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    • 42. 发明授权
    • Isolation structure for a memory cell using Al2O3 dielectric
    • 使用Al2O3电介质的存储单元的隔离结构
    • US07282409B2
    • 2007-10-16
    • US10873226
    • 2004-06-23
    • Chandra Mouli
    • Chandra Mouli
    • H01L21/336
    • H01L21/765H01L27/10873
    • The invention provides, in one exemplary embodiment, an isolation gate formed over a substrate for biasing the substrate and providing isolation between adjacent active areas of an integrated circuit structure, for example a DRAM memory cell. An aluminum oxide (Al2O3) is used as a gate dielectric, rather than a conventional gate oxide layer, to create a hole-rich accumulation region under and near the trench isolation region. Another exemplary embodiment of the invention provides an aluminum oxide layer utilized as a liner in a shallow trench isolation (STI) region to increase the effectiveness of the isolation region. The embodiments may also be used together at an isolation region.
    • 在一个示例性实施例中,本发明提供了一种形成在衬底上用于偏置衬底并在集成电路结构(例如DRAM存储器单元)的相邻有源区之间提供隔离的隔离栅。 使用氧化铝(Al 2 O 3)作为栅极电介质,而不是常规的栅极氧化物层,以在沟槽隔离区域下方和附近产生富空穴的积聚区域。 本发明的另一示例性实施方案提供了在浅沟槽隔离(STI)区域中用作衬垫的氧化铝层,以增加隔离区域的有效性。 实施例也可以在隔离区域一起使用。
    • 50. 发明申请
    • Image sensor with improved dynamic range and method of formation
    • 图像传感器具有改进的动态范围和形成方法
    • US20070034907A1
    • 2007-02-15
    • US11583809
    • 2006-10-20
    • Chandra Mouli
    • Chandra Mouli
    • H01L29/768
    • H01L27/14689H01L27/1463H01L27/14643H01L27/14654
    • Embodiments of the invention provide an image sensor having an improved dynamic range. A pixel cell comprises at least one transistor structure. The transistor structure comprises at least one semiconductor channel region, at least one gate for controlling the channel region, and first and second leads respectively coupled to a source region on one side of the at least one channel region and a drain region on an opposite side of the at least one channel region. The transistor structure has at least two threshold voltages associated with the at least one channel region, and an I-V characteristic of the transistor structure is determined at least in part by the threshold voltages.
    • 本发明的实施例提供了具有改进的动态范围的图像传感器。 像素单元包括至少一个晶体管结构。 晶体管结构包括至少一个半导体沟道区,用于控制沟道区的至少一个栅极和分别耦合到至少一个沟道区一侧的源极区和相对侧的漏极区的第一和第二引线 的至少一个通道区域。 晶体管结构具有至少两个与至少一个沟道区相关联的阈值电压,晶体管结构的I-V特性至少部分地由阈值电压确定。