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    • 42. 发明授权
    • Data demodulator device
    • 数据解调器装置
    • US06118831A
    • 2000-09-12
    • US840970
    • 1997-04-21
    • Takahiko MasumotoKazuhiro KimuraHiroshi Kaneko
    • Takahiko MasumotoKazuhiro KimuraHiroshi Kaneko
    • H04L27/22H04H40/18H04L1/20H04L25/08H04L27/00H04L27/233H04L27/06
    • H04L27/2332H04H40/18H04H2201/13H04L2027/0046
    • An RDS signal is binarized by a comparator (2) and the output is sampled by a regeneration clock in synchronism with a regeneration carrier to provide sampled data. Then, by means of an accumulator (an adder 6 and a D-FF7) or a low pass filter (12), an integration result of the sampled output is obtained for each biphase symbol and by means of a biphase decoder circuit (9), the integration results are subjected to a subtraction between two symbols making up a pair. A differentially coded RDS data can be obtained using the sign of the subtraction result, which is differentially decoded in a differential decoder circuit (11) to provide an RDS data. In addition, the absolute value of the subtraction result is compared with a predetermined threshold value to provide reliability data for each differentially coded RDS data using the comparison result. The lower one of the consecutive reliability data may be assumed to be the reliability data for the RDS data.
    • RDS信号由比较器(2)二值化,并且通过与再生载体同步的再生时钟对输出进行采样,以提供采样数据。 然后,通过累加器(加法器6和D-FF7)或低通滤波器(12),对于每个双相符号获得采样输出的积分结果,并通过双相解码器电路(9)获得积分结果, ,整合结果在构成一对的两个符号之间进行减法。 可以使用在差分解码器电路(11)中进行差分解码的减法结果的符号来获得差分编码的RDS数据,以提供RDS数据。 此外,将减法结果的绝对值与预定阈值进行比较,以使用比较结果为每个差分编码的RDS数据提供可靠性数据。 可以将连续可靠性数据中的较低的一个假定为RDS数据的可靠性数据。
    • 47. 发明授权
    • Device for processing substrate and method of manufacturing semiconductor device
    • US07682987B2
    • 2010-03-23
    • US12225118
    • 2007-06-22
    • Kazuhiro YuasaKazuhiro KimuraYasuhiro Megawa
    • Kazuhiro YuasaKazuhiro KimuraYasuhiro Megawa
    • H01L21/31H01L21/469
    • H01L21/67253Y10S438/908Y10S438/913
    • Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a process chamber is not kept constant, and which enable a better processing of a substrate. The substrate processing apparatus has: a process chamber for processing a substrate; a reactive gas-supplying module for supplying a reactive gas into the process chamber; a reactive gas-supplying line for supplying the reactive gas from the reactive gas-supplying module into the process chamber; an exhaust line for exhausting an inside of the process chamber; a pump provided in the exhaust line for vacuumizing the inside of the process chamber; a pressure-adjusting valve provided in the exhaust line for adjusting a pressure in the process chamber; a first pressure-measuring instrument for measuring an inside pressure of the process chamber; a second pressure-measuring instrument for measuring a differential pressure between the inside pressure of the process chamber and an outside pressure thereof; and a controller which controls the pressure-adjusting valve based on a value of the inside pressure of the process chamber measured by the first pressure-measuring instrument so as to keep the inside pressure of the process chamber constant, and controls the reactive gas-supplying module based on a value of the differential pressure measured by the second pressure-measuring instrument so as to allow supply of the reactive gas into the process chamber in a case of the inside pressure of the process chamber being smaller than the outside pressure thereof, and so as to preclude supply of the reactive gas into the process chamber in a case of the inside pressure of the process chamber being larger than the outside pressure thereof when processing the substrate.
    • 49. 发明申请
    • Device for Processing Substrate and Method of Manufacturing Semiconductor Device
    • 基板加工装置及制造半导体装置的方法
    • US20090170337A1
    • 2009-07-02
    • US12225118
    • 2007-06-22
    • Kazuhiro YuasaKazuhiro KimuraYasuhiro Megawa
    • Kazuhiro YuasaKazuhiro KimuraYasuhiro Megawa
    • H01L21/31B05C11/00
    • H01L21/67253Y10S438/908Y10S438/913
    • Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a process chamber is not kept constant, and which enable a better processing of a substrate. The substrate processing apparatus has: a process chamber for processing a substrate; a reactive gas-supplying module for supplying a reactive gas into the process chamber; a reactive gas-supplying line for supplying the reactive gas from the reactive gas-supplying module into the process chamber; an exhaust line for exhausting an inside of the process chamber; a pump provided in the exhaust line for vacuumizing the inside of the process chamber; a pressure-adjusting valve provided in the exhaust line for adjusting a pressure in the process chamber; a first pressure-measuring instrument for measuring an inside pressure of the process chamber; a second pressure-measuring instrument for measuring a differential pressure between the inside pressure of the process chamber and an outside pressure thereof; and a controller which controls the pressure-adjusting valve based on a value of the inside pressure of the process chamber measured by the first pressure-measuring instrument so as to keep the inside pressure of the process chamber constant, and controls the reactive gas-supplying module based on a value of the differential pressure measured by the second pressure-measuring instrument so as to allow supply of the reactive gas into the process chamber in a case of the inside pressure of the process chamber being smaller than the outside pressure thereof, and so as to preclude supply of the reactive gas into the process chamber in a case of the inside pressure of the process chamber being larger than the outside pressure thereof when processing the substrate.
    • 提供了由于处理室内的压力不保持恒定而难以引起基板处理缺陷的基板处理装置和半导体装置的制造方法,能够更好地处理基板。 基板处理装置具有:处理基板的处理室; 用于将反应性气体供应到处理室中的反应气体供应模块; 用于将来自反应气体供应模块的反应气体供应到处理室中的反应气体供应管线; 用于排出处理室内部的排气管线; 设置在排气管线中的用于对处理室的内部进行抽真空的泵; 设置在所述排气管路中用于调节所述处理室中的压力的​​压力调节阀; 用于测量处理室的内部压力的第一压力测量仪器; 用于测量处理室的内部压力与其外部压力之间的压差的第二压力测量仪器; 以及控制器,其基于由所述第一压力测量仪测量的所述处理室的内部压力的值来控制所述压力调节阀,以便保持所述处理室的内部压力恒定,并且控制所述反应性气体供给 模块,其基于由所述第二压力测量仪测量的所述压差的值,以便在所述处理室的内部压力小于其外部压力的情况下允许将所述反应气体供应到所述处理室中;以及 在处理基板时,在处理室的内部压力大于其外部压力的情况下,防止反应气体供应到处理室中。
    • 50. 发明申请
    • Apparatus, method and computer program product for optimum translation based on semantic relation between words
    • 基于词之间语义关系的最佳翻译的装置,方法和计算机程序产品
    • US20070100601A1
    • 2007-05-03
    • US11446961
    • 2006-06-06
    • Kazuhiro Kimura
    • Kazuhiro Kimura
    • G06F17/28
    • G06F17/2872G06F17/2755G06F17/279Y10S707/99948
    • A machine translation apparatus includes a identification information detection unit that detects information identifiable to a designated object; a receiving unit that receives a source language sentence; a word dividing unit that divides the source language sentence into a plurality of first word by morphological analysis; a deixis detection unit that detects, from the divided word, a deixis indicating the object directly; a correspondence setting unit that sets the identification information of the designated object and the deixis in correspondence with each other; a semantic class determining unit that determines the semantic class indicating a semantic attribute of the designated objectbased on the identification information of the designated object corresponding to the deixis; and a translation unit that translates the source language sentence where the deixis is attached the attribute having the semantic class of the designated object.
    • 机器翻译装置包括:识别信息检测单元,其检测可指定对象的信息; 接收源语言句的接收单元; 通过形态分析将源语言句分为多个第一个词的单词分割单元; 一个指示检测单元,用于从划分的字检测指示对象的指示符; 对应设置单元,其将指定对象的识别信息和指示符相对应地设置; 语义类确定单元,其基于与所述指示对象相对应的所述指定对象的识别信息,来确定指示所述指定对象的语义属性的所述语义类; 以及翻译单元,其翻译与所指定对象的语义类别相关联的属性的源语言句子。