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    • 43. 发明申请
    • THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING THIN-FILM TRANSISTOR
    • 薄膜晶体管及制造薄膜晶体管的方法
    • US20140167165A1
    • 2014-06-19
    • US14236698
    • 2013-05-29
    • Yuji KishidaEiichi SatohTakahiro Kawashima
    • Yuji KishidaEiichi SatohTakahiro Kawashima
    • H01L29/786H01L29/66
    • H01L29/786H01L21/76829H01L27/1248H01L27/3262H01L29/66742H01L29/66765
    • A thin-film transistor includes: a gate electrode above a substrate; a gate insulating layer above the gate electrode; a semiconductor layer opposed to the gate electrode with the gate insulating layer therebetween; a protective layer above the semiconductor layer and comprising an organic material; and a source electrode and a drain electrode each of which has at least a portion located above the protective layer. The protective layer includes an altered layer which has at least a portion contacting the semiconductor layer, and which is generated by alteration of a surface layer of the protective layer in a region exposed from the source electrode and the drain electrode. A relational expression of Log10 Nt≦0.0556θ+16.86 is satisfied where Nt (cm−3) represents a defect density of the semiconductor layer and θ (°) represents a taper angle of an edge portion of the protective layer.
    • 薄膜晶体管包括:在基板上方的栅电极; 栅电极上方的栅极绝缘层; 与栅电极相对的半导体层,其间具有栅极绝缘层; 在所述半导体层上方的保护层,并且包含有机材料; 以及源极电极和漏极电极,每个源电极和漏电极具有位于保护层上方的至少一部分。 保护层包括具有至少部分与半导体层接触的部分的改变的层,其是通过在从源电极和漏电极露出的区域中改变保护层的表面层而产生的。 在Nt(cm-3)表示半导体层的缺陷密度和厚度的情况下,满足Log10 Nt≦̸ 0.0556&het; +16.86的关系式; (°)表示保护层的边缘部的锥角。
    • 45. 发明授权
    • Photoelectric smoke sensor
    • 光电烟雾传感器
    • US08510068B2
    • 2013-08-13
    • US12957694
    • 2010-12-01
    • Takahiro Kawashima
    • Takahiro Kawashima
    • G01R35/00
    • G08B17/107G08B29/26
    • Provided is a photoelectric smoke sensor capable of correcting a sensitivity according to a state of contamination. The photoelectric smoke sensor includes: a storage section (6) for storing a zero detection value VN and an initial zero detection value; a moving average value calculating section (51) for calculating a moving average value of detection AD values output from a detection portion (1, 2, 3); a zero detection value updating section (52) for calculating a new zero detection value VN when a sensitivity of the detection portion is decreased as compared with that in an initial state, and in addition, when a rate of change in the moving average value with respect to the zero detection value VN exceeds a predetermined value; a detection AD value correcting section (53) for correcting the detection value; and a smoke-density computing section (54) for converting the corrected detection value into smoke-density data.
    • 提供一种能够根据污染状态来校正灵敏度的光电烟雾传感器。 光电烟雾传感器包括:用于存储零检测值VN和初始零检测值的存储部分(6); 移动平均值计算部(51),用于计算从检测部(1,2,3)输出的检测AD值的移动平均值; 零检测值更新部(52),用于当检测部的灵敏度与初始状态相比降低时,计算新的零检测值VN,另外,当移动平均值的变化率与 相对于零检测值VN超过预定值; 用于校正检测值的检测用AD值校正部(53) 以及用于将校正的检测值转换为烟浓度数据的烟浓度计算部(54)。
    • 48. 发明申请
    • FIELD EFFECT TRANSISTOR
    • 场效应晶体管
    • US20100001259A1
    • 2010-01-07
    • US12305824
    • 2007-06-18
    • Tohru SaithoTakahiro Kawashima
    • Tohru SaithoTakahiro Kawashima
    • H01L29/66
    • H01L29/78696B82Y10/00H01L29/0665H01L29/0673H01L29/068H01L29/41733H01L29/66772H01L29/78621H01L29/78654
    • A source electrode 105 which is connected to a portion of at least one semiconductor nanostructure 103 among a plurality of semiconductor nanostructures, a drain electrode 106 connected to another portion of the semiconductor nanostructure 103, and a gate electrode 102 capable of controlling electrical conduction of the semiconductor nanostructure 103 are included. The semiconductor nanostructures 103 include a low concentration region 108 having a relatively low doping concentration and a pair of high concentration regions 107 having a higher doping concentration than that of the low concentration region 108 and being connected to both ends of the low concentration region 108. The doping concentration of the high concentration regions 107 is 1×1019 cm−3 or more; the length of the low concentration region 108 is shorter than a length of the gate electrode 102 along a direction from the source electrode 105 to the drain electrode 106; and the length of the gate electrode 102 is shorter than the interspace between the source electrode 105 and the drain electrode 106.
    • 连接到多个半导体纳米结构中的至少一个半导体纳米结构103的一部分的源电极105,连接到半导体纳米结构103的另一部分的漏电极106和能够控制半导体纳米结构103的导电的栅电极102 包括半导体纳米结构103。 半导体纳米结构103包括具有相对低的掺杂浓度的低浓度区域108和具有比低浓度区域108的掺杂浓度更高的掺杂浓度的一对高浓度区域107并且连接到低浓度区域108的两端。 高浓度区域107的掺杂浓度为1×10 19 cm -3以上; 低浓度区域108的长度比沿源极电极105至漏电极106的方向的栅电极102的长度短; 并且栅电极102的长度比源电极105和漏电极106之间的间隙短。