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    • 42. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US07528930B2
    • 2009-05-05
    • US11029674
    • 2005-01-04
    • Toshinobu Tokita
    • Toshinobu Tokita
    • G03B27/52G03B27/42
    • G03F7/70341G03B27/52G03F7/70891
    • An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the substrate, an illumination optical system for illuminating the reticle using light from a light source, and a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in the projection optical system and the substrate, the exposure apparatus exposing the substrate via said projection optical system and the fluid.
    • 曝光装置包括用于将掩模版上的图案投影到基板上的投影光学系统,所述投影光学系统包括最靠近所述基板的光学元件,使用来自光源的光照射所述掩模版的照明光学系统,以及温度 控制器,用于控制光学元件的温度,从而填充在投影光学系统中的光学元件与基板之间的空间中的流体的温度,曝光装置经由所述投影光学系统和流体曝光基板。
    • 45. 发明授权
    • Exposure apparatus and method
    • 曝光装置和方法
    • US07177006B2
    • 2007-02-13
    • US11022033
    • 2004-12-23
    • Toshinobu Tokita
    • Toshinobu Tokita
    • G03B27/52G03B27/42G03B27/72G03B27/32
    • G03F7/70341
    • An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.
    • 曝光方法包括以下步骤:将待曝光物体的表面和投影光学系统的最终表面之间的空间引入到通过投影光学系统和流体将掩模上的图案投射到物体上的步骤; 其中所述引入步骤包括以下步骤:将所述流体填充在所述物体的表面与所述投影光学系统的最终表面之间的空间中,并且其中所述填充步骤改变与所述流体不同的毛细管吸引力的毛细吸引力 投影步骤。
    • 49. 发明申请
    • OBJECT INFORMATION ACQUIRING APPARATUS, CONTROL METHOD THEREOF, AND METHOD FOR DETERMINATION OF CONTACT
    • 获取设备的对象信息,其控制方法及其联系方法
    • US20140046166A1
    • 2014-02-13
    • US14113665
    • 2012-04-25
    • Toshinobu Tokita
    • Toshinobu Tokita
    • A61B5/00
    • A61B5/0095A61B5/4312A61B5/6843A61B5/6844
    • The present invention employs an object information acquiring apparatus having: a photoacoustic probe unit including a light irradiating unit which irradiates light, and a probe which receives a photoacoustic wave generated from an object irradiated with light while transmitting an ultrasound wave to the object and receiving a reflected wave thereof; a processor configured to create image information of the object based on the photoacoustic wave; and a controller configured to control irradiation with light, wherein when a first contact condition is defined as a condition in which the object is irradiated with light while the probe is acoustically matched with the object, the controller determines whether or not the photoacoustic probe unit is in the first contact condition by using the reflected wave and enables irradiation with light when the photoacoustic probe unit is in the first contact condition.
    • 本发明采用一种对象信息获取装置,其具有:光电探测器单元,其包括照射光的光照射单元,以及探测器,其接收从被照射的光产生的光声,同时向对象发送超声波,并接收 反射波; 处理器,其被配置为基于所述光声波创建所述对象的图像信息; 以及控制器,其被配置为控制光的照射,其中当所述第一接触条件被定义为在所述探针与所述物体声学匹配时物体被照射的条件下,所述控制器确定所述光声探测单元是否为 在第一接触状态下使用反射波,并且当光声探针单元处于第一接触状态时能够用光照射。