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    • 57. 发明授权
    • Buried heterostructure semiconductor laser device
    • 埋地异质结半导体激光器件
    • US4910744A
    • 1990-03-20
    • US130352
    • 1987-12-08
    • Toshihiko YoshidaHaruhisa TakiguchiShinji KaneiwaHiroaki Kudo
    • Toshihiko YoshidaHaruhisa TakiguchiShinji KaneiwaHiroaki Kudo
    • H01S5/00H01S5/227
    • H01S5/227H01S5/0035H01S5/2277
    • A semiconductor laser device comprising a semiconductor substrate, an active layer having a refractive index greater than that of said substrate and having an energy gap smaller than that of said substrate, and a cladding layer having a conductivity type different from that of said substrate, in that order, resulting in a double-heterostructure, wherein two parallel grooves with a given distance therebetween are disposed in the double-heterostructure so as to reach said substrate and a first burying layer having the same conductivity type as said substrate, a second burying layer having a conductivity type different from that of said substrate and a third burying layer having the same conductivity type as said substrate are disposed outside of the two grooves in that order, and moreover a semiconductor layer with the flat surface having a conductivity type different from that of said substrate is disposed over the third burying layer and the area positioned between the two parallel grooves.
    • 一种半导体激光器件,包括半导体衬底,具有比所述衬底的折射率大的折射率并且具有比所述衬底的能隙小的能隙的有源层以及具有与所述衬底的导电类型不同的导电类型的覆层, 导致双异质结构,其中在双异质结构中设置两个具有给定距离的平行凹槽,以便到达所述衬底和具有与所述衬底相同的导电类型的第一掩埋层,第二掩埋层 具有不同于所述衬底的导电类型和具有与所述衬底相同的导电类型的第三掩埋层以该顺序布置在两个沟槽的外侧,此外,具有不同于其的导电类型的平坦表面的半导体层 的所述衬底设置在所述第三掩埋层上并且位于所述两个平行的区域之间 oves。