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    • 45. 发明申请
    • Layout structure in semiconductor memory device and layout method therefor
    • 半导体存储器件的布局结构及其布局方法
    • US20060226459A1
    • 2006-10-12
    • US11316871
    • 2005-12-27
    • Hyung-Rok OhSang-Beom KangDu-Eung Kim
    • Hyung-Rok OhSang-Beom KangDu-Eung Kim
    • H01L29/94
    • G11C7/18G11C5/063G11C13/0004G11C2213/72H01L27/24
    • A line layout structure and method in a semiconductor memory device having a hierarchical structure are provided. In a semiconductor memory device having a global word line and a local word line, and a global bit line and a local bit line, and individually disposing all of the global word line, the local word line, the global bit line and the local bit line at conductive layers among at least three layers; at least two of the global word line, the local word line, the global bit line and the local bit line are together disposed in parallel on one conductive layer. Signal lines constituting a semiconductor memory device are disposed in a hierarchical structure, whereby a semiconductor memory device advantageously having high integration, high speed and high performance may be obtained.
    • 提供了具有层次结构的半导体存储器件中的线路布局结构和方法。 在具有全局字线和本地字线以及全局位线和局部位线的半导体存储器件中,并且单独地布置全局全局字线,局部字线,全局位线和局部位 在至少三层中的导电层上线; 全局字线,本地字线,全局位线和局部位线中的至少两个在一个导电层上一并设置。 构成半导体存储器件的信号线以分层结构设置,从而可以获得有利地具有高集成度,高速度和高性能的半导体存储器件。