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41. 发明申请

US20090035702A1 PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP 审中-公开
标题翻译：生产具有酸性化合物的化合物的方法
公开(公告)号：US20090035702A1
公开(公告)日：2009-02-05
申请号：US12240227
申请日：2008-09-29
申请人： Hiroshi Matsuoka , Junzo Yamano , Katsuhiro Ito , Ikuo Shimizu , Ryo Numazaki
发明人： Hiroshi Matsuoka , Junzo Yamano , Katsuhiro Ito , Ikuo Shimizu , Ryo Numazaki
IPC分类号： G03F7/028 , C07D309/10 , G03F7/004 , C08F116/10
CPC分类号： G03F7/0392 , C07D307/20 , C07D309/12 , C08F8/00 , C08F112/14
摘要： The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O—C—C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).
摘要翻译：本发明提供一种具有由通式（II）表示的基团的化合物的制备方法：（其中R 1，R 2和R 3可以相同或不同，各自表示取代或未取代的烷基，取代或未取代的芳基或者取代或未取代的芳烷基，或者R 1和R 2可以相互结合形成与相邻碳原子一起形成的脂环族烃环，或者R 2和R 3可以彼此结合形成脂环族杂环以及相邻的OCC 其可以具有取代基），其包括使具有羟基的化合物与通式（I）表示的卤代烷基醚反应：其中R1，R2和R3分别与上述定义相同，X表示卤素原子）。

42. 发明授权

US07358030B2 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US07358030B2
公开(公告)日：2008-04-15
申请号：US11289706
申请日：2005-11-30
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
摘要翻译：本发明提供以下制备醚化合物的方法，其可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少的副反应和高产率。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

43. 发明授权

US07294448B2 Composition sensitive to visible light 失效
标题翻译：组合对可见光敏感
公开(公告)号：US07294448B2
公开(公告)日：2007-11-13
申请号：US10523523
申请日：2003-08-20
申请人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
发明人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
IPC分类号： G03C1/00
CPC分类号： G03F7/0392
摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.
摘要翻译：本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

44. 发明申请

US20060074262A1 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US20060074262A1
公开(公告)日：2006-04-06
申请号：US11289706
申请日：2005-11-30
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： C07C43/30
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.
摘要翻译：本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物产量。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

45. 发明授权

US07015363B2 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US07015363B2
公开(公告)日：2006-03-21
申请号：US10482111
申请日：2002-07-12
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： C07C41/54
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
摘要翻译：本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物产量。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

46. 发明申请

US20050130850A1 Dibasic acid diesters 审中-公开
标题翻译：二元酸二酯
公开(公告)号：US20050130850A1
公开(公告)日：2005-06-16
申请号：US10491238
申请日：2002-10-10
申请人： Yukitoshi Fukuda , Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada
发明人： Yukitoshi Fukuda , Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada
IPC分类号： C07C69/34 , C10M105/36 , C10M101/00
CPC分类号： C07C69/34 , C10M105/36 , C10M2207/2825 , C10M2207/2855 , C10M2207/345 , C10N2220/10 , C10N2230/64 , C10N2230/66
摘要： The present invention provides dibasic acid diesters, which are suitable for use in lubricating base oils, etc. and excellent in hydrolysis resistance, etc., represented by general formula (I): (wherein R2 and R3, which may be the same or different, each represent lower alkyl; and R1 and R4, which may be the same or different, each represent alkyl having 7 or more carbon atoms).
摘要翻译：本发明提供了适合用于润滑基础油等的二元酸二酯，由通式（I）表示的耐水解性等优异的（其中R 2和R 2）可以相同或不同的三价代表低级烷基; R 1和R 4可以相同或不同各自表示具有7个以上碳原子的烷基）。

47. 发明授权

US06160044A Compositions containing dithiocarbonate compound 失效
标题翻译：含有二硫代碳酸酯化合物的组合物
公开(公告)号：US06160044A
公开(公告)日：2000-12-12
申请号：US402124
申请日：1999-09-30
申请人： Shinichiro Jimbo , Shoshiro Matsushita , Ikuo Shimizu , Iwao Hotta , Masanori Ikuta , Izumi Itani
发明人： Shinichiro Jimbo , Shoshiro Matsushita , Ikuo Shimizu , Iwao Hotta , Masanori Ikuta , Izumi Itani
IPC分类号： C07D327/04 , C09D11/10 , C09D201/06 , C08K5/04 , C08K3/10 , C08K5/09
CPC分类号： C09D11/106 , C07D327/04 , C09D201/06 , Y10T428/31855
摘要： The present invention provides a composition comprising a polymer or a compound having at least one 5-membered ring dithiocarbonate group represented by general formula (I): ##STR1## (wherein R.sup.1, R.sup.2, and R.sup.3 are the same or different and each of which represents hydrogen or lower alkyl), a nucleophile, and a metal compound.
摘要翻译： PCT No.PCT / JP98 / 01514 Sec。 371 1999年9月30日第 102（e）日期1999年9月30日PCT提交1998年4月2日PCT公布。 WO98 / 45373 PCT出版物日期：1998年10月15日本发明提供包含聚合物或具有至少一个由通式（I）表示的五元环二硫代碳酸酯基的化合物的组合物：其中R1，R2和R3相同或不同，其中代表氢或低级烷基），亲核试剂和金属化合物。

48. 发明授权

US5510229A Optical information recording medium using squarylium compounds 失效
标题翻译：使用方酸盐化合物的光学信息记录介质
公开(公告)号：US5510229A
公开(公告)日：1996-04-23
申请号：US88808
申请日：1993-07-08
申请人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
发明人： Tsutomu Satoh , Ikuo Shimizu , Yukiyoshi Ito
IPC分类号： C07D209/12 , C07D209/14 , C07D209/60 , G11B7/244 , G11B7/24
CPC分类号： C07D209/12 , C07D209/14 , C07D209/60 , G11B7/244 , Y10S430/146
摘要： Squarylium compounds having the following formula (I), ##STR1## and an optical information recording medium comprising a substrate and a recording layer formed on the substrate, comprising a squarylium compound having formula (I) are disclosed.
摘要翻译：公开了具有下式（I），（IMAGE）（I）的方酸化合物和包含基材上形成的记录层的光学信息记录介质，其包含具有式（I）的方酸化合物。

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