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    • 41. 发明申请
    • Semiconductor storage
    • 半导体存储
    • US20060131642A1
    • 2006-06-22
    • US10530519
    • 2003-10-01
    • Hiroshi IwataAkihide Shibata
    • Hiroshi IwataAkihide Shibata
    • H01L29/792
    • H01L29/66825H01L21/28273H01L21/28282H01L29/66833H01L29/7887H01L29/7923
    • In a semiconductor storage device, a gate insulating film (12) and a gate electrode (13) are laid on a first conductivity type semiconductor substrate (11), and charge holding portions (10A, 10B) are formed on both sides of the gate electrode (13). Second conductivity type first and second diffusion layer regions (17, 18) are formed in regions of the semiconductor substrate (11) corresponding to the charge holding portions (10A, 10B). The charge holding portions (10A, 10B) are each structured so as to change, in accordance with an electric charge amount held in the charge holding portions, a current amount flowing from one of the second conductivity type diffusion layer regions (17, 18) to the other of the diffusion layer regions through a channel region when voltage is applied to the gate electrode (13). Part of each charge holding portion (10A, 10B) is present below an interface of the gate insulating film (12) and the channel region.
    • 在半导体存储装置中,栅极绝缘膜(12)和栅电极(13)被放置在第一导电型半导体基板(11)上,电荷保持部(10A,10B)形成在 栅电极(13)。 第二导电类型的第一和第二扩散层区域(17,18)形成在对应于电荷保持部分(10A,10B)的半导体衬底(11)的区域中。 电荷保持部(10A,10B)分别被构造成根据保持在电荷保持部中的电荷量来改变从第二导电型扩散层区域(17, 18),当电压施加到栅电极(13)时,通过沟道区域到另一个扩散层区域。 每个电荷保持部分(10A,10B)的一部分存在于栅极绝缘膜(12)和沟道区域的界面之下。
    • 43. 发明授权
    • Semiconductor memory device, semiconductor device and methods of manufacturing them, portable electronic equipment, and IC card
    • 半导体存储器件,半导体器件及其制造方法,便携式电子设备和IC卡
    • US07053437B2
    • 2006-05-30
    • US10848214
    • 2004-05-19
    • Hiroshi IwataTakayuki OguraAkihide Shibata
    • Hiroshi IwataTakayuki OguraAkihide Shibata
    • H01L29/76
    • H01L29/66833H01L21/28282H01L27/115H01L29/7923
    • A semiconductor memory device including memory cells, each memory cell including: a gate insulating film formed on a semiconductor substrate; a gate electrode formed on the gate insulating film; a channel region located below the gate electrode; a pair of source and drain regions arranged on a opposite sides, respectively, of the channel region, the source and drain regions having a conductive type opposite to that of the channel region; and memory functional units located on opposite sides, respectively, of the gate electrode, each memory functional unit including a charge retaining portion and an anti-dissipation insulator, the charge retaining portion being made of a material serving to store charges, the anti-dissipation insulator serving to prevent the stored charges from being dissipated by separating the charge retaining portion from both the gate electrode and the substrate, wherein a distance between a side wall of the gate electrode and a side of the charge retaining portion facing each other (T2) is adapted to differ from a distance between a bottom of the charge retaining portion and a surface of the substrate (T1).
    • 一种包括存储单元的半导体存储器件,每个存储单元包括:形成在半导体衬底上的栅极绝缘膜; 形成在栅极绝缘膜上的栅电极; 位于栅电极下方的沟道区; 一对源极和漏极区分别布置在沟道区的相对侧上,源极和漏极区具有与沟道区相反的导电类型; 以及分别位于栅电极的相对侧的存储功能单元,每个存储功能单元包括电荷保持部分和消耗绝缘体,电荷保持部分由用于存储电荷的材料制成,抗耗散 绝缘体,用于通过将电荷保持部分与栅极电极和衬底分离来防止存储的电荷消散,其中栅电极的侧壁和电荷保持部分的面彼此相对的距离(T 2 )适于不同于电荷保持部分的底部和基板(T 1)的表面之间的距离。
    • 44. 发明申请
    • Semiconductor storage device and mobile electronic device
    • 半导体存储设备和移动电子设备
    • US20060109729A1
    • 2006-05-25
    • US10528997
    • 2003-09-10
    • Yoshifumi YaoiHiroshi IwataAkihide ShibataMasaru NawakiKei Tokui
    • Yoshifumi YaoiHiroshi IwataAkihide ShibataMasaru NawakiKei Tokui
    • G11C5/14
    • H01L29/66825H01L21/28273H01L29/7887
    • When an input voltage determining circuit 24 determines that an input voltage exceeds a prescribed voltage, a control circuit 25 of a positive polarity power selector circuit 22 turns on a first switch SW1 and turns off second and third switches SW2 and SW3, thereby supplying the input voltage to a memory cell array 21 via the first switch SW1. When the input voltage determining circuit 24 determines that the input voltage is not higher than the prescribed voltage, the control circuit 25 turns off the first switch SW1 and turns on the second and third switches SW2 and SW3, thereby supplying a voltage from a charge pump 23 via the second and third switches SW2 and SW3. By this operation, the memory element is able to retain storage of two bits or more even if miniaturized, to execute stable operation with a small circuit area and to prevent circuit malfunction attributed to a small current supplied to the memory cell array.
    • 当输入电压确定电路24确定输入电压超过规定电压时,正极性功率选择电路22的控制电路25接通第一开关SW 1并关断第二和第三开关SW 2和SW 3,由此 通过第一开关SW 1将输入电压提供给存储单元阵列21。 当输入电压确定电路24确定输入电压不高于规定电压时,控制电路25关断第一开关SW 1并接通第二和第三开关SW 2和SW 3,从而提供来自 经由第二和第三开关SW 2和SW 3的电荷泵23。 通过该操作,即使小型化,存储元件也能够保持两位以上的存储,能够以较小的电路面积进行稳定的动作,并且防止归因于提供给存储单元阵列的小电流引起的电路故障。
    • 45. 发明授权
    • Semiconductor memory device and portable electronic apparatus
    • 半导体存储器件和便携式电子设备
    • US07009892B2
    • 2006-03-07
    • US10850896
    • 2004-05-20
    • Yoshinao MorikawaMasaru NawakiHiroshi IwataAkihide Shibata
    • Yoshinao MorikawaMasaru NawakiHiroshi IwataAkihide Shibata
    • G11C7/00
    • H01L29/66833G11C7/22G11C16/0475G11C16/0491G11C16/10H01L21/28282H01L29/7923
    • A semiconductor memory device includes a control logic circuit for generating read selection signals each selecting one plane for reading and write selection signals each selecting one plane for writing from a plurality of planes in which memory cells are arranged in an array, an address selection circuit disposed for each of the planes, and an address buffer circuit for simultaneously providing a write address and a read address. Each of the address selection circuits is configured so as to be able to receive one of the read selection signals and one of the write selection signals from the control logic circuit. The memory cell includes a gate electrode formed over a semiconductor layer via a gate insulating film, a channel region disposed below the gate electrode, diffusion regions disposed on both sides of the channel region and having a conductive type opposite to that of the channel region, and memory functional units formed on both sides of the gate electrode and having the function of retaining charges.
    • 一种半导体存储器件,包括用于产生读取选择信号的控制逻辑电路,每个读取选择信号选择一个平面用于读取和写入选择信号,每个选择信号从阵列中排列存储器单元的多个平面中选择一个写入平面,地址选择电路设置 以及用于同时提供写入地址和读取地址的地址缓冲器电路。 每个地址选择电路被配置为能够从控制逻辑电路接收读取选择信号中的一个和写入选择信号中的一个。 存储单元包括通过栅极绝缘膜形成在半导体层上的栅极电极,设置在栅极电极下方的沟道区域,设置在沟道区域两侧并具有与沟道区域相反的导电类型的扩散区域, 以及形成在栅电极的两侧并具有保持电荷的功能的存储功能单元。
    • 46. 发明授权
    • Driver circuit for semiconductor storage device and portable electronic apparatus
    • 用于半导体存储设备和便携式电子设备的驱动电路
    • US06992926B2
    • 2006-01-31
    • US10848605
    • 2004-05-19
    • Yasuaki IwaseYoshifumi YaoiHiroshi IwataAkihide ShibataYoshinao MorikawaMasaru Nawaki
    • Yasuaki IwaseYoshifumi YaoiHiroshi IwataAkihide ShibataYoshinao MorikawaMasaru Nawaki
    • G11C16/06
    • H01L21/28282G11C16/08H01L29/792
    • A semiconductor storage device is provided with a gate electrode, a semiconductor layer, a gate insulating film sandwiched between the gate electrode and the semiconductor layer, a channel region under the gate electrode, diffusion regions provided respectively on two sides of the channel regions and being of the other conductivity region than the channel region, memory elements 1 provided respectively on two sides of the gate electrode and having a function of holding charges, and a word line driver circuit, in which the CMOS technique is used. The driver circuit includes a common node for supplying a potential for activating an output inverter for driving a row word line. While the semiconductor storage device is in a read mode, a CMOS inverter other than the output inverter controls a signal at the common node, the CMOS inverter connected to a read input line. While the semiconductor storage device is in writing/erasing mode, a plurality of writing/erasing transistors connected in series to the node are activated in accordance with an address signal, in order to lower the common node to a low potential.
    • 半导体存储装置设置有栅电极,半导体层,夹在栅极电极和半导体层之间的栅极绝缘膜,栅电极下方的沟道区域,分别设置在沟道区域的两侧的扩散区域, 的另一个导电区域,分别设置在栅电极的两侧并具有保持电荷的功能的存储元件1和使用CMOS技术的字线驱动电路。 驱动器电路包括用于提供用于激活用于驱动行字线的输出反相器的电位的公共节点。 当半导体存储装置处于读取模式时,除了输出反相器之外的CMOS反相器控制公共节点处的信号,CMOS反相器连接到读取输入线。 当半导体存储装置处于写入/擦除模式时,根据地址信号激活与该节点串联连接的多个写/擦除晶体管,以便将公共节点降低到低电位。
    • 50. 发明授权
    • Vertical probe card
    • 垂直探针卡
    • US06853208B2
    • 2005-02-08
    • US09851946
    • 2001-05-10
    • Masao OkuboKazumasa OkuboHiroshi Iwata
    • Masao OkuboKazumasa OkuboHiroshi Iwata
    • G01R31/26G01R1/073G01R3/00H01L21/66G01R31/02
    • G01R1/07357G01R3/00
    • Purpose: To present a vertical probe card capable of reusing without replacing a broken probe if a probe is broken. Constitution: A vertical probe card having vertical probes 100, being used in measurement of electric characteristics of an LSI chip 610 to be measured, comprising a main substrate 300 forming conductive patterns 310, a plurality of probes 100 drooping vertically from the main substrate 300, and a probe support 200 provided at the back side of the main substrate 300 for supporting the probes 100, in which the probe support 200 is disposed parallel to the main substrate 300, and has an upper guide plate 210 and a lower guide plate 220 for supporting the probes 100 by passing the through-holes 211,221 opened in each, and the lower guide plate 220 is composed of three substrates 220A, 220B, 220C laminated separably.
    • 目的:提供一个能够重复使用的垂直探针卡,而不会在探头损坏时更换损坏的探头。 结构:具有垂直探针100的垂直探针卡,用于测量要测量的LSI芯片610的电特性,包括形成导电图案310的主基板300,从主基板300垂直下垂的多个探针100, 以及设置在主基板300的背侧的探针支撑件200,用于支撑探针支撑件200平行于主基板300设置的探针100,并且具有上引导板210和下引导板220, 通过使每个开放的通孔211,221通过来支撑探针100,下引导板220由可分离地层叠的三个基板220A,220B,220C组成。