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    • 41. 发明授权
    • Field effect transistor and method of manufacturing the same
    • 场效应晶体管及其制造方法
    • US08378387B2
    • 2013-02-19
    • US12919467
    • 2009-01-21
    • Kazuki OtaYasuhiro Okamoto
    • Kazuki OtaYasuhiro Okamoto
    • H01L29/78
    • H01L29/42356H01L29/0657H01L29/2003H01L29/41741H01L29/517H01L29/518H01L29/66462H01L29/7781H01L29/7785H01L29/7788
    • A field effect transistor according to the present invention includes A field effect transistor, comprising: a nitride-based semiconductor multilayer structure, at least including, a drift layer formed of n-type or i-type AlxGa1-xN (0≦X≦0.3), a barrier layer formed of i-type AlYGa1-Y (Y>X), an electron supply layer formed of n-type AlYGa1-YN, and a channel layer formed of i-type GaN or InGaN, that are epitaxially grown on a substrate in this order, from the side of the substrate, a suitable buffer layer being interposed between the substrate and the nitride-based semiconductor multilayer structure; a gate electrode formed in a part of a front surface of the channel layer with an insulating film interposed therebetween; an n+type connection region in which n-type impurities are doped with the density of 1×1018 cm−3 or more, in a range from at least a part of a channel layer to a part of the drift layer, adjacent to one side in a planer direction of an area where the gate electrode is formed; a source electrode formed on a front surface of the semiconductor layer in the opposite side of the n+type connection region with respect to the gate electrode; and a drain electrode formed on a back surface of the substrate.
    • 根据本发明的场效应晶体管包括A场效应晶体管,包括:氮化物基半导体多层结构,至少包括由n型或i型Al x Ga 1-x N形成的漂移层(0& NlE; X≦̸ 0.3 ),由i型AlYGa1-Y(Y> X)形成的阻挡层,由n型AlYGa1-YN形成的电子供给层和由i型GaN或InGaN形成的沟道层,其外延生长在 从基板的侧面依次形成基板,在基板和氮化物系半导体多层结构之间插入合适的缓冲层; 栅电极,其形成在沟道层的前表面的一部分中,绝缘膜插入其间; 在从沟道层的至少一部分到漂移层的一部分的范围内,以1×10 18 cm -3以上的密度掺杂n型杂质的n +型连接区域,与一个 在形成栅电极的区域的平面方向; 源极,其形成在所述半导体层的与所述n +型连接区相对于所述栅极的相反侧的前表面上; 以及形成在所述基板的背面上的漏电极。
    • 42. 发明申请
    • FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    • 场效应晶体管及其制造方法
    • US20110006345A1
    • 2011-01-13
    • US12919467
    • 2009-01-21
    • Kazuki OtaYasuhiro Okamoto
    • Kazuki OtaYasuhiro Okamoto
    • H01L29/78H01L21/336
    • H01L29/42356H01L29/0657H01L29/2003H01L29/41741H01L29/517H01L29/518H01L29/66462H01L29/7781H01L29/7785H01L29/7788
    • A field effect transistor according to the present invention includes A field effect transistor, comprising: a nitride-based semiconductor multilayer structure, at least including, a drift layer formed of n-type or i-type AlxGa1-xN (0≦X≦0.3), a barrier layer formed of i-type AlYGa1-Y (Y>X), an electron supply layer formed of n-type AlYGa1-YN, and a channel layer formed of i-type GaN or InGaN, that are epitaxially grown on a substrate in this order, from the side of the substrate, a suitable buffer layer being interposed between the substrate and the nitride-based semiconductor multilayer structure; a gate electrode formed in a part of a front surface of the channel layer with an insulating film interposed therebetween; an n+type connection region in which n-type impurities are doped with the density of 1×1018 cm−3 or more, in a range from at least a part of a channel layer to a part of the drift layer, adjacent to one side in a planer direction of an area where the gate electrode is formed; a source electrode formed on a front surface of the semiconductor layer in the opposite side of the n+type connection region with respect to the gate electrode; and a drain electrode formed on a back surface of the substrate.
    • 根据本发明的场效应晶体管包括A场效应晶体管,包括:氮化物基半导体多层结构,至少包括由n型或i型Al x Ga 1-x N形成的漂移层(0& NlE; X≦̸ 0.3 ),由i型AlYGa1-Y(Y> X)形成的阻挡层,由n型AlYGa1-YN形成的电子供给层和由i型GaN或InGaN形成的沟道层,其外延生长在 从基板的侧面依次形成基板,在基板和氮化物系半导体多层结构之间插入合适的缓冲层; 栅电极,其形成在沟道层的前表面的一部分中,绝缘膜插入其间; 在从沟道层的至少一部分到漂移层的一部分的范围内,以1×10 18 cm -3以上的密度掺杂n型杂质的n +型连接区域,与一个 在形成栅电极的区域的平面方向; 源极,其形成在所述半导体层的与所述n +型连接区相对于所述栅极的相反侧的前表面上; 以及形成在所述基板的背面上的漏电极。
    • 43. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20140203877A1
    • 2014-07-24
    • US14239810
    • 2012-08-21
    • Kazuki Ota
    • Kazuki Ota
    • H03F3/16
    • H03F3/16H01L29/2003H01L29/402H01L29/7786
    • A semiconductor device is provided with: a field-effect transistor that has a source electrode and a drain electrode that are connected to a semiconductor layer, a gate electrode that is provided on the surface of the semiconductor layer between the source electrode and the drain electrode, and a field plate electrode that is provided on the surface of the semiconductor layer in the vicinity of the gate electrode via an insulating layer, wherein the field-effect transistor amplifies high frequency signals received by the gate electrode to be outputted from the drain electrode; and a voltage dividing circuit that divides a potential difference between the drain electrode and a reference potential GND, and applies a bias voltage such that respective parts of the field plate electrode have a mutually equal potential.
    • 半导体器件具有:具有连接到半导体层的源电极和漏电极的场效应晶体管,设置在源电极和漏极之间的半导体层的表面上的栅电极 以及通过绝缘层设置在栅电极附近的半导体层的表面上的场板电极,其中场效应晶体管放大由栅电极接收的高频信号,以从漏极输出 ; 以及分压电路,其分割漏电极和基准电位GND之间的电位差,并施加偏置电压,使得场板电极的各个部分具有相互相等的电位。