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51. 发明授权

US06795163B2 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby 有权
标题翻译：平版印刷制造工艺，光刻投影装置和由此制造的装置
公开(公告)号：US06795163B2
公开(公告)日：2004-09-21
申请号：US10114309
申请日：2002-04-03
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： G03B2742
CPC分类号： G03F7/70558 , G03F7/70458 , G03F7/70625 , G03F7/70991
摘要： A lithographic manufacturing process is disclosed in which a first information on a first lithographic transfer function of a first lithographic projection apparatus is obtained. The information is compared with a second information on a second lithographic transfer function of a second lithographic projection apparatus, for reference. The difference between the first and second information is calculated. Then, the change of machine settings for the first lithographic projection apparatus, needed to minimize the difference, is calculated and applied to the first lithographic projection apparatus such that the match between the first and second lithographic projection apparatus of any pitch-dependency of feature errors is improved.
摘要翻译：公开了一种光刻制造方法，其中获得关于第一光刻投影装置的第一平版印刷传递函数的第一信息。将该信息与第二光刻投影设备的第二光刻传递函数的第二信息进行比较以供参考。计算第一和第二信息之间的差异。然后，计算第一光刻投影设备最小化所需的第一平版印刷投影设备的机器设置的改变并将其应用于第一平版印刷投影设备，使得第一和第二光刻投影设备之间的任意间距依赖性的特征误差改进了

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