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41. 发明授权

US06961116B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06961116B2
公开(公告)日：2005-11-01
申请号：US10456972
申请日：2003-06-09
申请人： Arie Jeffrey Den Boef , Maarten Hoogerland , Boguslaw Gajdeczko
发明人： Arie Jeffrey Den Boef , Maarten Hoogerland , Boguslaw Gajdeczko
IPC分类号： G01B9/02 , G01B11/00 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/72
CPC分类号： G03F9/7088 , G03B27/32 , G03F9/7049 , G03F9/7076 , Y10T428/24802
摘要： An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
摘要翻译：对准系统使用自参考干涉仪，其产生对准标记物的两个重叠和相对旋转的图像。检测器检测在使图像的傅立叶变换被干扰的光瞳平面中的强度。位置信息是从两个图像的衍射级之间的相位差导出的，其表现为受干扰顺序的强度变化。也可以通过在衍射级的任一侧的两个位置处测量强度来测量不对称性。

42. 发明授权

US09625811B2 Imprint lithography 有权
公开(公告)号：US09625811B2
公开(公告)日：2017-04-18
申请号：US13513807
申请日：2010-10-01
申请人： Sander Frederik Wuister , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman
发明人： Sander Frederik Wuister , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00 , G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , Y10T428/24479
摘要： An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.

43. 发明授权

US08830447B2 Inspection method for lithography 有权
标题翻译：光刻检验方法
公开(公告)号：US08830447B2
公开(公告)日：2014-09-09
申请号：US13264256
申请日：2010-05-04
申请人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
发明人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70641
摘要： A method is used to determine focus of a lithographic apparatus used in a lithographic process on a substrate. The lithographic process is used to form at least two periodic structures on the substrate. Each structure has at least one feature that has an asymmetry between opposing side wall angles that varies as a different function of the focus of the lithographic apparatus on the substrate. A spectrum produced by directing a beam of radiation onto the at least two periodic structures is measured and ratios of the asymmetries are determined. The ratios and a relationship between the focus and the side wall asymmetry for each structure is used to determine the focus of the lithographic apparatus on the substrate.
摘要翻译：使用一种方法来确定在光刻工艺中使用的光刻设备在基板上的焦点。光刻工艺用于在衬底上形成至少两个周期性结构。每个结构具有至少一个特征，其具有相对的侧壁角度之间的不对称性，所述相对侧壁角度随着光刻设备在基底上的焦点的不同功能而变化。测量通过将辐射束引导到至少两个周期性结构上产生的光谱，并且确定不对称性的比率。使用每个结构的焦点和侧壁不对称之间的比率和关系来确定光刻设备在基底上的焦点。

44. 发明授权

US08593646B2 Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：测量方法，测量仪器，光刻设备和器件制造方法
公开(公告)号：US08593646B2
公开(公告)日：2013-11-26
申请号：US13369614
申请日：2012-02-09
申请人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
发明人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
IPC分类号： G01B11/14 , G01B11/00
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.
摘要翻译：设备（AS）测量光刻基板（W）上的标记（202）的位置。测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记）。该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。

45. 发明授权

US08454849B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08454849B2
公开(公告)日：2013-06-04
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
IPC分类号： B44C1/22 , C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译：公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。

46. 发明授权

US08411287B2 Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate 有权
标题翻译：测量方法和设备，光刻设备，器件制造方法和衬底
公开(公告)号：US08411287B2
公开(公告)日：2013-04-02
申请号：US12855394
申请日：2010-08-12
申请人： Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
发明人： Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
IPC分类号： G01B11/14
CPC分类号： G03F7/70633 , G03F7/70616
摘要： A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.
摘要翻译：计量装置被布置成以离轴照明模式照亮多个目标。仅使用一个一阶衍射光束获得目标图像。在目标是复合光栅的地方，可以从不同光栅的图像的强度获得覆盖测量。可以对由图像场中的光栅位置的变化引起的误差来校正叠加测量。

47. 发明授权

US08363218B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US08363218B2
公开(公告)日：2013-01-29
申请号：US12727389
申请日：2010-03-19
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An overlay error between two successive layers produced by a lithographic process on a substrate is determined by using the lithographic process to form at least one periodic structure of a same pitch on each of the layers. One or more overlaid pairs of the periodic structures are formed in parallel, but offset relative to each other. A spectrum, produced by directing a beam of radiation onto the one or more pairs of periodic structures is measured. One or more portions of the spectrum are determined in which the relationship between the offset between the one or more pairs of periodic structures and the resultant variation in measured intensity of the spectrum at the one or more portions is more linear than the relationship outside the one or more portions. The offset between the one or more pairs of periodic structures on the basis of intensity measurements of the spectrum in the one or more portions of the spectrum is determined and used to determine the overlay error.
摘要翻译：通过使用光刻工艺在每个层上形成相同间距的至少一个周期性结构来确定由基板上的光刻工艺产生的两个连续层之间的重叠误差。一个或多个重叠的周期结构对平行地形成，但是相对于彼此偏移。测量通过将辐射束引导到一对或多对周期性结构上而产生的光谱。确定光谱的一个或多个部分，其中在一个或多个部分之间的一个或多个周期性结构对之间的偏移与所测量的光谱强度之间的关系之间的关系比一个或多个部分之外的关系更线性或更多部分。基于频谱的一个或多个部分中的频谱的强度测量确定一对或多对周期性结构之间的偏移，并用于确定覆盖误差。

48. 发明授权

US08339595B2 Diffraction based overlay metrology tool and method 有权
$Diffraction based overlay metrology tool and method$
标题翻译：基于衍射的覆盖计量工具和方法
公开(公告)号：US08339595B2
公开(公告)日：2012-12-25
申请号：US12747795
申请日：2008-12-09
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G03F7/7015 , G03F7/70633
摘要： Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.
摘要翻译：提供了系统，方法和装置，用于确定衬底上的图案的覆盖层，其中掩模图案限定在衬底上图案顶部上的抗蚀剂层中。第一光栅设置在第二光栅下方，每个具有与另一光栅基本相同的间距，一起形成复合光栅。沿着第一水平方向以入射角设置第一照明光束。测量来自复合光栅的衍射光束的强度。沿着第二水平方向的入射角设置第二照明光束。第二水平方向与第一水平方向相反。测量来自复合光栅的衍射光束的强度。来自第一照明光束的衍射光束与来自第二照明光束的衍射光束之间的差异线性缩放导致重叠误差。

49. 发明申请

US20120281197A1 Holographic Mask Inspection System with Spatial Filter 审中-公开
标题翻译：全息面罩检测系统与空间过滤器
公开(公告)号：US20120281197A1
公开(公告)日：2012-11-08
申请号：US13497178
申请日：2010-11-12
申请人： Robert Albert Tharaldsen , Arie Jeffrey Den Boef , Eric Brian Catey , Yevgeniy Konstantinovich Shmarev , Richard David Jacobs
发明人： Robert Albert Tharaldsen , Arie Jeffrey Den Boef , Eric Brian Catey , Yevgeniy Konstantinovich Shmarev , Richard David Jacobs
IPC分类号： G03H1/02 , G03B27/72
CPC分类号： G03H1/00 , G01N21/94 , G01N21/95607 , G01N21/95623 , G01N2021/95676 , G03F1/84 , G03H1/02 , G03H1/041 , G03H1/0443 , G03H1/08 , G03H2001/0204 , G03H2001/0452 , G03H2222/15 , G03H2222/43 , G03H2222/45 , G03H2223/12 , G03H2223/26 , G03H2223/53
摘要： Disclosed are apparatuses, methods, and lithographic systems for holographic mask inspection. A holographic mask inspection system (300, 600, 700) includes an illumination source (330), a spatial filter (350), and an image sensor (380). The illumination source being configured to illuminate a radiation beam (331) onto a target portion of a mask (310). The spatial filter (350) being arranged in a Fourier transform pupil plane of an optical system (390, 610, 710), where the spatial filter receives at least a portion of a reflected radiation beam (311) from the target portion of the mask. The optical system being arranged to combine (360, 660, 740) the portion of the reflected radiation beam (311) with a reference radiation beam (361, 331) to generate a combined radiation beam. Further, the image sensor (380) being configured to capture holographic image of the combined radiation beam. The image may contain one or more mask defects.
摘要翻译：公开了用于全息掩模检查的装置，方法和光刻系统。全息掩模检查系统（300,600,700）包括照明源（330），空间滤光器（350）和图像传感器（380）。照明源被配置为将辐射束（331）照射到掩模（310）的目标部分上。空间滤波器（350）被布置在光学系统（390,610,710）的傅立叶变换光瞳平面中，其中空间滤波器从掩模的目标部分接收反射的辐射束（311）的至少一部分。光学系统布置成将反射的辐射束（311）的该部分与参考辐射束（361,331）组合（360,660,740）以产生组合的辐射束。此外，图像传感器（380）被配置为捕获组合的辐射束的全息图像。图像可能包含一个或多个掩模缺陷。

50. 发明授权

US08248608B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08248608B2
公开(公告)日：2012-08-21
申请号：US12698418
申请日：2010-02-02
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G01B11/00
CPC分类号： B29C43/021 , B29C33/30 , B29C33/303 , B29C2043/025 , G03F9/7003 , G03F9/703 , G03F9/7042 , G03F9/7049
摘要： A method of determining the location of a lithographic substrate relative to an imprint template is disclosed. The method includes positioning the substrate adjacent to the imprint template such that an alignment grating on the substrate and an alignment grating on the imprint template form a composite diffraction grating, directing alignment radiation beam comprising radiation at a first wavelength and radiation at a second wavelength, the second wavelength being longer than the first wavelength, at the composite diffraction grating, detecting radiation diffracted from the composite grating during relative lateral movement between the imprint template and the substrate, using the detected radiation at the second wavelength to obtain information regarding a separation between the substrate alignment grating and the imprint template alignment grating, and using the detected radiation at the first wavelength to obtain information regarding the lateral position of the substrate alignment grating relative to the imprint template alignment grating.
摘要翻译：公开了一种确定光刻基片相对于印模模板的位置的方法。该方法包括将衬底定位成与压印模板相邻，使得衬底上的对准光栅和压印模板上的对准光栅形成复合衍射光栅，引导包括第一波长的辐射和第二波长的辐射的对准辐射束，所述第二波长比所述第一波长长，在所述复合衍射光栅处，使用所述检测到的所述第二波长的辐射来检测在所述压印模板和所述基板之间的相对横向运动期间从所述复合光栅衍射的辐射，以获得关于所述第二波长之间的间隔的信息衬底对准光栅和压印模板对准光栅，并且使用第一波长的检测到的辐射来获得关于衬底对准光栅相对于压印模板对准光栅的横向位置的信息。

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