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    • 43. 发明授权
    • Light-emitting diode with non-metallic reflector
    • 具有非金属反射器的发光二极管
    • US08525200B2
    • 2013-09-03
    • US12269497
    • 2008-11-12
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • H01L33/00H01L21/00
    • H01L33/16H01L33/0079H01L33/10
    • A light-emitting diode (LED) device is provided. The LED device has a substrate, a reflective structure over the substrate, and an LED structure over the reflective structure. The reflective structure is formed of non-metallic materials. In one embodiment, the reflective structure is formed of alternating layers of different non-metallic materials having different refractive indices. In another embodiment, the reflective structure is formed of alternating layers of high-porosity silicon and low-porosity silicon. In yet another embodiment, the reflective structure is formed of silicon dioxide, which may allow the use of fewer layers. The reflective structure may be formed directly on the same substrate as the LED structure or formed on a separate substrate and then bonded to the LED structure.
    • 提供了一种发光二极管(LED)装置。 LED器件具有衬底,衬底上的反射结构以及反射结构上的LED结构。 反射结构由非金属材料形成。 在一个实施例中,反射结构由具有不同折射率的不同非金属材料的交替层形成。 在另一个实施例中,反射结构由高孔隙率硅和低孔隙率硅的交替层形成。 在另一个实施例中,反射结构由二氧化硅形成,其可以允许使用更少的层。 反射结构可以直接形成在与LED结构相同的基板上,或者形成在单独的基板上,然后结合到LED结构。
    • 46. 发明申请
    • Wafer Dicing Methods
    • 晶圆切片方法
    • US20100015782A1
    • 2010-01-21
    • US12175818
    • 2008-07-18
    • Chen-Hua YuWen-Chih ChiouDing-Yuan Chen
    • Chen-Hua YuWen-Chih ChiouDing-Yuan Chen
    • H01L21/00
    • H01L21/78H01L33/0095
    • Semiconductor wafer dicing methods are disclosed. These methods include forming etch patterns between adjacent semiconductor dice to be separated. Various etch processes can be used to form the etch patterns. The etch patterns generally reach a pre-determined depth into the wafer substrate significantly beyond the wafer top layer where pre-fabricated semiconductor dice are embedded. Semiconductor dice may be separated from a post-etch, large-sized, frangible wafer through wafer grinding, mechanical cleaving, and laser dicing approaches. Preferred embodiments result in reduced wafer-dicing related device damage and improved product yield.
    • 公开了半导体晶片切割方法。 这些方法包括在相邻半导体晶片之间形成待分离的蚀刻图案。 可以使用各种蚀刻工艺来形成蚀刻图案。 蚀刻图案通常达到晶片衬底的预定深度,显着超过嵌入预制半导体晶片的晶片顶层。 半导体晶片可以通过晶片研磨,机械切割和激光切割方法与后蚀刻,大尺寸的易碎晶片分离。 优选的实施例导致晶片切割相关装置损坏减少和产品产量提高。
    • 48. 发明授权
    • Light-emitting diode with current-spreading region
    • 具有电流扩展区域的发光二极管
    • US08399273B2
    • 2013-03-19
    • US12539757
    • 2009-08-12
    • Ding-Yuan ChenChen-Hua YuWen-Chih Chiou
    • Ding-Yuan ChenChen-Hua YuWen-Chih Chiou
    • H01L21/00
    • H01L33/145H01L33/0066H01L33/04H01L33/06H01L33/30H01L33/36H01L33/62H01L2933/0066
    • A light-emitting diode (LED) device is provided. The LED device has a lower LED layer and an upper LED layer with a light-emitting layer interposed therebetween. A current blocking layer is formed in the upper LED layer such that current passing between an electrode contacting the upper LED layer flows around the current blocking layer. When the current blocking layer is positioned between the electrode and the light-emitting layer, the light emitted by the light-emitting layer is not blocked by the electrode and the light efficiency is increased. The current blocking layer may be formed by converting a portion of the upper LED layer into a resistive region. In an embodiment, ions such as magnesium, carbon, or silicon are implanted into the upper LED layer to form the current blocking layer.
    • 提供了一种发光二极管(LED)装置。 LED装置具有较低的LED层和位于其间的发光层的上部LED层。 在上LED层中形成电流阻挡层,使得在与上层LED层接触的电极之间的电流流过电流阻挡层。 当电流阻挡层位于电极和发光层之间时,由发光层发射的光不被电极阻挡,并且光效率增加。 可以通过将上部LED层的一部分转换成电阻区域来形成电流阻挡层。 在一个实施方案中,诸如镁,碳或硅的离子注入上层LED层以形成电流阻挡层。