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41. 发明授权

US08466439B2 Electron beam lithography apparatus and electron beam lithography method 有权
标题翻译：电子束光刻设备和电子束光刻法
公开(公告)号：US08466439B2
公开(公告)日：2013-06-18
申请号：US13068995
申请日：2011-05-25
申请人： Akio Yamada , Tomohiro Sakazaki , Hiroshi Yasuda
发明人： Akio Yamada , Tomohiro Sakazaki , Hiroshi Yasuda
IPC分类号： G21K5/00 , H01J37/317
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.
摘要翻译：一种电子束光刻设备，包括：存储器，用于根据设备图案所要求的准确度，对分配了等级的绘图图形进行数据存储;绘图模式调整单元，基于该等级生成分割图形的数据;结算等待时间调整基于等级确定结算等待时间的单元，以及基于划分的绘图图案和结算等待时间的数据来照射电子束时绘制设备图案的控制器。绘制图案调整单元基于等级来确定分割绘制图案的长边长度的上限或划分的绘制图案的区域的上限，并且基于上限划分绘图图案。

42. 发明申请

US20070181829A1 Electron-beam exposure system 审中-公开
标题翻译：电子束曝光系统
公开(公告)号：US20070181829A1
公开(公告)日：2007-08-09
申请号：US11650234
申请日：2007-01-05
申请人： Hitoshi Tanaka , Akio Yamada , Hiroshi Yasuda , Yoshihisa Ooae
发明人： Hitoshi Tanaka , Akio Yamada , Hiroshi Yasuda , Yoshihisa Ooae
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/045 , H01J2237/31761 , H01J2237/31776 , H01J2237/31788
摘要： An electron-beam exposure system includes: an electron gun; a first mask having a first opening for shaping a beam of electrons; a second mask having a second opening for shaping the beam of electrons; a stencil mask disposed below the first mask and the second mask, the stencil mask having a plurality of collective figured openings each for shaping the beam of electrons; a paralleling lens for causing the beam of electrons, which has been transmitted in, and come out of, the stencil mask, to turn into a beam of electrons which travels approximately in parallel to the optical axis; and a swing-back mask deflector for swinging back the beam of electrons which has passed through the stencil mask. N2>N1 may be satisfied where 1/N1 denotes the reduction ratio of a pattern in the stencil mask to a pattern on the surface of the workpiece, and 1/N2 denotes the reduction ratio of a pattern in the first mask and a pattern in the second mask to a pattern on the surface of the workpiece.
摘要翻译：电子束曝光系统包括：电子枪; 具有用于成形电子束的第一开口的第一掩模; 具有用于使电子束成形的第二开口的第二掩模; 设置在所述第一掩模和所述第二掩模下方的模板掩模，所述模版掩模具有多个用于使所述电子束成形的集合形状的开口; 用于使已经被传送到模板掩模中并从模板掩模出来的电子束的平行透镜转变成大致平行于光轴行进的电子束; 以及用于摆动穿过模板掩模的电子束的回摆掩模偏转器。可以满足其中1 / N 1表示模板掩模中的图案与图案上的图案的缩小比率的N <2> N <1> 表示工件的表面，1 / N 2 <2>表示第一掩模中的图案和第二掩模中的图案与工件表面上的图案的缩小率。

43. 发明授权

US5892237A Charged particle beam exposure method and apparatus 失效
标题翻译：带电粒子束曝光方法和装置
公开(公告)号：US5892237A
公开(公告)日：1999-04-06
申请号：US815436
申请日：1997-03-11
申请人： Kenichi Kawakami , Hiroshi Yasuda , Akio Yamada , Tatsuro Ohkawa , Mitsuhiro Nakano , Atsushi Saito , Yoshihisa Ooae
发明人： Kenichi Kawakami , Hiroshi Yasuda , Akio Yamada , Tatsuro Ohkawa , Mitsuhiro Nakano , Atsushi Saito , Yoshihisa Ooae
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174
摘要： In a charged particle beam exposure method and an apparatus therefor, wherein the intensity of the charged particle beam used for irradiation is increased to a maximum to improve a throughput for an exposure procedure, accordingly, the temperature of a sample, such as a wafer, is elevated and thermal expansion occurs. The thermal expansion that occurs has reproducibility based on the intensity of the projected charged particle beam. Therefore, a coefficient of thermal expansion is detected by monitoring the intensity of the projected charged particle beam. A shifting distance for each irradiation position which is acquired from the thermal expansion is added as a compensation value for deflection of the charged particle beam, to provide an accurate exposure procedure.
摘要翻译：在带电粒子束曝光方法及其装置中，其中用于照射的带电粒子束的强度增加到最大以提高曝光程序的通过量，因此，诸如晶片的样品的温度，升高并发生热膨胀。发生的热膨胀基于投射的带电粒子束的强度具有再现性。因此，通过监视投射的带电粒子束的强度来检测热膨胀系数。将从热膨胀获取的每个照射位置的移动距离作为用于带电粒子束偏转的补偿值被添加，以提供准确的曝光程序。

44. 发明授权

US5841145A Method of and system for exposing pattern on object by charged particle beam 失效
标题翻译：通过带电粒子束对物体曝光图案的方法和系统
公开(公告)号：US5841145A
公开(公告)日：1998-11-24
申请号：US610350
申请日：1996-03-04
申请人： Takamasa Satoh , Yoshihisa Oae , Soichiro Arai , Kenichi Miyazawa , Hiroshi Yasuda , Manabu Ohno , Hitoshi Watanabe , Junichi Kai , Tomohiko Abe , Akio Yamada , Yasushi Takahashi
发明人： Takamasa Satoh , Yoshihisa Oae , Soichiro Arai , Kenichi Miyazawa , Hiroshi Yasuda , Manabu Ohno , Hitoshi Watanabe , Junichi Kai , Tomohiko Abe , Akio Yamada , Yasushi Takahashi
IPC分类号： H01J37/302
CPC分类号： H01J37/3023 , H01J2237/3175
摘要： By using a blanking aperture array BAA, the density of the bit map data in the portions where adjacent areas are linked is decreased toward the outside. On the lower surface of the holder of the BAA chip, a ball grid array wired to blanking electrodes is formed, to be pressed in contact against pads on a wiring base board. The registered bit map data for an isosceles right triangle are read out from address A=A0+�RA.multidot.i! (A0 and i are integers, � ! is an operator for integerizing), masked, and then shifted by bits to be deformed. From registered bit map data for proximity effect correction, the area which corresponds to the size of the object of correction and the required degree of proximity affect correction is extracted, and logic operation with the bit map data of the object of correction is performed to achieve proximity affect correction. Before figures data are expanded into bit map, a checksum is determined in units of bit map data corresponding to the range of one session of scanning over which continuous exposure is possible. A sine wave voltage is provided to an electrostatic deflector and during a one-shot exposure period, an electron beam is caused to scan for an integer number of times on a block of a mask and the positional misalignment of the electron beam at the lower aperture stop is corrected.
摘要翻译：通过使用消隐孔径阵列BAA，相邻区域连接的部分中的位图数据的密度朝向外部减小。在BAA芯片的保持器的下表面上形成布线到消隐电极的球栅阵列，以与接线基板上的焊盘压接。从地址A = A0 + [RAxi]（A0和i是整数，[]是整数化的运算符）读出等腰直角三角形的注册位图数据，被屏蔽，然后移位以变形。从用于邻近效应校正的注册位图数据中，提取对应于校正对象的大小的区域和所需的邻近度影响校正程度，并且执行校正对象的位图数据的逻辑运算以实现近距离影响校正。在将图形数据扩展为位图之前，以对应于可能进行连续曝光的一次扫描会话的范围的位图数据为单位确定校验和。向静电偏转器提供正弦波电压，并且在单次曝光期间，使电子束在掩模块上扫描整数次，并且使电子束在下孔处的位置偏移停止更正。

45. 发明授权

US5608226A Electron-beam exposure method and system 失效
标题翻译：电子束曝光方法及系统
公开(公告)号：US5608226A
公开(公告)日：1997-03-04
申请号：US404718
申请日：1995-03-15
申请人： Akio Yamada , Hiroshi Yasuda
发明人： Akio Yamada , Hiroshi Yasuda
IPC分类号： H01L21/027 , H01J37/304 , G01J1/00 , G01N21/00 , G01N23/00
CPC分类号： H01J37/3045 , H01J2237/30438
摘要： An electron-beam exposure system includes a stage on which a wafer is set, an exposure unit for exposing the wafer set on sid stage using an electron-beam, an optical detecting unit having an optical axis, and, a locating control unit for locating the stage at a target position based on a relative position of a deflection center line to the optical axis of the optical detecting means which target position is detected using a reference mark formed on the movable stage. In an electron-beam exposure method using the above electron-beam exposure system, the relative position is detected, and the target position of the movable stage is then calculated based on the relative position.
摘要翻译：电子束曝光系统包括设置晶片的台，用于使用电子束曝光在台面上的晶片的曝光单元，具有光轴的光学检测单元，以及用于定位的定位控制单元使用形成在可移动台上的基准标记来检测基于目标位置的偏转中心线相对于光学检测装置的光轴的相对位置的目标位置的平台。在使用上述电子束曝光系统的电子束曝光方法中，检测相对位置，然后基于相对位置计算可动台的目标位置。

46. 发明授权

US5382800A Charged particle beam exposure method and apparatus 失效
标题翻译：带电粒子束曝光方法和装置
公开(公告)号：US5382800A
公开(公告)日：1995-01-17
申请号：US39
申请日：1993-01-04
申请人： Hisayasu Nishino , Akio Yamada , Yoshihisa Oae , Hiroshi Yasuda
发明人： Hisayasu Nishino , Akio Yamada , Yoshihisa Oae , Hiroshi Yasuda
IPC分类号： G03F7/20 , H01J37/147 , H01L21/027 , H01L21/30 , H01J3/32
CPC分类号： H01J37/1472 , H01J2237/002 , H01J2237/14 , H01J2237/152 , H01J2237/3175
摘要： A charged particle beam exposure method for deflecting a charged particle beam in a deflection system which includes electromagnetic deflection coils, includes the steps of (a) controlling the deflection system based on deflection data, and (b) generating heat at least a vicinity of the electromagnetic deflection coils so as to compensate for a change in heat generated from the electromagnetic deflection coils.
摘要翻译：一种用于使包含电磁偏转线圈的偏转系统中的带电粒子束偏转的带电粒子束曝光方法包括以下步骤：（a）基于偏转数据控制偏转系统，以及（b）至少产生热量电磁偏转线圈，以补偿由电磁偏转线圈产生的热量变化。

47. 发明授权

US5264706A Electron beam exposure system having an electromagnetic deflector configured for efficient cooling 失效
标题翻译：具有电磁偏转器的电子束曝光系统被配置为有效地冷却
公开(公告)号：US5264706A
公开(公告)日：1993-11-23
申请号：US874138
申请日：1992-04-27
申请人： Yoshihisa Oae , Akio Yamada , Hiroshi Yasuda
发明人： Yoshihisa Oae , Akio Yamada , Hiroshi Yasuda
IPC分类号： H01J37/147 , H01J3/32
CPC分类号： H01J37/1471 , H01J2237/002 , H01J2237/152 , H01J2237/3175
摘要： An electron beam exposure system comprises a beam source for producing and directing an electron beam along an optical axis, an evacuated column for accommodating the beam source and extending along the optical axis, an electron lens for focusing the electron beam on a substrate; and an electromagnetic deflector supplied with a control signal for deflecting the electron beam in response to the control signal. The electromagnetic deflector comprises an inner sleeve surrounding the evacuated column, first and second mutually separate windings provided on an outer surface of the inner sleeve in opposed relationship with respect to each other across the optical axis, an outer sleeve surrounding the inner sleeve with a separation therebetween defining a passageway for the flow of a coolant therethrough; third and fourth, mutually separate windings provided on an inner surface of the outer sleeve in opposed relationship with respect to each other across the optical axis, an inlet for introducing the coolant into the passageway, and an outlet for exiting the coolant from the passageway.
摘要翻译：电子束曝光系统包括用于沿光轴产生和引导电子束的光束源，用于容纳光束源并沿光轴延伸的抽真空柱，用于将电子束聚焦在衬底上的电子透镜; 以及电磁偏转器，其被提供有用于响应于控制信号偏转电子束的控制信号。电磁偏转器包括围绕真空柱的内套筒，第一和第二相互独立的绕组，其设置在内套筒的外表面上，相对于彼此跨越光轴的对置关系，包围内套筒的外套筒具有分离其间限定用于冷却剂流过其的通道; 第三和第四，互相分离的绕组设置在外套筒的内表面上，相对于彼此跨越光轴的相对关系，用于将冷却剂引入通道的入口和用于从冷却剂离开通道的出口。

48. 发明申请

US20140224436A1 ROLLER SHADE 有权
标题翻译：滚子阴影
公开(公告)号：US20140224436A1
公开(公告)日：2014-08-14
申请号：US14127397
申请日：2013-03-27
申请人： Shinya Yukisada , Akio Yamada
发明人： Shinya Yukisada , Akio Yamada
IPC分类号： B60J7/06 , E06B9/42
CPC分类号： B60J7/06 , B60J7/0015 , E06B9/42
摘要： A roller shade includes a light shielding sheet which can be rolled up in a roll shape, a roller and an electric motor for openably moving the light shielding sheet, guide belts connected to respective lower surfaces of side end parts of the light shielding sheet in a sheet width direction, and a pair of guide parts each having a guide space which receives a corresponding one of the side end parts of the light shielding sheet in the sheet width direction and a corresponding one of the guide belts, for guiding the side end part and the guide belt. In the roller shade, the light shielding sheet is prevented from being creased when the light shielding sheet moves in the width direction while being rolled or unrolled, due to lack of a tension of the light shielding sheet in the width direction.
摘要翻译：卷帘包括可卷绕成卷状的遮光片，滚子和电动马达，用于使遮光片可开启地移动，导光带连接到遮光片的侧端部的各个下表面以及一对引导部，每个引导部具有引导空间，该引导空间容纳遮光片的片宽度方向上的相应的一个侧端部和相应的一个引导带，用于引导侧端部和导带。在卷帘中，由于遮光片在宽度方向上的张力不足，防光片在卷绕或展开的同时沿宽度方向移动时，防止了遮光片的折痕。

49. 发明申请

US20120256106A1 ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD 有权
标题翻译：电子束曝光装置和电子束曝光方法
公开(公告)号：US20120256106A1
公开(公告)日：2012-10-11
申请号：US13439595
申请日：2012-04-04
申请人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
发明人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3023 , H01J2237/30461 , H01J2237/31769
摘要： In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.
摘要翻译：在多列电子束曝光装置中，通过在晶片上排列多个列单元来并行进行曝光处理，得到各列单元的曝光强度与行宽的关系（步骤S41，步骤S44）。然后，获得校正参数，其允许校正目标列单元的曝光强度和线宽之间的关系与从多个列单元格中选择的参考列单元的曝光强度和线宽之间的关系一致（步骤S43和S46）。此后，通过基于由此获得的校正参数来校正参考柱单元的曝光时间来获得每个列单元的曝光时间。

50. 发明授权

US07920164B2 Viewing surveillance system for carrying out surveillance independent of a broadcasting form 有权
标题翻译：观看独立于广播形式进行监视的监视系统
公开(公告)号：US07920164B2
公开(公告)日：2011-04-05
申请号：US10558687
申请日：2004-06-24
申请人： Eiji Kasutani , Akio Yamada , Kota Iwamoto
发明人： Eiji Kasutani , Akio Yamada , Kota Iwamoto
IPC分类号： H04N7/18 , H04N7/16 , G06K9/54 , G06K9/46 , G06K9/00
CPC分类号： H04N21/6582 , H04H60/32 , H04H60/40 , H04H60/59 , H04N7/17318 , H04N21/433 , H04N21/44008
摘要： A viewing surveillance system which make it possible to carry out the viewing surveillance independently from the broadcasting form like analog broadcasting or digital broadcasting. The viewing surveillance system also make it possible to carry out the viewing surveillance without any restriction set to viewers or any burden to the broadcast stations. The image feature data generating unit 12 receives a picture signal from the image viewing terminal 50, and generates the image feature data which represents a feature of the image from the picture signal. The image information transmitting unit 13 transmits the image feature data generated by the image feature data generating unit 12 to the viewing surveillance server 2. On the other hand, the image feature data generating units 21a to 21c also generates the image feature data based on the broadcasted programs and stores the image feature data in the program image feature data storing unit 22. The viewing program specifying unit 23 specifies the viewed program by matching the image feature data received from the image information transmitting unit 13 and the image feature data stored in the program image feature data storing unit 22.
摘要翻译：一种观看监视系统，其可以独立于诸如模拟广播或数字广播的广播形式进行观看监视。观看监视系统还可以进行观看监视，而不会对观众造成任何限制或对广播电台造成任何负担。图像特征数据生成单元12从图像观看终端50接收图像信号，并从图像信号生成表示图像的特征的图像特征数据。图像信息发送单元13将由图像特征数据生成单元12生成的图像特征数据发送到观看监视服务器2.另一方面，图像特征数据生成单元21a至21c还基于图像特征数据生成单元广播节目并将图像特征数据存储在节目图像特征数据存储单元22中。观看节目指定单元23通过将从图像信息发送单元13接收的图像特征数据和存储在图像特征数据中的图像特征数据进行匹配来指定所观看的节目节目图像特征数据存储单元22。

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