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41. 发明授权

US08690559B2 Nano-imprinting resin stamper and nano-imprinting apparatus using the same 失效
标题翻译：纳米压印树脂压模和使用其的纳米压印装置
公开(公告)号：US08690559B2
公开(公告)日：2014-04-08
申请号：US13193666
申请日：2011-07-29
申请人： Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C43/56
CPC分类号： B29C33/3857 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/038 , G03F7/0757
摘要： The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
摘要翻译：本发明提供了一种纳米压印树脂压模，其包括在透射支撑基底材料上的微结构层，该微结构层由含有倍半硅氧烷衍生物作为主要成分的树脂组合物的聚合物形成，该主体组分具有多个聚合性官能团基团，具有多个可聚合官能团且不同于倍半硅氧烷衍生物的可聚合树脂组分和可光聚合引发剂，其中可光聚合引发剂的含量百分比等于或大于0.3质量％且等于或小于3 相对于倍半硅氧烷衍生物和可聚合树脂组分的总质量的质量％，并且微结构层允许等于或大于80％的光在365nm的波长下通过。

42. 发明授权

US08632714B2 Mold structures, and method of transfer of fine structures 失效
标题翻译：模具结构，精细结构转移方法
公开(公告)号：US08632714B2
公开(公告)日：2014-01-21
申请号：US13526708
申请日：2012-06-19
申请人： Masahiko Ogino , Akihiro Miyauchi , Sigehisa Motowaki , Kosuke Kuwabara
发明人： Masahiko Ogino , Akihiro Miyauchi , Sigehisa Motowaki , Kosuke Kuwabara
IPC分类号： B28B11/08 , B27N3/18 , A01J21/00
CPC分类号： B81C1/0046
摘要： A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
摘要翻译：用于纳米印刷技术的模具和图案转印方法。模具可以准确而容易地从基材上脱模。使用压制机在基板上形成精细图案的模具包括释放机构。

43. 发明授权

US08603380B2 Stamper for transferring fine pattern and method for manufacturing thereof 失效
标题翻译：用于转印精细图案的压模和其制造方法
公开(公告)号：US08603380B2
公开(公告)日：2013-12-10
申请号：US13603455
申请日：2012-09-05
申请人： Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C35/00
CPC分类号： B29C59/022 , B29C35/02 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
摘要翻译：本发明的目的是提供一种用于转印精细图案的压模和用于制造压模的方法，压模具有精细的结构层，以提高树脂压模的连续转印性能，并允许精确和连续的转印。为了实现上述目的，本发明提供了一种用于转印精细图案的压模，包括：支撑基板上的精细结构层，其中精细结构层是主成分为倍半硅氧烷衍生物的树脂化合物的聚合物，多个聚合性官能团。

44. 发明申请

US20120027884A1 NANO-IMPRINTING RESIN STAMPER AND NANO-IMPRINTING APPARATUS USING THE SAME 失效
标题翻译： NANO印花树脂印刷机和使用其的纳米印刷装置
公开(公告)号：US20120027884A1
公开(公告)日：2012-02-02
申请号：US13193666
申请日：2011-07-29
申请人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C43/36 , B29D17/00
CPC分类号： B29C33/3857 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/038 , G03F7/0757
摘要： The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
摘要翻译：本发明提供了一种纳米压印树脂压模，其包括在透射支撑基底材料上的微结构层，该微结构层由含有倍半硅氧烷衍生物作为主要成分的树脂组合物的聚合物形成，该主体组分具有多个聚合性官能团基团，具有多个可聚合官能团且不同于倍半硅氧烷衍生物的可聚合树脂组分和可光聚合引发剂，其中可光聚合引发剂的含量百分比等于或大于0.3质量％且等于或小于3 相对于倍半硅氧烷衍生物和可聚合树脂组分的总质量的质量％，并且微结构层允许等于或大于80％的光在365nm的波长下通过。

45. 发明申请

US20100270712A1 MICROPATTERN TRANSFER METHOD AND MICROPATTERN TRANSFER DEVICE 失效
标题翻译：微波传输方法和微波传输设备
公开(公告)号：US20100270712A1
公开(公告)日：2010-10-28
申请号：US12765145
申请日：2010-04-22
申请人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C35/08 , B29C59/02 , B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.
摘要翻译：本发明的目的是提供一种微图案转印方法和一种微图案转印装置，其中少量的树脂施加于基底，并且在所获得的图案形成层上防止出现不均匀的厚度。为了实现上述目的，本发明提供一种微图案转印方法，其中通过将具有微图案的压模压入到施加到基板上的树脂上而将微图案转印到树脂上，包括以下步骤：将树脂施加到为了获得多个树脂岛，使得每个树脂岛的中心部分形成平面薄膜，并且树脂岛的周边部分比中心部分上升得更高。

46. 发明授权

US07520742B2 Nanoprint equipment and method of making fine structure 失效
标题翻译：纳米设备制作精细结构的方法
公开(公告)号：US07520742B2
公开(公告)日：2009-04-21
申请号：US10801579
申请日：2004-03-17
申请人： Shigehisa Motowaki , Akihiro Miyauchi , Masahiko Ogino , Kosuke Kuwabara
发明人： Shigehisa Motowaki , Akihiro Miyauchi , Masahiko Ogino , Kosuke Kuwabara
IPC分类号： B29C33/00 , B29C59/02
CPC分类号： B82Y10/00 , B29C33/58 , B29C37/0067 , B29C37/0075 , B29C59/022 , B29C59/025 , B29C2059/023 , B82Y40/00 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/82 , G11B5/84 , H05K3/12 , Y10S977/887
摘要： A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.
摘要翻译：通过纳米印刷法转移具有高纵横比的支柱。为了在基板上形成精细结构，纳米印刷装置加热并压制基板和形成有细凹凸图案的模具，该模具具有用于转印和施加脱模剂的机构。使用上述纳米印刷装置转印精细结构的方法。

47. 发明申请

US20120319326A1 FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD 审中-公开
标题翻译：精细结构转移装置和精细结构转移方法
公开(公告)号：US20120319326A1
公开(公告)日：2012-12-20
申请号：US13577337
申请日：2011-03-10
申请人： Toshimitsu Shiraishi , Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Masahiko Ogino , Akihiro Miyauchi
发明人： Toshimitsu Shiraishi , Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B29C59/02
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.
摘要翻译：精细结构传送装置设置有具有树脂施加机构，基板处理机构，对准机构，加压机构和剥离机构的图案转印机构，并且加压机构由上部头部和下部具有形成在其上的精细图案的成形模具固定在上部头部的下表面上，并且在加压和转印之后，下基板在基板被粘附的状态下从基板下方的位置缩回成型模具，然后，在剥离机构移动到基板下方的位置之后，粘附到成型模具的基板被剥离。

48. 发明申请

US20120256353A1 PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD 审中-公开
标题翻译：图案转印装置和图案转印方法
公开(公告)号：US20120256353A1
公开(公告)日：2012-10-11
申请号：US13414959
申请日：2012-03-08
申请人： Mitsuru HASEGAWA , Hajime Murakami , Akihiro Miyauchi , Masahiko Ogino
发明人： Mitsuru HASEGAWA , Hajime Murakami , Akihiro Miyauchi , Masahiko Ogino
IPC分类号： B29C59/02 , B29C71/04 , B29C71/00 , B29C37/00 , B29C59/04
CPC分类号： G03F7/0002 , B29C37/0067 , B29C59/04 , B82Y10/00 , B82Y40/00
摘要： A pattern transfer apparatus for pressing a mold having a fine concave/convex pattern onto a transferred material, peeling off the mold from the transferred material, and transferring the concave/convex pattern onto a surface of the transferred material includes: a pretreatment mechanism configured to perform a predetermined surface treatment to at least one of the mold and the transferred material before the concave/convex pattern is transferred; an information recording mechanism configured to record information of the surface treatment performed by the pretreatment mechanism at a position associated with an area of the transferred material where the concave/convex pattern is transferred onto the area; an interpretation mechanism configured to read the recorded information; and an after-treatment mechanism configured to perform a predetermined after-treatment to the area where the concave/convex pattern is transferred, based on the information interpreted by the interpretation mechanism.
摘要翻译：一种图案转印装置，用于将具有精细凹凸图案的模具压印到转印材料上，从转印材料上剥离模具，并将凹凸图案转印到转印材料的表面上，包括：预处理机构，被配置为在传递凹凸图案之前，对模具和转印材料中的至少一个进行预定的表面处理; 信息记录机构，被配置为将所述预处理机构执行的表面处理的信息记录在与将所述凹凸图案转印到所述区域上的被转印材料的区域相关联的位置处; 解释机构，被配置为读取所记录的信息; 以及后处理机构，其被配置为基于由所述解释机构解释的信息对所述凹凸图案被传送的区域进行预定的后处理。

49. 发明申请

US20120256346A1 MOLD STRUCTURES, AND METHOD OF TRANSFER OF FINE STRUCTURES 失效
标题翻译：模具结构和精细结构转移方法
公开(公告)号：US20120256346A1
公开(公告)日：2012-10-11
申请号：US13526708
申请日：2012-06-19
申请人： Masahiko Ogino , Akihiro Miyauchi , Sigehisa Motowaki , Kosuke Kuwabara
发明人： Masahiko Ogino , Akihiro Miyauchi , Sigehisa Motowaki , Kosuke Kuwabara
IPC分类号： B29C59/02
CPC分类号： B81C1/0046
摘要： A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
摘要翻译：用于纳米印刷技术的模具和图案转印方法。模具可以准确而容易地从基材上脱模。使用压制机在基板上形成精细图案的模具包括释放机构。

50. 发明授权

US08158048B2 Mold for fine pattern transfer and method for forming resin pattern using same 有权
标题翻译：用于精细图案转印的模具和使用其形成树脂图案的方法
公开(公告)号：US08158048B2
公开(公告)日：2012-04-17
申请号：US11847636
申请日：2007-08-30
申请人： Kenya Ohashi , Masahiko Ogino , Akihiro Miyauchi
发明人： Kenya Ohashi , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B29C59/00
CPC分类号： B29C33/10 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer.
摘要翻译：根据本发明的使用纳米压印光刻形成树脂图案的模具包括：主模具，其包括突起的精细图案和待转印的凹陷;以及间隔件，用于在所述微型图案的突起之间形成空间主模具和被转移物体在精细图案的转印期间，其中间隔件具有能够使气体流过的通气通道，并且具有抵抗转印期间的按压力的弹性。

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