会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 44. 发明授权
    • Metal induced self-aligned crystallization of Si layer for TFT
    • TFT的Si层的金属诱导自对准结晶
    • US06566687B2
    • 2003-05-20
    • US09765134
    • 2001-01-18
    • Paul S. AndryFrank R. LibschTakatoshi Tsujimura
    • Paul S. AndryFrank R. LibschTakatoshi Tsujimura
    • H01L2904
    • H01L29/78633H01L21/0237H01L21/02532H01L21/02672H01L27/12H01L27/1277H01L29/66757
    • The present invention discloses a semiconductor device, a thin film transistor (TFT), and a process for forming a TFT. The semiconductor device according to the present invention comprises a top-gate type thin film transistor (TFT), said top-gate type TFT being formed on a substrate, said top-gate type TFT comprising: an insulating layer deposited on said substrate; a source electrode and a drain electrode formed from a metal-dopant compound, said metal-dopant compound being deposited on said insulating layer; a polycrystalline Si (poly-Si) layer deposited on said insulating layer and said source electrode and said drain electrode; an ohmic contact layer being formed between said metal-dopant compound and said poly-Si layer through migration of said dopant from said metal-dopant compound; a gate insulating layer deposited on said poly-Si layer; and a gate electrode formed on said gate insulating layer, wherein said poly-Si layer is crystallized by metal induced lateral crystallization.
    • 本发明公开了半导体器件,薄膜晶体管(TFT)和TFT的形成工艺。 根据本发明的半导体器件包括顶栅型薄膜晶体管(TFT),所述顶栅型TFT形成在衬底上,所述顶栅型TFT包括:沉积在所述衬底上的绝缘层; 由金属 - 掺杂剂化合物形成的源电极和漏电极,所述金属 - 掺杂剂化合物沉积在所述绝缘层上; 沉积在所述绝缘层和所述源电极和所述漏电极上的多晶Si(多晶硅)层; 通过所述掺杂剂从所述金属掺杂剂化合物的迁移,在所述金属 - 掺杂剂化合物和所述多晶硅层之间形成欧姆接触层; 沉积在所述多晶硅层上的栅极绝缘层; 以及形成在所述栅极绝缘层上的栅电极,其中所述多晶硅层通过金属诱导的横向结晶而结晶。
    • 45. 发明申请
    • Transferable Probe Tips
    • 可转移探头技巧
    • US20120279287A1
    • 2012-11-08
    • US13101253
    • 2011-05-05
    • Paul S. AndryBing DangSteven L. Wright
    • Paul S. AndryBing DangSteven L. Wright
    • G01B5/28B05D5/00C23F1/00
    • G01B5/28B81B2201/12B81C3/001B81C2201/0194G01Q40/02G01Q70/14G01Q70/16G01R1/067G01R1/06738G01R1/07378G01R3/00G03F7/00
    • Transferable probe tips including a metallic probe, a delamination layer covering a portion of the metallic probe, and a bonding alloy, wherein the bonding alloy contacts the metallic probe at a portion of the probe that is not covered by the delamination layer are provided herein. Also, techniques for creating a transferable probe tip are provided, including etching a handler substrate to form one or more via arrays, depositing a delamination layer in each via array, depositing one or more metals in each via array to form a probe tip structure, and depositing a bonding alloy on a portion of the probe tip structure that is not covered by the delamination layer. Additionally, techniques for transferring transferable probe tips are provided, including removing a handler substrate from a probe tip structure, and transferring the probe tip structure via flip-chip joining the probe tip structure to a target probe head substrate.
    • 本发明提供了包括金属探针,覆盖金属探针的一部分的分层和可接合的探针尖端,以及接合合金,其中接合合金在探针的未被分层的覆盖部分处接触金属探针。 此外,提供了用于产生可转移探针尖端的技术,包括蚀刻处理器衬底以形成一个或多个通孔阵列,在每个通孔阵列中沉积分层,在每个通孔阵列中沉积一个或多个金属以形成探针尖端结构, 以及在未被分层层覆盖的探针尖端结构的一部分上沉积接合合金。 此外,提供了用于传送可转移的探针尖端的技术,包括从探针尖端结构去除处理器基底,以及通过将探针尖端结构连接到目标探针头基底的倒装芯片来传送探针尖端结构。