 发明申请
    • MASK FOR CRYSTALLIZING POLYSILICON AND A METHOD FOR FORMING THIN FILM TRANSISTOR USING THE MASK
    • 用于晶体结晶的掩模和使用掩模形成薄膜晶体管的方法
    • US20070187846A1
    • 2007-08-16
    • US11737245
    • 2007-04-19
    • Myung-Koo KangHyun-Jae KimSook-Young Kang
    • Myung-Koo KangHyun-Jae KimSook-Young Kang
    • H01L21/027
    • H01L21/02675H01L21/02532H01L21/0268H01L21/2026H01L29/66757H01L29/78675Y10S260/35
    • A mask for forming polysilicon has a first slit region where a plurality of horizontal slit patterns are arranged in the vertical direction while bearing the same width, a second slit region where a plurality of horizontal slit patterns are arranged in the vertical direction while baring the same width, a third slit region where a plurality of horizontal slit patterns are arranged in the vertical direction while bearing the same width, and a fourth slit region where a plurality of horizontal slit patterns are arranged in the vertical direction while bearing the same width. The slit patterns arranged at the first to fourth slit regions are sequentially enlarged in width in the horizontal direction in multiple proportion to the width d of the slit pattern at the first slit region. The centers of the slit patterns arranged at the first to fourth slit regions in the horizontal direction are placed at the same line. The slit patterns arranged at the respective slit regions in the vertical direction are spaced from each other with a distance 8*d. Alternatively, the first to fourth slit regions may be arranged in reverse order, or in the vertical direction.
    • 用于形成多晶硅的掩模具有第一狭缝区域,其中垂直方向上布置多个水平狭缝图案,同时承载相同的宽度;第二狭缝区域,其中沿垂直方向布置多个水平狭缝图案,同时使其相同 宽度,在垂直方向上布置多个水平狭缝图案同时具有相同宽度的第三狭缝区域,以及沿垂直方向布置多个水平狭缝图案的第四狭缝区域,同时承载相同的宽度。 布置在第一至第四狭缝区域的狭缝图案在第一狭缝区域上与狭缝图案的宽度d成一定比例地沿水平方向的宽度依次增大。 沿水平方向布置在第一至第四狭缝区域处的狭缝图案的中心位于相同的线上。 在垂直方向的各个狭缝区域上排列的狭缝图案间隔8 * d。 或者,第一至第四狭缝区域可以以相反的顺序或在垂直方向上布置。
    • 60. 发明授权
    • Mask for polycrystallization and method of manufacturing thin film transistor using polycrystallization mask
    • 多结晶掩模和使用多结晶掩模制造薄膜晶体管的方法
    • US07011911B2
    • 2006-03-14
    • US10663081
    • 2003-09-16
    • Hyun-Jae KimSook-Young KangMyung-Koo Kang
    • Hyun-Jae KimSook-Young KangMyung-Koo Kang
    • G03F9/00
    • H01L29/66757H01L29/78675
    • In a method of manufacturing a thin film transistor according to the present invention, an amorphous silicon thin film is firstly formed on an insulating substrate and a planarization layer is formed thereon. Thereafter, the amorphous silicon thin film is crystallized by a solidification process using a laser-irradiation to form a polysilicon thin film. Next, the polysilicon thin film and the planarization layer are patterned to form a semiconductor layer, and a gate insulating layer covering the semiconductor layer is formed. Then, a gate electrode is formed on the gate insulating layer opposite the semiconductor layer. Next, impurities are implanted into the semiconductor layer to form a source region and a drain region opposite each other with respect to the gate electrode, and a source electrode and a drain electrode electrically connected to the source region and the drain region, respectively, are formed.
    • 在本发明的薄膜晶体管的制造方法中,首先在绝缘基板上形成非晶硅薄膜,在其上形成平坦化层。 此后,通过使用激光照射的固化工艺使非晶硅薄膜结晶,形成多晶硅薄膜。 接下来,对多晶硅薄膜和平坦化层进行构图以形成半导体层,并且形成覆盖半导体层的栅极绝缘层。 然后,在与半导体层相对的栅极绝缘层上形成栅电极。 接下来,将杂质注入到半导体层中以形成相对于栅极彼此相对的源极区域和漏极区域,并且分别与源极区域和漏极区域电连接的源极电极和漏极电极是 形成。