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    • 41. 发明申请
    • Acid-degradable resin compositions containing ketene-aldehyde copolymer
    • 含有乙烯酮 - 醛共聚物的酸降解树脂组合物
    • US20050130057A1
    • 2005-06-16
    • US10504496
    • 2003-02-14
    • Atsushi SudoHideo Kubo
    • Atsushi SudoHideo Kubo
    • C08G63/00C08G63/06C08K5/00C08K5/13C08K5/34G03F7/039G03C1/76
    • C08K5/0025C08G63/005C08G63/06C08K5/0033C08K5/0041C08K5/13C08K5/34G03F7/0392C08L67/04C08L69/00
    • It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R4 group, S(O)nR4 group, P(═O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di-C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.
    • 旨在提供用于抗蚀剂等的组合物,以通过增加曝光部分和未曝光部分之间的溶解度的差异来形成具有高灵敏度和高分辨率的精细图案。 酸降解组合物含有具有由以下通式(I)表示的重复单元的聚合物:其中R 1和R 2独立地表示氢原子,卤素原子,C C 1-20烷基,杂环基,氰基,硝基,C(O)R 4基团,S(O) P(-O)(R 4)2基团或M(R 4)4个基团 >)<3> 组; R 3表示C 1-20烃基或杂环基:R 4表示C 1-20烃基氧基 基团,C 1-20烃基,C 1-20烃基或单或二-C 1-20烃氨基; M表示硅,锗,锡或铅原子; 和n为0,1或2,以及能够响应外部刺激产生酸的酸或化合物。