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    • 41. 发明申请
    • X-RAY APPARATUS WITH DUAL MONOCHROMATORS
    • 具有双重单色器的X射线设备
    • US20060115047A1
    • 2006-06-01
    • US11000053
    • 2004-12-01
    • Boris Yokhin
    • Boris Yokhin
    • G01N23/20G01N23/201
    • G01N23/201
    • X-ray apparatus, consisting of a single X-ray tube which is adapted to generate X-rays and a first optic which is adapted to focus a first portion of the X-rays onto a region of a sample via a first beam path, thereby generating first scattered X-rays from the region. The apparatus also includes a second optic which is adapted to focus a second portion of the X-rays onto the region of the sample via a second beam path, different from the first beam path, thereby generating second scattered X-rays from the region. A detector assembly simultaneously collects the first and the second scattered X-rays.
    • X射线装置由适于产生X射线的单个X射线管和适于将X射线的第一部分经由第一光束路径聚焦到样品的区域上的第一光学元件组成, 从而从该区域产生第一散射X射线。 该装置还包括第二光学器件,其适于通过不同于第一光束路径的第二光束路径将X射线的第二部分聚焦到样品的区域上,从而从该区域产生第二散射X射线。 检测器组件同时收集第一和第二散射X射线。
    • 46. 发明授权
    • X-ray apparatus with dual monochromators
    • 具有双重单色仪的X射线设备
    • US07076024B2
    • 2006-07-11
    • US11000053
    • 2004-12-01
    • Boris Yokhin
    • Boris Yokhin
    • G01N23/20
    • G01N23/201
    • X-ray apparatus, consisting of a single X-ray tube which is adapted to generate X-rays and a first optic which is adapted to focus a first portion of the X-rays onto a region of a sample via a first beam path, thereby generating first scattered X-rays from the region. The apparatus also includes a second optic which is adapted to focus a second portion of the X-rays onto the region of the sample via a second beam path, different from the first beam path, thereby generating second scattered X-rays from the region. A detector assembly simultaneously collects the first and the second scattered X-rays.
    • X射线装置由适于产生X射线的单个X射线管和适于将X射线的第一部分经由第一光束路径聚焦到样品的区域上的第一光学元件组成, 从而从该区域产生第一散射X射线。 该装置还包括第二光学器件,其适于通过不同于第一光束路径的第二光束路径将X射线的第二部分聚焦到样品的区域上,从而从该区域产生第二散射X射线。 检测器组件同时收集第一和第二散射X射线。
    • 50. 发明授权
    • Inspection of small features using X-ray fluorescence
    • 使用X射线荧光检查小特征
    • US07653174B2
    • 2010-01-26
    • US12003215
    • 2007-12-20
    • Isaac MazorDavid BermanBoris YokhinAlexander Tokar
    • Isaac MazorDavid BermanBoris YokhinAlexander Tokar
    • G01N23/223
    • G01N23/223G01N2223/076
    • A method for inspection includes irradiating a sample using an X-ray beam, which is focused so as to define a spot on a surface of the sample. At least one of the sample and the X-ray beam is shifted so as to scan the spot along a scan path that crosses a feature on the surface. Respective intensities of X-ray fluorescence emitted from the sample responsively to the X-ray beam are measured at a plurality of locations along the scan path, at which the spot has different, respective degrees of overlap with the feature. The intensities measured at the plurality of the locations are processed in order to compute an adjusted value of the emitted X-ray fluorescence over the scan path. A thickness of the feature is estimated based on the adjusted value.
    • 一种检查方法包括:使用聚焦的X射线束照射样品,以便在样品的表面上限定斑点。 样本和X射线束中的至少一个被移动,以沿着与表面上的特征交叉的扫描路径扫描斑点。 在沿着扫描路径的多个位置处测量从样品响应于X射线束发射的X射线荧光的相应强度,其中斑点与特征具有不同的重叠程度。 处理在多个位置处测量的强度,以便计算扫描路径上发射的X射线荧光的调整值。 基于调整值估计特征的厚度。