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    • 45. 发明授权
    • Constant current density plating method
    • 恒流密度电镀法
    • US4120759A
    • 1978-10-17
    • US832907
    • 1977-09-13
    • Hiroshi AsamiMasao Kaji
    • Hiroshi AsamiMasao Kaji
    • C25D21/12C25D1/00C25C1/20G05F1/10
    • C25D21/12Y10S204/07
    • In the present plating method the bath contains an electrolyte solution having a uniform ion concentration. A common electrode, a plating electrode and a standard electrode are arranged in the bath. A direct current source is connected between the common electrode and the plating electrode. A further, constant, direct current source is connected between the common electrode and the standard electrode. A potentiometer device is arranged for detecting resistance changes between these electrodes due to variations in the ion concentration and in the mobility of the electrolyte solution between the electrodes. A control is responsive to the potentiometer device for regulating the plating current supplied by the direct current source as a function of the potential difference detected by the potentiometer device, whereby a constant plating current density is achieved.
    • 在本电镀方法中,浴含有具有均匀离子浓度的电解液。 浴中配置有公共电极,电镀电极和标准电极。 在公共电极和电镀电极之间连接有直流电源。 在公共电极和标准电极之间连接另外恒定的直流电源。 布置电位器装置,用于检测电极之间的电离变化,这是由于离子浓度的变化和电极间的电解质溶液的迁移率。 控制器响应于电位器装置,用于调节由直流电源提供的电镀电流作为由电位计装置检测的电位差的函数,从而实现恒定的电镀电流密度。