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41. 发明申请

US20100128235A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100128235A1
公开(公告)日：2010-05-27
申请号：US12700602
申请日：2010-02-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

42. 发明授权

US09110389B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09110389B2
公开(公告)日：2015-08-18
申请号：US13241837
申请日：2011-09-23
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

43. 发明授权

US08169593B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08169593B2
公开(公告)日：2012-05-01
申请号：US12261663
申请日：2008-10-30
申请人： Franciscus Godefridus Casper Bijnen , Joannes Theodoor De Smit
发明人： Franciscus Godefridus Casper Bijnen , Joannes Theodoor De Smit
IPC分类号： G03B27/42 , G03B27/68 , G03B27/54 , G01B11/00
CPC分类号： G03F7/70291 , G03F7/70791 , G03F9/7003
摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
摘要翻译：一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案，提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位并且使用投影系统将图案化的辐射束投影到基板的目标部分上。该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

44. 发明授权

US07459247B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07459247B2
公开(公告)日：2008-12-02
申请号：US11020561
申请日：2004-12-27
申请人： Fransiscus Godefridus Casper Bijnen , Joannes Theodoor De Smit
发明人： Fransiscus Godefridus Casper Bijnen , Joannes Theodoor De Smit
IPC分类号： G03F9/00
CPC分类号： G03F7/70291 , G03F7/70791 , G03F9/7003
摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
摘要翻译：一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案，提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位并且使用投影系统将图案化的辐射束投影到基板的目标部分上。该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

45. 发明申请

US20090051891A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20090051891A1
公开(公告)日：2009-02-26
申请号：US12261663
申请日：2008-10-30
申请人： Franciscus Godefridus Casper BIJNEN , Joannes Theodoor De Smit
发明人： Franciscus Godefridus Casper BIJNEN , Joannes Theodoor De Smit
IPC分类号： G03B27/80
CPC分类号： G03F7/70291 , G03F7/70791 , G03F9/7003
摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
摘要翻译：一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案，提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位并且使用投影系统将图案化的辐射束投影到基板的目标部分上。该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

46. 发明授权

US08363208B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08363208B2
公开(公告)日：2013-01-29
申请号：US12700602
申请日：2010-02-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

47. 发明授权

US07684008B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684008B2
公开(公告)日：2010-03-23
申请号：US10860662
申请日：2004-06-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03B27/52 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

48. 发明授权

US07317504B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07317504B2
公开(公告)日：2008-01-08
申请号：US10820227
申请日：2004-04-08
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32 , G03C5/00 , B06B1/00
CPC分类号： G03F7/70341
摘要： A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基板之间的成像场。检测并去除从溶解的大气中的液体中形成的液体或暴露于液体的装置元件的气体排出的气泡，使得它们不会干扰曝光并导致基板上的印刷缺陷。检测可以通过测量液体中超声波衰减的频率依赖性进行，气泡去除可以通过对液体进行脱气和加压来实现，使用低表面张力的液体从大气中分离出液体，从而提供连续的液体流通成像领域和相移超声波驻波节点模式。

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