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41. 发明申请

US20060272273A1 Window assembly masking bag 审中-公开
标题翻译：窗组装掩蔽袋
公开(公告)号：US20060272273A1
公开(公告)日：2006-12-07
申请号：US11418845
申请日：2006-05-05
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： E04B1/00
CPC分类号： E04G21/30 , B65D85/64 , B65D2585/649 , E06B7/28
摘要： The invention provides methods and equipment for storing and protecting window assemblies. In certain embodiments, there is provided a bag configured to hold a window assembly therein following the assembly's manufacture up until after the installation of the assembly. The bag is configured to be sealed and to be form-fitted to the window assembly. As such, the likelihood of the bag allowing contaminants therein or catching on something and tearing is reduced. Following the installation of the window assembly, a portion of the bag is configured for removal from the exposed surfaces of the window assembly. A portion of the bag not removed is subsequently utilized as a protective barrier for the non-exposed surfaces of the window assembly. In certain embodiments, there is provided a method for storing and protecting a window assembly using a bag of the described nature.
摘要翻译：本发明提供了用于存储和保护窗组件的方法和设备。在某些实施例中，提供了一种构造成在组件的制造之后将窗户组件保持在其中直到安装组件之后的袋子。该袋被配置为密封并与窗组件成形。因此，袋子允许其中的污染物或捕获物质和撕裂的可能性降低。在安装窗组件之后，袋的一部分被配置成从窗组件的暴露表面移除。随后将未拆卸的袋的一部分用作窗组件的未暴露表面的保护屏障。在某些实施例中，提供了一种使用所述性质的袋存储和保护窗户组件的方法。

42. 发明申请

US20060272174A1 Deposition chamber desiccation systems and methods of use thereof 审中-公开
标题翻译：沉积室干燥系统及其使用方法
公开(公告)号：US20060272174A1
公开(公告)日：2006-12-07
申请号：US11437429
申请日：2006-05-19
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： F26B21/08
CPC分类号： F26B21/001 , C23C14/564 , C23C16/4401 , F26B21/08
摘要： The present invention provides a system and method for removing contaminating moisture from a deposition chamber prior to use. Dry air, preferably hot dry air, is blown into the deposition chamber where it absorbs and removes moisture. This is done by connecting a desiccation system including a blower and a dryer to the deposition chamber. The deposition chamber is also provided with a vacuum source; this may be connected to the deposition chamber using the same line as that used for the desiccation source, or may be connected through a separate line. The dry air may re-circulate through the chamber during this flushing method, or the dry air may flow through the deposition chamber continuously. A heat exchanger may also be provided to efficiently reuse hot air used to recharge the desiccation system. The desiccation system and method are particularly suited for decontaminating a magnetron sputtering deposition chamber.
摘要翻译：本发明提供一种用于在使用之前从沉积室去除污染水分的系统和方法。干燥空气，优选热干燥空气，吹入沉积室，在其中吸收和去除水分。这通过将包括鼓风机和干燥器的干燥系统连接到沉积室来完成。沉积室还设有真空源; 这可以使用与用于干燥源的线相同的线连接到沉积室，或者可以通过单独的管线连接。在这种冲洗过程中干燥的空气可以通过室再循环，或者干燥的空气可以连续地流过沉积室。还可以提供热交换器以有效地再利用用于对干燥系统进行再充电的热空气。干燥系统和方法特别适用于对磁控溅射沉积室进行净化。

43. 发明授权

US07105056B2 Pneumatic handling and recoating apparatus and method of use 失效
标题翻译：气动处理和重涂装置及使用方法
公开(公告)号：US07105056B2
公开(公告)日：2006-09-12
申请号：US10334054
申请日：2002-12-30
申请人： Klaus Hartig , David Stebbins
发明人： Klaus Hartig , David Stebbins
IPC分类号： B05C19/04
CPC分类号： B65G49/061 , B05B13/0264 , B65G2249/04 , B65G2249/045
摘要： A pneumatic handling and recoating apparatus for handling workpieces, such as glass, is provided. The apparatus utilizes a holding device operatively connected to a vacuum assembly. The holding device engages workpieces by vacuum and subsequently releases them by a burst of gas. The burst of gas also facilitates the application of a coating material, such as a stain-retardant agent, to a workpiece upon release from the holding device.
摘要翻译：提供了用于处理诸如玻璃的工件的气动处理和重涂装置。该装置利用可操作地连接到真空组件的保持装置。保持装置通过真空接合工件，并随后通过气体爆裂而释放它们。气体爆裂也有助于在从保持装置释放时将诸如阻燃剂的涂料施加到工件上。

44. 发明申请

US20050026002A1 Concentration-modulated coatings 有权
标题翻译：浓度调制涂层
公开(公告)号：US20050026002A1
公开(公告)日：2005-02-03
申请号：US10876254
申请日：2004-06-24
申请人： Klaus Hartig
发明人： Klaus Hartig
IPC分类号： C03C17/36 , C23C14/08 , C23C14/56 , B32B17/06 , B32B19/00 , C23C14/32
CPC分类号： C03C17/3613 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3694 , C23C14/086 , C23C14/352 , C23C14/568 , Y10T428/265
摘要： The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.
摘要翻译：本发明提供一种承载低发射率涂层的基片。低辐射涂层包括至少一个分级膜区域。在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

45. 发明申请

US20050016835A1 Soil-resistant coating for glass surfaces 有权
标题翻译：玻璃表面的防锈涂层
公开(公告)号：US20050016835A1
公开(公告)日：2005-01-27
申请号：US10922719
申请日：2004-08-20
申请人： Annette Krisko , Bob Bond , Roger Stanek , Gary Pfaff , Klaus Hartig
发明人： Annette Krisko , Bob Bond , Roger Stanek , Gary Pfaff , Klaus Hartig
IPC分类号： C03C17/245 , C03C17/34 , C03C17/36 , C23C14/10 , C23C14/34 , C23C14/56 , C23C14/32
CPC分类号： C03C17/3618 , C03C17/245 , C03C17/3417 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3681 , C03C2217/213 , C03C2217/75 , C03C2217/77 , C03C2218/154 , C03C2218/365 , C23C14/10 , C23C14/3464 , C23C14/568 , Y10T428/26 , Y10T428/265
摘要： A method and apparatus for coating two sides of a single pane of glass or other substrate in a single pass through a coating apparatus. A sputtering line is provided, this line comprising a series of sputtering chambers. At least one of the chambers comprises a downward sputtering chamber having an upper target. At least one of the chambers comprises an upward sputtering chamber having a lower target. In some embodiments, the upper and lower targets are rotary targets. The coating apparatus advantageously has a plurality of transport rollers for conveying the substrate along the sputtering line. In certain embodiments, a majority of the chambers of the sputtering line are downward sputtering chambers each having only an upper target with no lower target.
摘要翻译：一种用于在单次通过涂布装置的玻璃或其它基板的单层玻璃中涂覆两侧的方法和装置。提供溅射线，该线包括一系列溅射室。至少一个腔室包括具有上靶的向下溅射室。至少一个室包括具有较低靶的向上溅射室。在一些实施例中，上靶和下靶是旋转靶。涂布装置有利地具有多个输送辊，用于沿溅射线输送基板。在某些实施例中，溅射线的大部分腔室是向下的溅射腔室，每个腔室仅具有没有较低靶子的上靶。

46. 发明授权

US5262032A Sputtering apparatus with rotating target and target cooling 失效
标题翻译：具有旋转目标和目标冷却的溅射装置
公开(公告)号：US5262032A
公开(公告)日：1993-11-16
申请号：US918142
申请日：1992-07-23
申请人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
发明人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3405
摘要： A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).
摘要翻译：提出了一种溅射装置，特别是具有磁控管阴极和旋转靶（1）的溅射装置，并且由液体冷却剂（优选水）进行目标冷却，其中提供用于使冷却集中在旋转的区域或区域上暴露于由等离子体（12）产生的热的靶（1）和磁体组件（23）的磁体（28,29,30,31）形成至少一个冷却通道（34,35）。

47. 发明授权

US5170291A Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating 失效
标题翻译：由光学有效层系统组成的用于基板的涂层，由此层系统具有高的抗反射效果，以及制造涂层的方法
公开(公告)号：US5170291A
公开(公告)日：1992-12-08
申请号：US717027
申请日：1991-06-18
申请人： Joachim Szczyrbowski , Klaus Hartig , Wolfgang Lohwasser
发明人： Joachim Szczyrbowski , Klaus Hartig , Wolfgang Lohwasser
IPC分类号： C03C17/34 , G02B1/11
CPC分类号： G02B1/115 , C03C17/3417 , C03C17/3452 , C03C17/347
摘要： A coating for applying to a front side of a substrate, which side is facing an observer, comprises a four-layer system which is optically effective and has a high anti-reflective effect. A first layer of this system is applied onto the front side of the substrate and is, preferably, a highly-refracting TiO.sub.2 layer, the second layer is applied to the first layer and is a low-refracting Al.sub.2 O.sub.3 layer, a third layer of the system is applied to the second layer and is, preferably, a high-refracting TiO.sub.2, while the fourth layer applied to the third layer is, preferably, a low-refracting SiO.sub.2 layer. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical vapor deposition method. Preferably, they are formed by a DC-reactive sputtering method with a magnetron.
摘要翻译：用于施加到基板的前侧的涂层，该涂层面向观察者，包括光学有效并具有高抗反射效果的四层体系。该系统的第一层被施加到基板的正面，并且优选地是高折射率的TiO 2层，第二层施加到第一层，并且是低折射Al 2 O 3层，第三层是系统被施加到第二层，并且优选地是高折射TiO 2，而施加到第三层的第四层优选地是低折射SiO 2层。这些层可以通过热解法，等离子体支持的化学气相沉积法，溅射法或化学气相沉积法形成。优选地，它们由具有磁控管的DC反应溅射法形成。

48. 发明授权

US5090984A Method for producing glass of high transmission in the visible spectral range and low solar energy transmission 失效
标题翻译：在可见光谱范围和低太阳能传输中生产高透射率玻璃的方法
公开(公告)号：US5090984A
公开(公告)日：1992-02-25
申请号：US516810
申请日：1990-04-30
申请人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
发明人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
IPC分类号： C03C17/245 , C03C17/34 , C23C14/08
CPC分类号： C23C14/08 , C03C17/2453 , C03C17/3417
摘要： In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.
摘要翻译：在可见光谱范围内和低太阳能透射率下生产具有高透射率的矿物玻璃片的方法中，通过阴极溅射将涂层溅射到涂覆室中的片材上，其目的为65％锡合金靶和含氧量大气的35％的镍。然后将片和涂层在640℃下加热，然后在加热状态下弯曲，从而产生特别稳定且导电的组合。

49. 发明授权

US4830876A Process for producing contact strips on substrates, especially on glazing 失效
标题翻译：在基材上生产接触条的方法，特别是在玻璃上
公开(公告)号：US4830876A
公开(公告)日：1989-05-16
申请号：US881712
申请日：1986-07-03
申请人： Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
发明人： Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
IPC分类号： C03C17/36 , C03C27/12 , H05B3/84 , H05B3/86
CPC分类号： B32B17/10761 , B32B17/10036 , B32B17/10174 , C03C17/36 , C03C17/3613 , C03C17/3644 , C03C17/3655 , C03C17/3673 , C03C17/3681 , H05B3/84 , H05B3/86 , H05B2203/013 , H05B2203/016 , Y10T428/12597 , Y10T428/12611 , Y10T428/24802 , Y10T428/24917 , Y10T428/24926
摘要： Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.
摘要翻译：在基材上，特别是矿物玻璃板上生产接触条的方法。这些基板设置有导电表面涂层，其涂覆在背离基板的一侧上，并具有至少一个电介质材料的表面层。为了生产接触条，根据本发明，将液体中的贵金属悬浮液以接触条的图案沉积在表面层上。然后将具有一层层的衬底暴露于至少100℃的热处理，直到通过接触片之间的导电表面涂层发生降低的总电阻。

50. 发明授权

US4828872A Method and apparatus for the reactive vapor depositing of metal compounds 失效
标题翻译：用于金属化合物的反应性气相沉积的方法和装置
公开(公告)号：US4828872A
公开(公告)日：1989-05-09
申请号：US906225
申请日：1986-09-11
申请人： Volker Bauer , Albert Feuerstein , Klaus Hartig , Gerhard Kienel , Helmuth Lammermann , Wolfgang Zirkel
发明人： Volker Bauer , Albert Feuerstein , Klaus Hartig , Gerhard Kienel , Helmuth Lammermann , Wolfgang Zirkel
IPC分类号： C23C14/30 , C23C14/00 , C23C14/32
CPC分类号： C23C14/228 , C23C14/0021 , C23C14/32
摘要： A method and apparatus is disclosed for the reactive deposition of vapors of metal compounds onto substrates by the evaporation of at least one metal by means of an electron beam in an atmosphere consisting of the reaction gas, at pressures of no more than 10.sup.-1 mbar. An electrode positively biased with respect to ground and having an acceleration voltage of at least 20 kV is disposed in the area of the vapor stream flowing to the substrate. The metal vapor is produced in an internal chamber which surrounds the evaporator and has a masked orifice opposite the substrate. The reaction gas is introduced into the internal chamber and the metal vapor and reaction gas are guided by the masked orifice toward the substrate.
摘要翻译：公开了一种方法和装置，用于通过在由不大于10-1mbar的压力的反应气体组成的气氛中通过电子束蒸发至少一种金属，将金属化合物的蒸汽反应沉积到基底上。相对于地面正向偏置并具有至少20kV的加速电压的电极设置在流到衬底的蒸汽流的区域中。金属蒸汽在围绕蒸发器的内部室中产生，并具有与基板相对的掩蔽孔。将反应气体引入到内部室中，并且金属蒸气和反应气体被掩蔽的孔朝向衬底引导。

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