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41. 发明授权

US10962491B2 System and method for x-ray fluorescence with filtering 有权
公开(公告)号：US10962491B2
公开(公告)日：2021-03-30
申请号：US16555143
申请日：2019-08-29
申请人： Sigray, Inc.
发明人： Wenbing Yun , Janos Kirz , Benjamin Donald Stripe , Sylvia Jia Yun Lewis
IPC分类号： G01N23/223 , G21K1/06 , G21K1/02
摘要： An x-ray optical filter includes at least one x-ray optical mirror configured to receive a plurality of x-rays having a first x-ray spectrum with a first intensity as a function of energy in a predetermined solid angle range and to separate at least some of the received x-rays by multilayer reflection or total external reflection into reflected x-rays and non-reflected x-rays and to form an x-ray beam including at least some of the reflected x-rays and/or at least some of the non-reflected x-rays. The x-ray beam has a second x-ray spectrum with a second intensity as a function of energy in the solid angle range, the second intensity greater than or equal to 50% of the first intensity across a first continuous energy range at least 3 keV wide, the second intensity less than or equal to 10% of the first intensity across a second continuous energy range at least 100 eV wide.

42. 发明申请

US20210080408A1 SYSTEM AND METHOD FOR COMPUTED LAMINOGRAPHY X-RAY FLUORESCENCE IMAGING 有权
公开(公告)号：US20210080408A1
公开(公告)日：2021-03-18
申请号：US17009500
申请日：2020-09-01
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Benjamin Donald Stripe
IPC分类号： G01N23/207 , G01N23/20016 , G01N23/20025 , G01N23/2055
摘要： A system and a method use x-ray fluorescence to analyze a specimen by illuminating a specimen with an incident x-ray beam having a near-grazing incident angle relative to a surface of the specimen and while the specimen has different rotational orientations relative to the incident x-ray beam. Fluorescence x-rays generated by the specimen in response to the incident x-ray beam are collected while the specimen has the different rotational orientations.

43. 发明授权

US10578566B2 X-ray emission spectrometer system 有权
公开(公告)号：US10578566B2
公开(公告)日：2020-03-03
申请号：US16371606
申请日：2019-04-01
申请人： Sigray, Inc.
发明人： Wenbing Yun , Srivatsan Seshadri , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G01N23/223 , G01N23/22 , G01N23/2209 , G01N23/2204
摘要： Systems and methods for x-ray emission spectroscopy are provided in which at least one x-ray analyzer is curved and receives and diffracts fluorescence x-rays emitted from a sample, and at least one spatially-resolving x-ray detector receives the diffracted x-rays. The at least one x-ray analyzer and the at least one spatially-resolving x-ray detector are positioned on the Rowland circle. In some configurations, the fluorescence x-rays are emitted from the same surface of the sample that is irradiated by the x-rays from an x-ray source and the system has an off-Rowland circle geometry. In some other configurations, an x-ray optical train receives the fluorescence x-rays emitted from a sample impinged by electrons within an electron microscope and focuses at least some of the received fluorescence x-rays to a focal spot.

44. 发明授权

US10295486B2 Detector for X-rays with high spatial and high spectral resolution 有权
公开(公告)号：US10295486B2
公开(公告)日：2019-05-21
申请号：US15240972
申请日：2016-08-18
申请人： SIGRAY, INC.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Benjamin Donald Stripe
IPC分类号： G01N23/223 , G01N23/20058 , G01N23/04
摘要： An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.

45. 发明申请

US20180202951A1 MATERIAL MEASUREMENT TECHNIQUES USING MULTIPLE X-RAY MICRO-BEAMS 审中-公开
公开(公告)号：US20180202951A1
公开(公告)日：2018-07-19
申请号：US15829947
申请日：2017-12-03
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G01N23/223 , G01N23/2055 , G01N23/20025 , G01N23/2204
CPC分类号： G01N23/223 , G01N23/20025 , G01N23/2055 , G01N23/2204
摘要： An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.

46. 发明授权

US09874531B2 X-ray method for the measurement, characterization, and analysis of periodic structures 有权
公开(公告)号：US09874531B2
公开(公告)日：2018-01-23
申请号：US14712917
申请日：2015-05-15
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G01N23/20 , G01N23/201 , A61B6/00 , G21K1/02 , H01J35/08
CPC分类号： G01N23/20075 , A61B6/4007 , A61B6/4291 , A61B6/484 , A61B6/508 , G01N23/201 , G21K1/02 , G21K2207/005 , H01J35/08 , H01J2235/086
摘要： Periodic spatial patterns of x-ray illumination are used to gather information about periodic objects. The structured illumination may be created using the interaction of a coherent or partially coherent x-ray source with a beam splitting grating to create a Talbot interference pattern with periodic structure. The object having periodic structures to be measured is then placed into the structured illumination, and the ensemble of signals from the multiple illumination spots is analyzed to determine various properties of the object and its structures. Applications to x-ray absorption/transmission, small angle x-ray scattering, x-ray fluorescence, x-ray reflectance, and x-ray diffraction are all possible using the method of the invention.

47. 发明授权

US09823203B2 X-ray surface analysis and measurement apparatus 有权
公开(公告)号：US09823203B2
公开(公告)日：2017-11-21
申请号：US15060477
申请日：2016-03-03
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G01N23/205 , H01J35/08 , G21K1/06
CPC分类号： G01N23/205 , G21K1/062 , H01J35/08 , H01J2235/086
摘要： Systems for x-ray diffraction/scattering measurements having greater x-ray flux and x-ray flux density are disclosed. These are useful for applications such as material structural analysis and crystallography. The higher flux is achieved by using designs for x-ray targets comprising a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density, and used to illuminate materials for the analysis based on their scattering/diffractive effects.

48. 发明授权

US09594036B2 X-ray surface analysis and measurement apparatus 有权
标题翻译： X射线表面分析和测量仪器
公开(公告)号：US09594036B2
公开(公告)日：2017-03-14
申请号：US14634834
申请日：2015-03-01
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： H01J35/08 , G01N23/223 , G01B15/02 , G01N23/207 , G21K1/06 , H01J35/14 , G01N23/06
CPC分类号： G01N23/223 , G01B15/02 , G01N23/085 , G01N23/2076 , G21K1/06 , G21K2201/061 , G21K2201/064 , H01J35/08 , H01J35/14 , H01J2235/081 , H01J2235/086
摘要： This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.
摘要翻译：本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的全反射x射线荧光测量的系统。因此，这些可用于诸如微量元素检测和/或全反射荧光分析的应用。较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

49. 发明授权

US09449781B2 X-ray illuminators with high flux and high flux density 有权
公开(公告)号：US09449781B2
公开(公告)日：2016-09-20
申请号：US14544191
申请日：2014-12-08
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G21K1/06 , H01J35/08 , G01N23/223
CPC分类号： H01J35/08 , G01N23/223 , G21K1/06 , H01J2235/081 , H01J2235/086
摘要： This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

50. 发明授权

US09390881B2 X-ray sources using linear accumulation 有权
标题翻译： X射线源使用线性积分
公开(公告)号：US09390881B2
公开(公告)日：2016-07-12
申请号：US14490672
申请日：2014-09-19
申请人： Sigray, Inc.
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz , Alan Francis Lyon
IPC分类号： G21K1/06 , H01J35/08
CPC分类号： H01J35/08 , G21K1/06 , H01J2235/081 , H01J2235/086
摘要： A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness.Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.
摘要翻译：公开了用于高亮度x射线产生的紧凑源。通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。这样可以更有效地将热量从X射线产生材料中拉出，并且进而允许以更高的电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。本发明的一些实施例包括放置在x射线的子源之间的x射线光学元件。这些X射线光学元件可以形成与其他x射线子源对准的一个或多个x射线子源的图像，并且可以增强可以实现的线性累积。

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