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41. 发明申请

US20120170545A1 BASE STATION APPARATUS 审中-公开
标题翻译：基站装置
公开(公告)号：US20120170545A1
公开(公告)日：2012-07-05
申请号：US13496233
申请日：2010-11-08
申请人： Takashi Yamamoto
发明人： Takashi Yamamoto
IPC分类号： H04W72/04 , H04W56/00 , H04W24/00
CPC分类号： H04W72/08 , H04W56/002 , H04W88/08 , H04W92/20
摘要： Basic units (resource blocks) of resource allocation that can be used in a communication area of a base station apparatus are determined without obtaining resource allocation information. To do so, a base station apparatus includes an RF unit 4 that receives a communication signal between another base station apparatus and a terminal apparatus wirelessly connected to the another base station apparatus; a synchronization processing unit 5b that performs a process for synchronizing with the another base station apparatus; and a measurement processing unit 5d that determines power in each resource block of the communication signal received by the RF unit 4 and determines, based on the power, whether the resource block can be used in a communication area of the base station apparatus.
摘要翻译：确定可以在基站装置的通信区域中使用的资源分配的基本单元（资源块），而不获取资源分配信息。为此，基站装置包括：RF单元4，其接收另一基站装置与无线连接到另一基站装置的终端装置之间的通信信号; 同步处理单元5b，执行与另一基站装置同步的处理; 以及测量处理单元5d，其确定由RF单元4接收的通信信号的每个资源块中的功率，并且基于该功率确定是否可以在基站设备的通信区域中使用资源块。

42. 发明申请

US20120155341A1 BASE STATION DEVICE AND INTERFERENCE SUPPRESSION METHOD 失效
标题翻译：基站设备和干扰抑制方法
公开(公告)号：US20120155341A1
公开(公告)日：2012-06-21
申请号：US13393430
申请日：2010-10-04
申请人： Takashi Yamamoto , Eiji Mochida , Yoshizo Tanaka
发明人： Takashi Yamamoto , Eiji Mochida , Yoshizo Tanaka
IPC分类号： H04J1/02
CPC分类号： H04B7/063 , H04B7/0617 , H04B7/086 , H04W16/28
摘要： Interference suppression by beam forming is achieved even in an FDD (Frequency Division Duplex) system. A base station device 1 performs communication based on FDD. The base station device 1 includes a downlink signal reception unit 12 that receives a downlink signal transmitted from another base station device. The base station device 1 performs a beam forming process for directing a null beam to an arrival direction of the downlink signal from the another base station device, by using transmission path information between the base station device and the another base station device, the information being available from the downlink signal received by the downlink signal reception unit 12.
摘要翻译：即使在FDD（频分双工）系统中也能实现波束形成的干扰抑制。基站装置1进行基于FDD的通信。基站装置1包括：接收从另一个基站装置发送的下行链路信号的下行链路信号接收部12。基站装置1通过使用基站装置与另一基站装置之间的传输路径信息，执行用于将空波束引导到来自另一基站装置的下行链路信号的到达方向的波束形成处理，信息为可从下行链路信号接收单元12接收的下行链路信号获得。

43. 发明授权

US08113666B2 Projector and reflection apparatus with adjustable reflection section 有权
标题翻译：具有可调节反射部分的投影机和反射装置
公开(公告)号：US08113666B2
公开(公告)日：2012-02-14
申请号：US12406610
申请日：2009-03-18
申请人： Takashi Yamamoto , Hirokazu Kamatori , Noriaki Miyasaka
发明人： Takashi Yamamoto , Hirokazu Kamatori , Noriaki Miyasaka
IPC分类号： G03B21/28 , G03B21/14 , G02F1/135
CPC分类号： G03B21/28
摘要： A projector includes a light source, a light modulator that modulates the light flux emitted from the light source in accordance with an image signal to form image light, a projection optical apparatus that enlarges and projects the image light, a reflection section having a reflection surface disposed along the direction in which the projection optical apparatus outputs the image light, the reflection surface reflecting the image light, and an adjustment section that adjusts the inclination angle of the reflection section with respect to the direction in which the image light travels.
摘要翻译：一种投影仪，包括：光源，根据图像信号调制从光源发出的光束以形成图像光的光调制器;放大和投影图像光的投影光学装置;具有反射面的反射部; 沿着投影光学装置输出图像光的方向，反射图像光的反射面以及调整反射部相对于图像光行进的方向的倾斜角度的调整部。

44. 发明申请

US20120006025A1 THERMAL POWER PLANT USING LOW-GRADE COAL AS FUEL 审中-公开
标题翻译：使用低等级煤炭燃料的热力发电厂
公开(公告)号：US20120006025A1
公开(公告)日：2012-01-12
申请号：US13201190
申请日：2009-12-10
申请人： Yoshinori Koyama , Takashi Yamamoto , Osamu Shinada , Hiromi Ishii , Hitoji Yamada , Shozo Kaneko , Kimishiro Tokuda , Isao Mochida , Tatsurou Harada
发明人： Yoshinori Koyama , Takashi Yamamoto , Osamu Shinada , Hiromi Ishii , Hitoji Yamada , Shozo Kaneko , Kimishiro Tokuda , Isao Mochida , Tatsurou Harada
IPC分类号： F01K13/00 , F26B25/06
CPC分类号： F23K1/04 , F01K9/003 , F23J2217/102 , F23K2201/101 , F23K2201/103 , F23K2201/20 , F23K2203/104
摘要： A thermal power plant that uses low-grade coal as fuel and allows for increased thermal efficiency of the entire plant is provided. The thermal power plant includes a drying device (3) that dries the low-grade coal to be supplied to a lignite mill (coal pulverizer) (4), and a drying-gas heater (13) that heats air to be supplied to the drying device (3) so as to be used for drying the low-grade coal. A condenser (12) and the drying-gas heater (13) are connected with each other via a heat exchanger (19), and exhaust heat from the condenser (12) is used as a heat source for heating the air.
摘要翻译：提供了使用低等级煤作为燃料并允许整个工厂的热效率提高的火力发电厂。火力发电厂包括干燥装置（3），其干燥要供应到褐煤磨（煤粉碎机）（4））的低级煤，以及干燥气体加热器（13），其将供给到干燥装置（3），用于干燥低档煤。冷凝器（12）和干燥气体加热器（13）通过热交换器（19）彼此连接，并且来自冷凝器（12）的排气用作用于加热空气的热源。

45. 发明申请

US20110317259A1 MICROSCOPE AND FOCUSING METHOD 有权
标题翻译：显微镜和聚焦方法
公开(公告)号：US20110317259A1
公开(公告)日：2011-12-29
申请号：US13157718
申请日：2011-06-10
申请人： Norihiro Tanabe , Takashi Yamamoto , Nobuhiro Hayashi , Ryu Narusawa
发明人： Norihiro Tanabe , Takashi Yamamoto , Nobuhiro Hayashi , Ryu Narusawa
IPC分类号： G02B21/06
CPC分类号： G02B21/0032 , G02B21/06
摘要： Disclosed herein is a microscope, including: an illumination optical system; a first image creation optical system; a second image creation optical system; an illumination-field-diaphragm focus adjustment section; and a characteristic-quantity computation block, wherein the illumination-field-diaphragm focus adjustment section adjusts the image creation position for the illumination field diaphragm on the basis of the characteristic quantity computed by the characteristic-quantity computation block.
摘要翻译：本文公开了一种显微镜，包括：照明光学系统; 第一图像创建光学系统; 第二图像创建光学系统; 照明场光阑聚焦调节部; 以及特征量计算块，其中，所述照明场光阑聚焦调整部基于由所述特征量计算块计算出的特征量来调整所述照明场光阑的图像创建位置。

46. 发明申请

US20110314814A1 HYDROGEN PRODUCTION SYSTEM AND POWER GENERATION SYSTEM 有权
标题翻译：氢生产系统和发电系统
公开(公告)号：US20110314814A1
公开(公告)日：2011-12-29
申请号：US13058150
申请日：2009-12-10
申请人： Takanori Tsutsumi , Yoshinori Koyama , Katsuhiro Ota , Takashi Fujii , Takashi Yamamoto , Hiromi Ishii
发明人： Takanori Tsutsumi , Yoshinori Koyama , Katsuhiro Ota , Takashi Fujii , Takashi Yamamoto , Hiromi Ishii
IPC分类号： F01K27/00 , B01J19/00
CPC分类号： F01K17/04 , C01B3/14 , C01B3/16 , C01B2203/0883 , C01B2203/0894 , C01B2203/1294 , F01K23/064 , Y02E20/18 , Y02E20/326 , Y02P20/13
摘要： The amount of high-temperature steam supplied from external equipment is reduced. Provided is a hydrogen production system (1) including a reactor (3) that allows a humidified process fluid output from a humidifier (2) to react in the presence of a catalyst to transform carbon monoxide in the process fluid into carbon dioxide; a second channel (B) through which the high-temperature process fluid that has reacted in the reactor (3) flows; a circulation channel (C) through which excess water in the humidifier (2) is circulated; and a first heat exchanger (7), disposed at an intersection of the circulation channel (C) and the second channel (B), for heat exchange between the high-temperature process fluid that has reacted in the reactor (3) and the fluid circulated through the circulation channel (C).
摘要翻译：从外部设备供应的高温蒸汽量减少。提供了一种氢生产系统（1），其包括反应器（3），其允许从加湿器（2）输出的加湿过程流体在催化剂存在下反应以将过程流体中的一氧化碳转化为二氧化碳; 在反应器（3）中已经反应的高温处理流体流过的第二通道（B）; 循环通道（C），加湿器（2）中的多余的水循环通过; 和设置在循环通道（C）和第二通道（B）的交点处的第一热交换器（7），用于在反应器（3）中反应的高温处理流体与流体循环通过循环通道（C）。

47. 发明申请

US20110303365A1 Plasma Etching Apparatus 审中-公开
标题翻译：等离子蚀刻装置
公开(公告)号：US20110303365A1
公开(公告)日：2011-12-15
申请号：US13203191
申请日：2010-07-16
申请人： Takashi Yamamoto , Naoya Ikemoto
发明人： Takashi Yamamoto , Naoya Ikemoto
IPC分类号： C23F1/08 , H05H1/24
CPC分类号： H01J37/32422 , H01J37/321 , H01J37/32357
摘要： The present invention relates to a plasma etching apparatus capable of uniformly etching the entire surface of a substrate regardless of the kind of the substrate. A plasma etching apparatus 1 has a processing chamber 11 in which the outer diameter of an upper chamber 12 is formed smaller than a lower chamber 13 and the upper chamber 12 is provided at the central portion of the top surface of the lower chamber 13, a grounded plate-shaped member 14 which is provided on the ceiling of the lower chamber 13 to divide the inner space of the processing chamber 11 and which has a plurality of through holes 14a penetrating from the top surface to the bottom surface thereof, a platen 16 which is disposed in the lower chamber 13 and on which a substrate K is placed, a gas supply device 20 for supplying an etching gas into the upper chamber 12, plasma generating devices 26, 29 for exciting etching gases in the upper chamber 12 and in the lower chamber 13 into a plasma, respectively, an exhaust device 35 for reducing the pressure within the processing chamber 11, and an RF power supply unit 32 for supplying RF power to the platen 16.
摘要翻译：本发明涉及能够均匀地蚀刻基板的整个表面的等离子体蚀刻装置，而与基板的种类无关。等离子体蚀刻装置1具有处理室11，其中上室12的外径形成为小于下室13，上室12设置在下室13的顶表面的中心部分，设置在下室13的天花板上以分隔处理室11的内部空间并且具有从顶表面贯穿其底表面的多个通孔14a的接地板状构件14，压板16 其设置在下室13中并且其上放置有基板K的气体供应装置20，用于将蚀刻气体供应到上室12中，等离子体产生装置26,29用于激发上室12中的蚀刻气体下室13分别成为等离子体，用于减小处理室11内的压力的排气装置35和用于向压板16提供RF功率的RF电源单元32。

48. 发明申请

US20110240221A1 PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 有权
标题翻译：等离子体加工设备和半导体器件制造方法
公开(公告)号：US20110240221A1
公开(公告)日：2011-10-06
申请号：US13075634
申请日：2011-03-30
申请人： Takashi Yamamoto , Shunsuke Mizukami , Ryuji Ohtani , Kimihiro Higuchi
发明人： Takashi Yamamoto , Shunsuke Mizukami , Ryuji Ohtani , Kimihiro Higuchi
IPC分类号： H01L21/306 , H05H1/24 , H01L21/00
CPC分类号： H01L21/6831 , C23C16/507 , C23C16/509 , C23C16/5093 , H01J37/32091 , H01J37/32165 , H01J37/32642 , H01L21/67103 , H01L21/67109 , Y10T29/41
摘要： A plasma processing apparatus includes a processing chamber; a lower electrode provided in the processing chamber and having a base made of a conductive metal to which a high frequency power is applied, the lower electrode also serving as a mounting table for mounting thereon a target substrate; an upper electrode provided in the processing chamber to face the lower electrode; and a focus ring disposed above the lower electrode to surround the target substrate. An electrical connection mechanism is provided between the base of the lower electrode and the focus ring to electrically connect the base of the lower electrode to the focus ring through a current control element, and generates a DC current in accordance with a potential difference.
摘要翻译：等离子体处理装置包括处理室; 设置在处理室中的下电极，具有由导电金属制成的基座，高频电源施加到该底座，下电极也用作用于安装目标衬底的安装台; 设置在所述处理室中以与所述下电极相对的上电极; 以及设置在所述下电极上方以围绕所述目标基板的聚焦环。电连接机构设置在下电极的底座和聚焦环之间，通过电流控制元件将下电极的底座与聚焦环电连接，并根据电位差产生直流电流。

49. 发明授权

US08023802B2 Image processing apparatus 失效
标题翻译：图像处理装置
公开(公告)号：US08023802B2
公开(公告)日：2011-09-20
申请号：US12181233
申请日：2008-07-28
申请人： Katsuhiro Miyamoto , Takashi Yamamoto
发明人： Katsuhiro Miyamoto , Takashi Yamamoto
IPC分类号： H04N5/92
CPC分类号： H04N5/4403 , H04N1/00291 , H04N1/32101 , H04N21/4184 , H04N21/42228 , H04N21/42653 , H04N21/42692 , H04N21/4312 , H04N21/4325 , H04N21/4622 , H04N21/4858 , H04N21/8153 , H04N2005/4441 , H04N2201/0087 , H04N2201/3242 , H04N2201/3277
摘要： A signal processing apparatus, the operation of which is controlled by a remote controller, designates procedure for reproducing an image signal stored on a recording medium; allocates a reproduction function corresponding to the designated reproduction procedure to the operating key of the remote controller; generates reproduction management data that includes operating key information indicating the operating key to which the reproduction function is allocated, and reproduction procedure information indicating the designated reproduction procedure; and writes the reproduction procedure management information to the recording medium.
摘要翻译：信号处理装置，其操作由遥控器控制，指定用于再现存储在记录介质上的图像信号的过程; 将与指定的再现过程相对应的再现功能分配给遥控器的操作键; 产生再现管理数据，其中包括指示分配了再现功能的操作键的操作键信息和指示指定的再现过程的再现过程信息; 并将再现过程管理信息写入记录介质。

50. 发明申请

US20110135236A1 Reusable bearing and reuse method thereof 审中-公开
标题翻译：可重复使用的轴承及其再利用方法
公开(公告)号：US20110135236A1
公开(公告)日：2011-06-09
申请号：US12929593
申请日：2011-02-02
申请人： Takashi Yamamoto , Seiichi Takada
发明人： Takashi Yamamoto , Seiichi Takada
IPC分类号： F16C19/24 , F16C33/46 , B23P6/00
CPC分类号： F16C41/008 , F16C19/06 , F16C19/52 , F16C2237/00 , F16C2324/16 , Y10T29/49718
摘要： A reusable bearing that can be easily reused without accompanying any problem associated with reduction in performance is provided. The reusable bearing (1) is a rolling bearing for use in an office machine, which is available for reuse in an office machine under a load lower than the fatigue limit load after it has been used under the load lower than the fatigue limit load and subsequently collected.
摘要翻译：提供了可以容易地重复使用而不伴随与性能降低有关的任何问题的可重复使用的轴承。可重复使用的轴承（1）是用于办公机器的滚动轴承，其在低于疲劳极限载荷的载荷下使用之后，可在办公机器中在低于疲劳极限载荷的载荷下重复使用，随后收集。

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