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41. 发明授权

US6093240A Binder composition and aqueous coating composition 失效
标题翻译：粘合剂组合物和水性涂料组合物
公开(公告)号：US6093240A
公开(公告)日：2000-07-25
申请号：US896175
申请日：1997-07-17
申请人： Kazuyuki Matsumura , Masanao Kamei , Mitsuo Asai , Masaaki Yamaya , Fujio Yagihashi
发明人： Kazuyuki Matsumura , Masanao Kamei , Mitsuo Asai , Masaaki Yamaya , Fujio Yagihashi
IPC分类号： C08L83/08 , C08G77/26 , C08G77/28 , C08L83/04 , C09D183/04 , C09D183/08
CPC分类号： C09D183/08 , C08G77/26
摘要： An organic silicon compound is obtained by hydrolyzing (A) a hydrolyzable silane containing an alkoxy or acyloxy group and a nitrogenous organic group: and (B) a hydrolyzable silane containing an alkoxy or acyloxy group. The hydrolyzate or organic licon compound is available as an aqueous solution which is ready for use as a binder composition. An aqueous coating composition comprising the binder composition and optionally, a UV screen compound is also provided. The binder composition and the coating composition are shelf stable and impart water resistance, heat resistance and weatherability.
摘要翻译：通过水解（A）含有烷氧基或酰氧基和含氮有机基团的水解性硅烷得到有机硅化合物：（B）含有烷氧基或酰氧基的可水解硅烷。水解产物或有机icon化合物可作为水溶液使用，其可用作粘合剂组合物。还提供了包含粘合剂组合物和任选的UV屏蔽化合物的水性涂料组合物。粘合剂组合物和涂料组合物是稳定的并具有耐水性，耐热性和耐候性。

42. 发明授权

US6001422A Method for finishing treatment of a fabric material 失效
标题翻译：织物材料整理处理方法
公开(公告)号：US6001422A
公开(公告)日：1999-12-14
申请号：US58162
申请日：1998-04-10
申请人： Motohiko Hirai , Fujio Yagihashi
发明人： Motohiko Hirai , Fujio Yagihashi
IPC分类号： C07F7/08 , C07F7/18 , C08L83/08 , D06M15/643 , D06M101/00 , D06M101/02 , D06M101/06 , D06M101/08 , B05D3/02
CPC分类号： D06M15/6436 , D06M2101/06 , D06M2101/08 , D06M2101/12 , D06M2101/26 , D06M2101/32 , D06M2101/34 , D06M2101/38 , D06M2200/25 , D06M2200/50
摘要： Proposed is a method for the finishing treatment of various kinds of fabric materials with an aminoalkyl-modified dimethylpolysiloxane to impart the fabric material with excellent softness and smoothness with less disadvantages of yellowing of the treated fabric material than in the prior art using similar aminoalkyl-modified dimethylpolysiloxanes. In the inventive method, the aminoalkyl-modified dimethylpolysiloxane is represented by the general formulaA--SiR.sub.2 --O--(--SiR.sub.2 --O--).sub.p --(--SiRQ--O--).sub.q --SiR.sub.2 --A,in which R is a monovalent hydrocarbon group having 1 to 20 carbon atoms, Q is an aminoalkyl group expressed by the general formula--R.sup.1 --(--NH--CH.sub.2 --CH.sub.2 --).sub.n --NH.sub.2,R.sup.1 being a divalent hydrocarbon group having 1 to 8 carbon atoms and the subscript n being 2 or 3, A is a hydroxyl group, R, OR or Q, the subscript p is an average number in the range from 5 to 2000 and the subscript q is 0 or an average number not exceeding 100 with the proviso that q is not 0 when the groups denoted by A in a molecule are each a hydroxyl group, R or OR, and having an amine equivalent in the range from 5000 to 100,000 g/mole.
摘要翻译：提出了使用氨基烷基改性的二甲基聚硅氧烷对各种织物进行精加工处理的方法，以使得织物材料具有优异的柔软性和光滑度，而与已有技术相似的氨基烷基改性的处理过的织物材料变黄的缺点较少二甲基聚硅氧烷。在本发明的方法中，氨基烷基改性的二甲基聚硅氧烷由通式A-SiR2-O-（-SiR2-O-）p - （ - SiRQ-O-）q-SiR2-A表示，其中R是一价 Q为由通式-R1 - （ - NH-CH2-CH2-）n-NH2表示的氨基烷基，R1为碳原子数为1〜8的二价烃基，下标为 n为2或3，A为羟基，R，OR或Q，下标p为5至2000的平均数，下标q为0或平均数不超过100，条件是q 分子中由A表示的基团各自为羟基，R或OR，胺当量为5000〜100,000g / mol时，不为0。

43. 发明授权

US5314931A Resist compositions 失效
标题翻译：抗蚀剂组合物
公开(公告)号：US5314931A
公开(公告)日：1994-05-24
申请号：US889370
申请日：1992-05-28
申请人： Motoyuki Yamada , Tomoyoshi Furihata , Osamu Watanabe , Fujio Yagihashi
发明人： Motoyuki Yamada , Tomoyoshi Furihata , Osamu Watanabe , Fujio Yagihashi
IPC分类号： C08F12/00 , C08F12/22 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , C08J3/28 , C08F8/00 , C08F120/10 , C08L33/06
CPC分类号： C08F12/22 , G03F7/039
摘要： A resist based on a living polymer is provided. Living anionic polymerization of p-alkoxycarbonylstyrene monomers results in polymers having a molecular weight distribution (Mw/Mn) of from 1 to 1.4.
摘要翻译：提供了基于活性聚合物的抗蚀剂。对 - 烷氧基羰基苯乙烯单体的活性阴离子聚合导致分子量分布（Mw / Mn）为1至1.4的聚合物。

44. 发明授权

US08257528B2 Substrate joining method and 3-D semiconductor device 有权
标题翻译：基板接合方法和3-D半导体器件
公开(公告)号：US08257528B2
公开(公告)日：2012-09-04
申请号：US12540764
申请日：2009-08-13
申请人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano
发明人： Fujio Yagihashi , Yoshitaka Hamada , Takeshi Asano
IPC分类号： B32B37/00 , B32B9/04 , C09J163/00 , C09J5/06 , C09J201/00 , H01L21/20 , H01L21/50 , H01L21/52
CPC分类号： H01L21/2007 , H01L2924/0002 , Y10T156/10 , H01L2924/00
摘要： A pair of substrates each having a bonding surface are joined together by interposing a bond layer precursor coating between the bonding surfaces of the substrates and heating the precursor coating to form a bond layer. Prior to the joining step, the substrate on the bonding surface is provided with a gas-permeable layer. Even when a material which will evolve a noticeable volume of gas upon heat curing is used as the precursor coating, substrates can be joined via a robust bond without the peeling problem by gas evolution.
摘要翻译：将具有接合面的一对基板通过在基板的接合面之间插入接合层前体涂层并加热前体涂层而形成接合层而接合在一起。在接合步骤之前，接合表面上的基底设置有透气层。即使当热固化时将产生显着体积的气体的材料用作前体涂层时，可以通过坚固的粘结将衬底接合，而不会由气体逸出造成剥离问题。

45. 发明申请

US20120207917A1 CONDUCTIVE PATTERN-FORMING COMPOSITION AND METHOD 审中-公开
标题翻译：导电形成组合物和方法
公开(公告)号：US20120207917A1
公开(公告)日：2012-08-16
申请号：US13372673
申请日：2012-02-14
申请人： Yoshitaka Hamada , Fujio Yagihashi
发明人： Yoshitaka Hamada , Fujio Yagihashi
IPC分类号： B05D5/12 , H01B1/22 , H01B1/20
CPC分类号： H01B1/22 , C09D7/69 , C09D11/322 , C09D11/52
摘要： A conductive pattern-forming composition is obtained by loading a silicone rubber composition comprising a curable organopolysiloxane and a curing agent with conductive submicron particles.
摘要翻译：通过将包含可固化的有机聚硅氧烷和固化剂的硅橡胶组合物与导电的亚微米颗粒相加来获得导电图案形成组合物。

46. 发明授权

US5935311A Water-resistant ink composition and writing instrument 失效
标题翻译：防水油墨组合物和书写工具
公开(公告)号：US5935311A
公开(公告)日：1999-08-10
申请号：US15919
申请日：1998-01-30
申请人： Kazuyuki Matsumura , Masanao Kamei , Fujio Yagihashi , Koji Kawashima
发明人： Kazuyuki Matsumura , Masanao Kamei , Fujio Yagihashi , Koji Kawashima
IPC分类号： C09D11/00 , C09D11/16 , C09D11/02
CPC分类号： C09D11/30 , C09D11/16
摘要： A water-resistant ink composition comprising:(I) 10 parts by weight of a water-soluble dye compound and/or organic pigment compound;(II) 2 to 60 parts by weight of an organosilicon compound which is obtained from a mixture of components (A) and (B) shown below by hydrolysis in water or in an organic solvent containing more water than necessary for hydrolysis,(A) 100 parts by weight of a hydrolyzable silane having a nitrogen-containing organic group represented by the following formula (1):YR.sup.1.sub.m SiR.sup.2.sub.3-m (1) wherein R.sup.1 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.2 is a C.sub.1-4 alkoxyl group or acyloxy group, Y is a nitrogen-containing organic group, and m is 0 or 1, or a partial hydrolyzate thereof and(B) 5 to 200 parts by weight of a hydrolyzable silane represented by the following formula (2):R.sup.3.sub.n SiR.sup.4.sub.4-n (2) wherein R.sup.3 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.4 is a C.sub.1-4 alkoxyl group or acyloxy group, and n is 0, 1, or 2, or a partial hydrolyzate thereof, and(III) 30 to 10,000 parts by weight of water.
摘要翻译：一种防水油墨组合物，其包含：（I）10重量份的水溶性染料化合物和/或有机颜料化合物; （II）通过在水中或含水多于水解所需的水的有机溶剂中水解得到的有机硅化合物2〜60重量份由下述成分（A）和（B）的混合物得到，（A） 100重量份具有由下式（1）表示的含氮有机基团的可水解硅烷：YR1mSiR23-m（1）其中R1是不含氮原子的C1-8未取代或取代的一价烃基，R2是 C 1-4烷氧基或酰氧基，Y为含氮有机基团，m为0或1，或其部分水解产物和（B）5至200重量份由下式表示的可水解硅烷（2）：R3nSiR44-n（2）其中R3是不含氮原子的C1-8未取代或取代的单价烃基，R4是C1-4烷氧基或酰氧基，n是0,1或2，或其部分水解产物，和（III）30至10,000重量份的水。

47. 发明授权

US5691112A Sulfonium salt and chemically amplified positive resist composition 失效
标题翻译：锍盐和化学放大阳性抗蚀剂组成
公开(公告)号：US5691112A
公开(公告)日：1997-11-25
申请号：US762861
申请日：1996-12-10
申请人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
发明人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
IPC分类号： C07C317/22 , C07C381/12 , G03F7/004
CPC分类号： G03F7/0045 , C07C317/22 , C07C381/12
摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译：三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。它们由双（对叔丁氧基苯基）亚砜制备，也是新的。含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于使用精细图案化技术。

48. 发明授权

US5633409A Tristertbutoxyphenyl sulfonium tosylate compound 失效
标题翻译：三叔丁氧基苯基锍甲苯磺酸酯化合物
公开(公告)号：US5633409A
公开(公告)日：1997-05-27
申请号：US379986
申请日：1995-01-27
申请人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
发明人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
IPC分类号： C07C317/22 , C07C381/12 , G03F7/004 , C07C319/00
CPC分类号： G03F7/0045 , C07C317/22 , C07C381/12
摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译：三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。它们由双（对叔丁氧基苯基）亚砜制备，也是新的。含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于使用精细图案化技术。

49. 发明授权

US06667415B1 Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same 失效
标题翻译：叔丁基4,4-双（4'-羟基苯基）戊酸酯衍生物和含有它们的正性抗蚀剂材料
公开(公告)号：US06667415B1
公开(公告)日：2003-12-23
申请号：US08300245
申请日：1994-09-02
申请人： Fujio Yagihashi , Jun Watanabe , Minoru Takamizawa , Akinobu Tanaka , Yoshio Kawai , Tadahito Matsuda
发明人： Fujio Yagihashi , Jun Watanabe , Minoru Takamizawa , Akinobu Tanaka , Yoshio Kawai , Tadahito Matsuda
IPC分类号： C07C6976
CPC分类号： C07C69/734 , C07D309/12 , C07F7/1804 , G03F7/0045 , Y02P20/55
摘要： Disclosed are novel tert-butyl 4,4-bis(4′-hydroxyphenyl)pentanoate derivatives represented by the following general formula (I); wherein R1 represents a protective group which can be readily eliminated under an acidic condition, and R2 represents a hydrogen atom, a lower alkyl group or a lower alkoxy group: and high energy radiation-responsive positive resist materials using said novel derivatives as dissolution inhibitors.
摘要翻译：公开了由以下通式（I）表示的新颖的4,4-双（4'-羟基苯基）戊酸叔丁酯衍生物：其中R 1表示在酸性条件下易于除去的保护基，R 代表氢原子，低级烷基或低级烷氧基;以及使用所述新衍生物作为溶解抑制剂的高能辐射响应正抗蚀材料。

50. 发明授权

US5523370A Poly(para-T-butoxycarbonyloxystyrene) and method of making 失效
标题翻译：聚（对 - 叔丁氧基羰氧基苯乙烯）及其制备方法
公开(公告)号：US5523370A
公开(公告)日：1996-06-04
申请号：US420798
申请日：1995-04-12
申请人： Osamu Watanabe , Toru Nakanishi , Tomoyoshi Furihata , Motoyuki Yamada , Fujio Yagihashi
发明人： Osamu Watanabe , Toru Nakanishi , Tomoyoshi Furihata , Motoyuki Yamada , Fujio Yagihashi
IPC分类号： C08F12/00 , C08F12/22 , C08F18/16
CPC分类号： C08F12/22
摘要： Provided is a poly(para-t-butoxycarbonyloxystyrene) having recurring units of the formula: ##STR1## which is prepared by anionic polymerization of para-t-butoxycarbonyloxystyrene. The polymer is of a controlled molecular weight and a narrow molecular weight distribution and has a high degree of resolution and development, meeting the requirements of resist materials. The method allows for simple preparation of such polymers.
摘要翻译：提供具有下式的重复单元的聚（对叔丁氧基羰氧基苯乙烯）：其通过对叔丁氧羰基氧基苯乙烯的阴离子聚合制备。该聚合物具有受控的分子量和窄的分子量分布，并且具有高分辨率和显影性，满足抗蚀剂材料的要求。该方法允许简单制备这种聚合物。

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