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    • 41. 发明授权
    • Curable resin composition cured products
    • 固化树脂组合物固化产物
    • US06313233B1
    • 2001-11-06
    • US09447952
    • 1999-11-29
    • Takahiko KurosawaKinji YamadaMinoru MatsubaraYasutake InoueTomotaka ShinodaKouhei Gotou
    • Takahiko KurosawaKinji YamadaMinoru MatsubaraYasutake InoueTomotaka ShinodaKouhei Gotou
    • C08G6548
    • H01L21/02126C08G77/455C08K5/5415C08L79/08C09D183/10H01L21/312C08L2666/52
    • A curable resin composition comprising (A) a hydrolyzate or a partial condensate of an organosilane compound, or both; (B) at least one compound selected from the group consisting of polyamic acids having a hydrolyzable silyl group or carboxylic acid anhydride group, or both, and polyimides having a hydrolyzable silyl group or carboxylic acid anhydride group, or both; and (C) a chelate compound or an alkoxide compound with a metal selected from the group consisting of zirconium, titanium, and aluminum, or both the chelate compound and the alkoxide compound. The resin composition can be cured and fabricated without producing no cracks into a cured product such as a semiconductor device having a low dielectric constant, high heat resistance and moisture resistance, superior adhesion to various substrate materials, superb electrical insulation properties, and low moisture absorption. Semiconductor devices using this curable resin composition as an insulating film exhibit a low electricity consumption, work at a high speed, and have excellent reliability.
    • 一种可固化树脂组合物,其包含(A)有机硅烷化合物的水解产物或部分缩合物,或两者; (B)至少一种选自具有水解性甲硅烷基或羧酸酐基团的聚酰胺酸或二者的化合物和具有可水解甲硅烷基或羧酸酐基团的聚酰亚胺或两者; 和(C)螯合化合物或选自锆,钛和铝的金属的醇盐化合物,或螯合化合物和醇盐化合物两者。 可以固化和制造树脂组合物,而不会在诸如具有低介电常数,高耐热性和耐湿性,优异的各种基材的粘合性,优异的电绝缘性能和低吸湿性的半导体装置等固化产物中不产生裂纹 。 使用该固化性树脂组合物作为绝缘膜的半导体装置的电耗低,高速工作,可靠性优异。
    • 44. 发明授权
    • Zirconia-based coating composition
    • 氧化锆基涂料组合物
    • US4830672A
    • 1989-05-16
    • US156825
    • 1988-02-17
    • Kinji YamadaMasaki NagataSiniti SuyamaMomoko Okamura
    • Kinji YamadaMasaki NagataSiniti SuyamaMomoko Okamura
    • C09D185/00C04B41/49C04B41/50C07F7/00C09D1/00C23C30/00
    • C23C30/00C04B41/49C04B41/5042C07F7/006C09D1/00
    • A zirconia-based coating composition comprising a mixture obtained by mixing:(a) at least one compound selected from the group consisting of (a') a zirconium compound represented by the general formula (I):Zr(OR).sub.4 (I)wherein R is an alkyl group having 2-5 carbon atoms or the general formula (I'):Zr(OR).sub.4.ROH (I')wherein R has the same means as defined above, (a") a partial hydrolyzate of the zirconium compound (a'), and (a'") a partial condensate of the partial hydrolyzate (a"),(b) a .beta.-diketone or .beta.-ketoester represented by the general formula (II):R.sup.1 COOH.sub.2 COR.sup.2 (II)wherein R.sup.1 is an alkyl group having 1-5 carbon atoms, R.sup.2 is an alkyl group having 1-5 carbon atoms or an alkoxy group having 1-4 carbon atoms),(c) water, and(d) a hydrophilic organic solvent.Said coating composition can form a transparent, very hard coating film on the surfaces of metals, inorganic building materials and plastics, can be hardened at low temperatures, can form a thick coating film, and can be recoated.
    • 一种氧化锆基涂料组合物,其包含通过混合以下物质获得的混合物:(a)至少一种选自(a')由通式(I)表示的锆化合物:Zr(OR)4(I) 其中R是具有2-5个碳原子的烷基或通式(I'):Zr(OR)4.ROH(I')其中R具有与上述相同的方法,(a“)部分水解产物 的锆化合物(a')和(a“)部分水解产物(a”)的部分缩合物,(b)由通式(II)表示的β-二酮或β-酮酯:(R1COOH2COR2) (II)其中R1是具有1-5个碳原子的烷基,R2是具有1-5个碳原子的烷基或具有1-4个碳原子的烷氧基),(c)水,和(d)亲水性 有机溶剂。 所述涂料组合物可以在金属,无机建筑材料和塑料的表面上形成透明,非常硬的涂膜,可以在低温下硬化,可以形成厚的涂膜,并且可以重新涂覆。
    • 47. 发明申请
    • Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure
    • 浸没曝光系统,以及用于浸没曝光的液体的回收方法和供应方法
    • US20080129970A1
    • 2008-06-05
    • US11795809
    • 2006-01-20
    • Taiichi FurukawaKatsuhiko HiedaYakashi MiyamatsuYong WangKinji Yamada
    • Taiichi FurukawaKatsuhiko HiedaYakashi MiyamatsuYong WangKinji Yamada
    • G03B27/42H01L21/027G03F7/038G03B27/52G03F7/20
    • G03F7/70341
    • An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure system 1 includes a liquid supply section 80 which supplies the liquid 301, an exposure section to which the liquid 301 (301b) supplied from the liquid supply section 80 is continuously introduced along a specific direction and which performs an exposure process in a state in which a space between the optical element of the projection optical means 121 and the substrate 111 is filled with the liquid 301, a liquid recovery section 90 which recovers the liquid 301 (301a) passed through the exposure section 110 at a symmetrical position against the substrate 111, and a liquid recycling section 20 which recycles the liquid 301 (301c) recovered by the liquid recovery section 90. The properties of the immersion exposure liquid can be stabilized when applying an immersion method, whereby exposure can be advantageously and continuously performed, and running cost can be reduced.
    • 浸没曝光系统1通过设置在投影光学装置121的光学元件和基板111之间的液体301进行曝光处理。 浸没曝光系统1包括供给液体301的液体供给部80,从液体供给部80供给的液体301(301b)沿特定方向连续导入的曝光部,并进行曝光处理 投影光学装置121的光学元件和基板111之间的空间被液体301填充的状态,使液体301(301a)以对称的方式通过曝光部110的液体回收部90 与液体回收部90回收的液体301(301c)的液体再循环部20。 浸渍曝光液体的性质可以通过浸渍法稳定化,可以有利且连续地进行曝光,能够降低运转成本。
    • 48. 发明申请
    • Method for producing saturated hydrocarbon compound
    • 饱和烃化合物的制备方法
    • US20070156003A1
    • 2007-07-05
    • US11635660
    • 2006-12-08
    • Taiichi FurukawaYong WangKinji Yamada
    • Taiichi FurukawaYong WangKinji Yamada
    • C07C7/17
    • C07C7/171C07C2602/28C07C13/50
    • A method for treating a saturated hydrocarbon compound suitable as a liquid for the immersion exposure method excelling in transmission in the deep ultraviolet region using sulfuric acid in an amount smaller than in a conventional method is provided. The above sulfuric acid washing treatment is the method for producing saturated hydrocarbon compound intended to reduce the absorbance, wherein the second sulfuric acid washing treatment step is conducted after the first sulfuric acid washing treatment step at a temperature 10° C. or more lower than the temperature of the first sulfuric acid washing treatment step. The absorbance of light with a wavelength of 193 nm of the saturated hydrocarbon compound to be treated in the above second sulfuric acid washing treatment step is 0.10 or less per 1 cm of a liquid optical path length, and the above saturated hydrocarbon compound is an alicyclic saturated hydrocarbon compound.
    • 提供一种处理适合作为浸渍曝光方法的饱和烃化合物的方法,其中使用比常规方法更小的硫酸,在深紫外区域中透射性优异。 上述硫酸洗涤处理是制造用于降低吸光度的饱和烃化合物的方法,其中第二硫酸洗涤处理步骤在第一硫酸洗涤处理步骤之后在10℃以上的温度下进行 第一硫酸洗涤处理步骤的温度。 在上述第二硫酸洗涤处理步骤中,待处理的饱和烃化合物的波长为193nm的光的吸光度为每1cm液体光程长度为0.10以下,上述饱和烃化合物为脂环式 饱和烃化合物。