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    • 41. 发明授权
    • Cleaning method of treatment equipment and treatment equipment
    • 处理设备和处理设备的清洁方法
    • US07172657B2
    • 2007-02-06
    • US09801825
    • 2001-03-09
    • Yasuhiko KojimaYasuhiro Oshima
    • Yasuhiko KojimaYasuhiro Oshima
    • B08B3/10B08B9/00
    • C23C16/4405
    • In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.
    • 在处理设备的处理室的内部被抽真空的状态下,其中提供含有三氟乙酸(TFA)作为清洁剂的清洁气体。 当形成互连或电极并且在与清洁气体中的清洁剂(TFA)接触时粘附在处理室的内壁表面上的金属,例如铜,而不形成氧化物或金属盐 ,直接复合。 复合体由于排空而升华,并在处理室外排出。 因此,以较少的劳动力和低成本,可以有效地实施清洁。