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    • 44. 发明授权
    • Video encoder and video decoder
    • 视频编码器和视频解码器
    • US09078006B2
    • 2015-07-07
    • US13541220
    • 2012-07-03
    • Hidenobu MiyoshiAkira Nakagawa
    • Hidenobu MiyoshiAkira Nakagawa
    • H04N11/02H04N19/573H04N19/176H04N19/13H04N19/146
    • H04N19/573H04N19/13H04N19/146H04N19/176
    • A video encoder includes: a motion compensation picture signal generator that generates a plurality of motion compensation picture signals in accordance with an encoding target signal and a plurality of reference pictures; a prediction signal generator that generates a prediction signal of the encoding target signal using the motion compensation picture signals; a prediction error signal generator that generates a prediction error signal representing a difference between the encoding target signal and the prediction signal; a selector that selects an entropy code assignment rule that is expected to minimize an information amount of an encoded state of the prediction error signal from a plurality of entropy code assignment rules for encoding the prediction error signal in accordance with the motion compensation picture signals; and an entropy encoder that generates encoded information from the prediction error signal in accordance with the selected entropy code assignment rule.
    • 视频编码器包括:运动补偿图像信号发生器,其根据编码目标信号和多个参考图像产生多个运动补偿图像信号; 预测信号发生器,其使用运动补偿图像信号生成编码对象信号的预测信号; 预测误差信号发生器,其生成表示编码对象信号与预测信号之间的差的预测误差信号; 选择器,根据运动补偿图像信号,从多个用于编码预测误差信号的熵码分配规则中选择期望使预测误差信号的编码状态的信息量最小化的熵码分配规则; 以及熵编码器,其根据所选择的熵码分配规则从所述预测误差信号生成编码信息。
    • 49. 发明授权
    • Moving-picture coding device and moving-picture coding method
    • 运动图像编码装置和运动图像编码方法
    • US08306338B2
    • 2012-11-06
    • US12171130
    • 2008-07-10
    • Akira NakagawaHidenobu MiyoshiKimihiko KazuiHisanari Kimura
    • Akira NakagawaHidenobu MiyoshiKimihiko KazuiHisanari Kimura
    • G06K9/36
    • H04N19/55H04N19/105H04N19/107H04N19/16H04N19/17H04N19/174H04N19/186H04N19/523
    • A moving-picture coding device that performs inter-field motion compensation prediction, includes a reference limit area determining unit that determines to select, for each reference picture, with respect to reference pictures used for coding, a luminance or chrominance reference limit area putting a limit to a reference picture used for generating a prediction picture of a luminance or chrominance of a coding target block belonging to the coding target picture limit area of the case upon each reference picture being previously coded; a selecting inhibit vector determining unit that determines, in a case of coding the coding block belonging to the coding target picture limit area, a selecting inhibit vector that inhibits selecting a luminance and the chrominance are comprised only of pixels of the luminance reference limit area and the chrominance reference limit area.
    • 执行场间运动补偿预测的运动图像编码装置包括参考限制区域确定单元,其确定对于每个参考图像,对于用于编码的参考图像,将亮度或色度参考限制区域放入 限制为用于生成属于预先对每个参考图像进行编码的情况的编码对象图像限制区域的编码对象块的亮度或色度的预测图像的参考图像; 选择禁止向量确定单元,其在对编码对象图像限制区域的编码块进行编码的情况下,决定禁止选择亮度和色度的选择禁止矢量,仅包含亮度基准极限区域的像素, 色度参考极限区域。
    • 50. 发明申请
    • PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
    • 等离子体蚀刻方法和计算机可读存储介质
    • US20120225502A1
    • 2012-09-06
    • US13410432
    • 2012-03-02
    • Akira Nakagawa
    • Akira Nakagawa
    • H01L21/66H01L21/3065
    • H01L21/31116H01L21/31144
    • A plasma etching method includes a preparation process for performing a plasma etching process using a processing gas including a first processing gas containing carbon (C) and fluorine (F), a ratio (C/F) of the first processing gas having a first value, and obtaining a residual amount of the mask layer corresponding to a variation point where a variation amount of the bowing CD is increased; a first plasma etching process using the processing gas including the first processing gas until a residual amount of the mask layer reaches the variation point; and a second plasma etching process performed after the first plasma etching process. The second plasma etching process is performed by using a processing gas including at least a second processing gas containing carbon (C) and fluorine (F), and a ratio (C/F) of the second processing gas is smaller than the first value.
    • 等离子体蚀刻方法包括使用包含含有碳(C)和氟(F)的第一处理气体的处理气体进行等离子体蚀刻处理的准备工序,第一处理气体的比率(C / F) 并且获得与弯曲CD的变化量增加的变化点对应的掩模层的残留量; 使用包括第一处理气体的处理气体直到掩模层的残留量达到变化点的第一等离子体蚀刻工艺; 以及在第一等离子体蚀刻工艺之后执行的第二等离子体蚀刻工艺。 通过使用至少包含碳(C)和氟(F)的第二处理气体的处理气体,第二处理气体的比(C / F)小于第一等级蚀刻工艺。