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    • 49. 发明授权
    • Thin read gap magnetoresistive (MR) sensor element and method for fabrication thereof
    • 薄读磁隙(MR)传感元件及其制造方法
    • US06307721B1
    • 2001-10-23
    • US09148558
    • 1998-09-04
    • Mao-Min ChenCherng-Chyi HanCheng T. Horng
    • Mao-Min ChenCherng-Chyi HanCheng T. Horng
    • G11B539
    • G11B5/3954G11B5/3903
    • A magnetoresistive (MR) sensor element and a method for fabricating the magnetoresistive (MR) sensor element. There is first provided a substrate. There is then formed over the substrate a first shield layer. There is then formed upon the first shield layer a first dielectric spacer layer. There is then formed upon the first dielectric spacer layer a patterned magnetoresistive (MR) layer. There is then formed adjacent to and electrically communicating with a pair of opposite ends of the patterned magnetoresistive (MR) layer a pair of patterned conductor lead layers to define a trackwidth of the patterned magnetoresistive (MR) layer. There is then formed upon the pair of patterned conductor lead layers and upon the patterned magnetoresistive (MR) layer at the trackwidth of the patterned magnetoresistive (MR) layer a blanket second dielectric spacer layer. Finally, there is then formed upon the blanket second dielectric spacer layer a second shield layer, where a first thickness of the blanket second dielectric spacer layer separating a patterned conductor lead layer within the pair of patterned conductor lead layers from the second shield layer is greater than a second thickness of the blanket second dielectric spacer layer separating the patterned magnetoresistive (MR) layer from the second shield layer within the trackwidth of the patterned magnetoresistive (MR) layer. The method contemplates a magnetoresistive (MR) sensor element fabricated in accord with the method.
    • 磁阻(MR)传感器元件和制造磁阻(MR)传感器元件的方法。 首先提供基板。 然后在衬底上形成第一屏蔽层。 然后在第一屏蔽层上形成第一电介质隔离层。 然后在第一电介质隔离层上形成图案化磁阻(MR)层。 然后形成为与图案化磁阻(MR)层的一对相对端相邻并与其电连通一对图案化的导体引线层,以限定图案化磁阻(MR)层的轨道宽度。 然后形成在一对图案化导体引线层上,并且在图案化磁阻(MR)层的轨道宽度处的图案化磁阻(MR)层上形成毯式第二介电隔离层。 最后,然后在第二绝缘间隔层上形成第二屏蔽层,其中第一厚度的第二绝缘隔离层将第一屏蔽层内的图案化导体引线层中的图案化导体引线层分离, 比在图案化磁阻(MR)层的轨道宽度内将图案化磁阻(MR)层与第二屏蔽层分离的第二厚度的第二介电隔离层的厚度。 该方法考虑了根据该方法制造的磁阻(MR)传感器元件。