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41. 发明申请

US20080241486A1 Liquid Crystal Display Device with Evaluation Patterns Disposed Thereon, and Method for Manufacturing the Same 审中-公开
标题翻译：具有评估模式的液晶显示装置及其制造方法
公开(公告)号：US20080241486A1
公开(公告)日：2008-10-02
申请号：US12055501
申请日：2008-03-26
申请人： Seiji Ishikawa , Hiroyasu Matsuura , Yuichi Hamamura , Tadamichi Wachi
发明人： Seiji Ishikawa , Hiroyasu Matsuura , Yuichi Hamamura , Tadamichi Wachi
IPC分类号： G03F7/20 , B32B5/00
CPC分类号： G03F9/7003 , G03F7/70275 , G03F7/70383 , G03F7/70475 , G03F7/70791 , Y10T428/24802
摘要： Direct exposure equipment having a multiple heads generally conducts overlapping exposure at an exposure area boundary between the heads. In such a case, if the heads are misaligned, a flaw will occur in a pattern shape at an area that is subject to overlapping exposure. To overcome this, TEGs are disposed for evaluating line width and resistance at an overlapping exposure area between the exposure heads and at a returning exposure area formed when direct exposure equipment having a multi-head configuration exposes a substrate. By examining measured values from these TEGs, a misalignment in the multiple exposure heads is detected.
摘要翻译：具有多个头部的直接曝光设备通常在头部之间的曝光区域边界处进行重叠曝光。在这种情况下，如果头部不对准，则在受到重叠曝光的区域上的图案形状的缺陷将发生。为了克服这个原因，TEG被设置用于评估曝光头之间的重叠曝光区域和在具有多头构造的直接曝光设备暴露基板时形成的返回曝光区域的线宽和电阻。通过检查这些TEG的测量值，检测多个曝光头中的未对准。

42. 发明申请

US20070247937A1 INFORMATION PROCESSING SYSTEM FOR CALCULATING THE NUMBER OF REDUNDANT LINES OPTIMAL FOR MEMORY DEVICE 审中-公开
标题翻译：用于计算存储器件最佳冗余线数量的信息处理系统
公开(公告)号：US20070247937A1
公开(公告)日：2007-10-25
申请号：US11736435
申请日：2007-04-17
申请人： Ichiro Moriyama , Seiji Ishikawa
发明人： Ichiro Moriyama , Seiji Ishikawa
IPC分类号： G11C29/00
CPC分类号： G11C29/56 , G11C29/56008 , G11C29/72
摘要： An information processing system of the invention has a database in which test results for a plurality of memory devices mounted on a wafer are stored and a computer for analyzing the test results. The computer includes a data retrieval section for retrieving a test result from the database; and a required redundant line quantity calculation section for determining the total number of redundant lines which is required for recovering failed bits of the memory device based on the test results, deciding how the required total number of redundant lines should be assigned in each of the row and column directions, and calculating the total number of redundant lines required for recovery and the number of redundant lines assigned in each of the row and columns directions on the memory device, and the computer displays a result of calculation by the required redundant line quantity calculation section.
摘要翻译：本发明的信息处理系统具有数据库，其中存储安装在晶片上的多个存储器件的测试结果和用于分析测试结果的计算机。计算机包括用于从数据库检索测试结果的数据检索部分; 以及所需的冗余线路量计算部分，用于基于测试结果来确定用于恢复存储器件的故障比特所需的冗余线路的总数，决定如何在每行中分配所需的冗余线路总数和列方向，以及计算恢复所需的冗余线路总数和在存储设备上的行和列方向中的每一个方向上分配的冗余线路数量，并且计算机根据所需的冗余线路数量计算显示计算结果部分。

43. 再颁专利

USRE39262E1 Polishing apparatus including turntable with polishing surface of different heights 有权
标题翻译：抛光装置包括具有不同高度的抛光表面的转台
公开(公告)号：USRE39262E1
公开(公告)日：2006-09-05
申请号：US09821046
申请日：2002-02-28
申请人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
发明人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
IPC分类号： B24B29/02
CPC分类号： B24B37/24
摘要： A polishing apparatus includes a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring disposed above the turntable for supporting a workpiece to be polished and pressing the workpiece against the abrasive cloth under a predetermined pressure. The turntable and the top ring are movable relatively to each other to polish a surface of the workpiece supported by the top ring with the abrasive cloth. The abrasive cloth has a projecting region on a surface thereof for more intensive contact with the workpiece than other surface regions of the abrasive cloth. The projecting region has a smaller dimension in a radial direction of the turntable than a diameter of the workpiece when the projecting region is held in contact with the workpiece. A position of the projection region is determined on the basis of an area in which the projecting region acts on the workpiece.
摘要翻译：抛光装置包括：转盘，其具有安装在其上表面上的研磨布;以及顶环，其设置在所述转台上方，用于支撑待抛光的工件，并在预定压力下将所述工件压靠所述研磨布。转盘和顶环彼此相对移动，用研磨布抛光由顶环支撑的工件的表面。研磨布在其表面上具有突出区域，用于与研磨布的其它表面区域更加紧密地接触工件。当突出区域与工件保持接触时，突出区域在转台的径向上具有比工件的直径更小的尺寸。基于突出区域作用在工件上的区域来确定投影区域的位置。

44. 发明申请

US20060009130A1 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 审中-公开
公开(公告)号：US20060009130A1
公开(公告)日：2006-01-12
申请号：US11221924
申请日：2005-09-09
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B24B49/00
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.

45. 发明授权

US06966821B2 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 失效
标题翻译：用于干燥，干燥抛光和洗涤半导体器件的方法和设备
公开(公告)号：US06966821B2
公开(公告)日：2005-11-22
申请号：US10372224
申请日：2003-02-25
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B08B1/04 , B24B27/00 , B24B37/04 , B24B51/00 , B24B55/12 , F24F3/16 , H01L21/00 , H01L21/677 , H03M13/39 , H04L1/00 , H04N5/44 , H04N5/455 , B24B1/00
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.
摘要翻译：抛光装置包括用于处理各种操作的多个单元的布置以及具有至少一个臂的机器人。所述多个单元设置在所述机器人周围，并且包括用于在其上接收的加载单元。干燥的待抛光工件，包括至少一个用于抛光工件的抛光单元的抛光系统，至少包括一个用于洗涤和干燥抛光的工件的洗涤单元的洗涤系统和干燥系统，以及用于在其上接收的卸载单元得到清洁和干燥的抛光工件。

46. 发明授权

US06443808B2 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 有权
标题翻译：用于干燥，干燥抛光和洗涤半导体器件的方法和设备
公开(公告)号：US06443808B2
公开(公告)日：2002-09-03
申请号：US09804231
申请日：2001-03-13
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B24B5100
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.
摘要翻译：抛光装置包括用于处理各种操作的多个单元的布置以及具有至少一个臂的机器人。所述多个单元设置在所述机器人周围，并且包括用于在其上接收的加载单元。干燥的待抛光工件，包括至少一个用于抛光工件的抛光单元的抛光系统，至少包括一个用于洗涤和干燥抛光的工件的洗涤单元的洗涤系统和干燥系统，以及用于在其上接收的卸载单元得到清洁和干燥的抛光工件。

47. 发明授权

US06425806B2 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 有权
公开(公告)号：US06425806B2
公开(公告)日：2002-07-30
申请号：US09804234
申请日：2001-03-13
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B24B100
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.

48. 发明授权

US06404911B2 Semiconductor failure analysis system 失效
标题翻译：半导体故障分析系统
公开(公告)号：US06404911B2
公开(公告)日：2002-06-11
申请号：US09731745
申请日：2000-12-08
申请人： Kazuko Ishihara , Seiji Ishikawa , Masao Sakata , Isao Miyazaki , Yoshiyuki Miyamoto , Jun Nakazato
发明人： Kazuko Ishihara , Seiji Ishikawa , Masao Sakata , Isao Miyazaki , Yoshiyuki Miyamoto , Jun Nakazato
IPC分类号： G06K900
CPC分类号： H01L22/20 , G01N21/88 , G01N21/956
摘要： A semiconductor failure analysis system and method therefor facilitated by a failure information collection unit for collection, by bit, failure information of a semiconductor, an inspection unit for examining relations between various types of inspection data obtained by inspection of the semiconductor and for examining relations between the inspection data and failure information, a storage unit for storing design information of the semiconductor, an analysis unit for analyzing the failure information from the failure information collection unit, from the inspection unit and design information stored in the storage unit, a display unit for displaying at least one of the result of analysis from the analysis unit and the failure information, a failure cause estimation unit for estimating a cause of the failure information, and a unit for feeding the estimated cause of the failure information back to a process in which the failure has occurred.
摘要翻译：一种半导体故障分析系统及其方法，由用于收集半导体的故障信息的故障信息收集单元，用于检查通过半导体检查获得的各种检查数据之间的关系的检查单元以及用于检查检查数据和故障信息，用于存储半导体的设计信息的存储单元，用于从故障信息收集单元分析故障信息的分析单元和存储在存储单元中的设计信息的显示单元，显示来自分析单元的分析结果和故障信息中的至少一个;故障原因估计单元，用于估计故障信息的原因;以及单元，用于将故障信息的估计原因反馈到其中发生故障。

49. 发明授权

US06185324B2 Semiconductor failure analysis system 失效
标题翻译：半导体故障分析系统
公开(公告)号：US06185324B2
公开(公告)日：2001-02-06
申请号：US08381490
申请日：1995-01-31
申请人： Kazuko Ishihara , Seiji Ishikawa , Masao Sakata , Isao Miyazaki , Yoshiyuki Miyamoto , Jun Nakazato
发明人： Kazuko Ishihara , Seiji Ishikawa , Masao Sakata , Isao Miyazaki , Yoshiyuki Miyamoto , Jun Nakazato
IPC分类号： G06K900
CPC分类号： H01L22/20 , G01N21/88 , G01N21/956
摘要： A semiconductor failure analysis system which includes a failure information collection unit for collecting, by bit, failure information concerned with a failure of a semiconductor, an inspection unit for examining relations between various types of inspection data obtained by inspection of the semiconductor and for examining relations between said inspection data and the failure information, a storage unit for storing information concerned with design of said semiconductor, an analysis unit for analyzing the failure information on the basis of output information output from the failure information collection unit, output information output from the inspection unit and design information stored in the storage unit, a display unit for displaying at least one of the result of analysis output from the analysis unit and the failure information, a failure cause estimation unit for estimating a cause of said failure information, and an unit for feeding the estimated cause of said failure information back to a process in which the failure has occurred.
摘要翻译：一种半导体故障分析系统，包括故障信息收集单元，用于逐位地收集与半导体故障有关的故障信息;检查单元，用于检查通过半导体检查获得的各种检查数据与检查关系之间的关系在所述检查数据和故障信息之间，存储单元，用于存储与所述半导体的设计有关的信息;分析单元，用于基于从故障信息收集单元输出的输出信息分析故障信息，从检查输出的输出信息存储在存储单元中的单元和设计信息，用于显示从分析单元输出的分析结果和故障信息中的至少一个的显示单元，用于估计所述故障信息的原因的故障原因估计单元，以及单元用于喂养所述故障inf的估计原因还原到发生故障的过程。

50. 发明授权

US5931890A Positioning system utilizing GPS satellites 失效
标题翻译： GPS卫星定位系统
公开(公告)号：US5931890A
公开(公告)日：1999-08-03
申请号：US808955
申请日：1997-02-19
申请人： Yoshihisa Suwa , Seiji Ishikawa , Tomohiro Yamamoto , Takeshi Ito , Tomio Yasuda
发明人： Yoshihisa Suwa , Seiji Ishikawa , Tomohiro Yamamoto , Takeshi Ito , Tomio Yasuda
IPC分类号： G01C21/00 , G01S1/00 , G01S19/22 , G01S19/28 , G01S19/49 , G06F165/00
CPC分类号： G01S19/42 , G01S19/22 , G01S19/28
摘要： A positioning system is disclosed in which a rate of change .DELTA..DELTA.f in a Doppler shift .DELTA.f of the radio wave transmitted from a GPS satellite is detected in order to determine whether or not an extraordinary radio wave as caused by a multi-path or the like is being received, and a GPS satellite from which an extraordinary radio wave is received is excluded from a group of GPS satellites which are utilized in a positioning calculation. A difference .DELTA.f between a signal frequency f0 transmitted from a GPS satellite and a signal frequency fR receiver is calculated, and a rate of change .DELTA..DELTA.f in the difference .DELTA.f is also calculated. The position of a receiver is calculated on the basis of information transmitted from a plurality of GPS satellites for which the rate of change .DELTA..DELTA.f is equal to or less than a first threshold value, or .DELTA..DELTA.f.ltoreq.30 Hz/s, and the azimuth of a traveling direction of the receiver is calculated on the basis of information transmitted from a plurality of GPS satellites for which the rate of change .DELTA..DELTA.f is equal to or less than a second smaller threshold value or .DELTA..DELTA.f.ltoreq.15 Hz/s.
摘要翻译：公开了一种定位系统，其中检测到从GPS卫星发射的无线电波的多普勒频移DELTA f中的变化率DELTA DELTA f，以便确定由多路径引起的非凡无线电波正在接收，并且从定位计算中使用的一组GPS卫星中排除从其接收非正常无线电波的GPS卫星。计算从GPS卫星发送的信号频率f0和信号频率fR接收机之间的差ΔTA，并且还计算差ΔTATA中的变化率DELTA DELTA f。基于从变化率DELTA DELTA f等于或小于第一阈值或DELTA DELTA f 30Hz / s的多个GPS卫星发送的信息来计算接收机的位置并且基于从其变化率DELTA DELTA f等于或小于第二较小阈值或DELTA DELTA f'的多个GPS卫星发送的信息来计算接收机的行进方向的方位角， / = 15Hz / s。

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