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    • 42. 发明授权
    • 1,3-oxathiolane-2-thione compounds
    • 1,3-氧硫杂环戊烷-2-硫酮化合物
    • US07432381B2
    • 2008-10-07
    • US11354390
    • 2006-02-15
    • Kazuya UenishiAtsushi SudoHiroshi MorikawaTakeshi EndoOlaf LammerschopThomas HuverPavel Gentschev
    • Kazuya UenishiAtsushi SudoHiroshi MorikawaTakeshi EndoOlaf LammerschopThomas HuverPavel Gentschev
    • C07D327/04
    • C08G77/28C07F7/1804C08G75/28
    • The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein R1 and R2 are the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, R3 is different or the same as R1 or R2 or an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, R4 is a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and R5 is hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or R4 and R5 form a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and selected from oxygen and sulfur and mixtures of such compounds.
    • 本发明涉及通式(I)的1,3-氧硫杂环戊烷-2-硫酮化合物:其中R 1和R 2各自相同或不同,各自相同或不同, 表示具有1至6个碳原子的直链或支链烷氧基残基或芳氧基或芳烷氧基残基,R 3不同于或不同于R 1或R 2 脂族残基,氨基残基,卤素残基,芳香族或杂芳族残基或芳脂族或杂脂族残基,R 4是选自以下的桥连基团: 由脂族,杂脂族,芳脂族,杂脂肪族,芳族和杂芳族基团组成的基团,R 5是氢,脂族,杂脂族,芳脂族,杂脂族,芳族,杂芳族,脂环族或杂脂族基团或R 4和R 5形成脂环族,杂脂族,芳族或杂芳族残基,其任选被 n个作为与硅原子的桥连基团的脂族,杂脂族残基,X和Y不同,选自氧和硫以及这些化合物的混合物。
    • 44. 发明申请
    • Acid-degradable resin compositions containing ketene-aldehyde copolymer
    • 含有乙烯酮 - 醛共聚物的酸降解树脂组合物
    • US20050130057A1
    • 2005-06-16
    • US10504496
    • 2003-02-14
    • Atsushi SudoHideo Kubo
    • Atsushi SudoHideo Kubo
    • C08G63/00C08G63/06C08K5/00C08K5/13C08K5/34G03F7/039G03C1/76
    • C08K5/0025C08G63/005C08G63/06C08K5/0033C08K5/0041C08K5/13C08K5/34G03F7/0392C08L67/04C08L69/00
    • It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R4 group, S(O)nR4 group, P(═O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di-C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.
    • 旨在提供用于抗蚀剂等的组合物,以通过增加曝光部分和未曝光部分之间的溶解度的差异来形成具有高灵敏度和高分辨率的精细图案。 酸降解组合物含有具有由以下通式(I)表示的重复单元的聚合物:其中R 1和R 2独立地表示氢原子,卤素原子,C C 1-20烷基,杂环基,氰基,硝基,C(O)R 4基团,S(O) P(-O)(R 4)2基团或M(R 4)4个基团 >)<3> 组; R 3表示C 1-20烃基或杂环基:R 4表示C 1-20烃基氧基 基团,C 1-20烃基,C 1-20烃基或单或二-C 1-20烃氨基; M表示硅,锗,锡或铅原子; 和n为0,1或2,以及能够响应外部刺激产生酸的酸或化合物。